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Coating apparatus

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Class / Patent application numberDescriptionNumber of patent applications / Date published
118715000 GAS OR VAPOR DEPOSITION 718
118300000 PROJECTION OR SPRAY TYPE 150
118663000 CONTROL MEANS RESPONSIVE TO A RANDOMLY OCCURRING SENSED CONDITION 103
118620000 WITH MEANS TO APPLY ELECTRICAL AND/OR RADIANT ENERGY TO WORK AND/OR COATING MATERIAL 78
118200000 SOLID APPLICATOR CONTACTING WORK 70
118500000 WORK HOLDERS, OR HANDLING DEVICES 70
118712000 WITH INDICATING, TESTING, INSPECTING, OR MEASURING MEANS 69
118696000 PROGRAM, CYCLIC, OR TIME CONTROL 64
118050000 WITH VACUUM OR FLUID PRESSURE CHAMBER 54
118058000 WITH HEAT EXCHANGE, DRYING, OR NON-COATING GAS OR VAPOR TREATMENT OF WORK 48
118708000 CONDITION RESPONSIVE CONTROL 43
118504000 WORK SURFACE SHIELDS, MASKS OR PROTECTORS 40
118400000 IMMERSION OR WORK-CONFINED POOL TYPE 32
118013000 EDIBLE BASE OR COATING TYPE 24
118100000 SOLID MEMBER OR MATERIAL ACTING ON COATING AFTER APPLICATION 16
118600000 WITH TREATMENT OF COATING MATERIAL 16
118695000 INTERFACING CONTROL OF PLURAL OPERATIONS 11
118046000 WITH PRINTING 10
118052000 WITH MEANS TO CENTRIFUGE WORK 7
118056000 WITH MANIPULATION OF WORK AFTER COATING TO DISTRIBUTE OR REMOVE COATING 6
118035000 WITH CUTTING, PUNCHING OR TEARING OF WORK 6
118075000 COMBINED 4
20110290178COATING DEVICE - Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.12-01-2011
20090165706METHOD FOR FORMING A PLURALITY OF METAL LINES IN A SEMICONDUCTOR DEVICE USING DUAL INSULATING LAYER - A method for forming a plurality of metal lines in a semiconductor device including forming first insulating layer patterns on a semiconductor substrate, the first insulating patterns being spaced from each other; depositing a metal layer on and between the first insulating layer patterns; planarizing the metal layer; patterning the planarized metal layer to form the plurality of metal lines between the first insulating layer patterns; and forming a second insulating layer on and between the metal lines.07-02-2009
20080314312METHOD AND APPARATUS FOR EXTRUDING A COATING UPON A SUBSTRATE SURFACE - A coating apparatus and method are disclosed that applies a coating to a product in a uniform and controlled manner. The coating apparatus comprises a feeding stage, an optional pre-treatment stage, at least one coating stage and a finishing stage. The coating stage(s) comprise a coating material feeder and a coating device. The coating device includes an aperture conforming to the perimeter of a substrate to be coated in a first and second dimension. As the substrate passes through the aperture, coating material is applied in a uniform and consistent layer ranging from 0.001 inches to 0.250 inches. The coating material also back fills minor surface imperfections and blemishes on the substrate to achieve a consistent finish across the whole area where coating material is applied. The coating device includes first and second shell portions. The first shell portion has a concave surface surrounding the aperture portion. The concave surface allows for coating material to collect prior to deposition upon the surface of the substrate. The second shell has a substantially flat face and a mirror aperture that aligns with the aperture of the first shell. A groove is formed along the perimeter of the aperture to collect coating material for coating the object as it passes through the apertures of both shells.12-25-2008
20090000544Rotatable Device for Holding a Substrate - The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device comprises a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate.01-01-2009
118033000 WITH STRETCHING OR TENSIONING 4
20110290177SYSTEMS AND METHODS FOR FABRICATING BIASED FABRIC - In one embodiment, a biased fabric is supplied. The biased fabric supply has a first specified width and a first bias angle of warp yarns relative to weft yarns. At least one overfeed roller configured to overfeed fabric from the biased fabric supply at an overfeed rate is provided. At least one spreading arm configured to stretch the fabric to a second specified width and a fabric oven configured to heat the biased fabric supply to a specified temperature and output a balanced crimp and/or elongation biased fabric are also provided.12-01-2011
20110168083CNT-INFUSED CERAMIC FIBER MATERIALS AND PROCESS THEREFOR - A composition includes a carbon nanotube (CNT)-infused ceramic fiber material, wherein the CNT-infused ceramic fiber material includes: a ceramic fiber material of spoolable dimensions; and carbon nanotubes (CNTs) bonded to the ceramic fiber material. The CNTs are uniform in length and uniform in distribution. A continuous CNT infusion process includes (a) disposing a carbon-nanotube forming catalyst on a surface of a ceramic fiber material of spoolable dimensions; and (b) synthesizing carbon nanotubes on the ceramic fiber material, thereby forming a carbon nanotube-infused ceramic fiber material.07-14-2011
20110005456HEAD FOR THE AUTOMATIC POSITIONING OF FIBRE BLANKETS - Head for the automatic positioning of fibre blankets, which determines a path for the fibre blanket (01-13-2011
20120000417Polyurethane Roller Coating Device for Carpet Backing - A device for applying a polyurethane mixture to a backstitch side of a greige includes: a tensioning roller rotatable in a first direction; an application roller arranged adjacent to the application roller and rotatable in a second direction opposite to the first direction, the tensioning roller and the application roller positioned transversely and adjacent to a path of travel of the greige on the backstitch side of the greige, the tensioning roller rotatable against a feed direction of the greige, the application roller rotatable in the feed direction of the greige; and a dispenser configured to create a puddle of the polyurethane mixture between the tensioning roller and the application roller.01-05-2012
118047000 CARBONIZING, FLAME CONTACT OR BURNING OFF OF COATING INGREDIENT 3
20090038543Particle Deposition System and Method - A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.02-12-2009
20090217867TORCH FOR THERMAL SPRAYING OF SURFACE COATINGS, AND COATINGS OBTAINED THEREBY09-03-2009
20120012050APPARATUS FOR PROCESSING COATING MATERIAL AND EVAPORATION DEPOSITION DEVICE HAVING SAME - An apparatus for processing coating material includes a crucible having a receptacle for receiving coating material, a drive member having a drive shaft, a cover coupled to the drive shaft, and a flame nozzle opposing the receptacle. The cover includes an inner chamber, a first through hole and a number of second through holes. The first through hole and the second through holes communicate with the inner chamber. The cover has a flat surface with the second through holes exposed at the flat surface. The drive shaft drives the cover to rotate between a closed position where the cover covers the receptacle and the flat surface presses against the coating material to flatten the coating material, and an open position where the cover is moved away from the receptacle. The flame nozzle sprays flame from the second through holes through the first through hole to heat the coating material.01-19-2012
118707000 INTERCONTROL OR SAFETY INTERLOCK 3
20080271674DOSING SYSTEM FOR A COATING PLANT - A metering system for a coating installation for coating components such as vehicle body parts contains an applicator which applies the coating material supplied to it with a volumetric flow metered on-demand, a regulated first metering device which adjusts the pressure or the volumetric flow of the coating material to be applied by the applicator based on setpoints which are specified by automated installation controls, a transducer to generate a reading which matches the pressure or the volumetric flow of the coating material flowing to the applicator and a control device for regulating the metering device as a function of the specified setpoints and of the reading from the transducer. A second metering device is connected at the outlet of the regulated first metering device for the coating material flowing to the applicator which controls the pressure or volumetric flow of the said applied coating material for precision metering of the coating material applied as a function of the specified setpoints.11-06-2008
20090211525MULTIPLE AMPOULE DELIVERY SYSTEMS - This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.08-27-2009
20110155054VACUUM PROCESSING APPARATUS - In a vacuum processing apparatus, a substrate chuck mechanism member is attached to a substrate holder provided in a vacuum processing chamber, includes a shaft member, first and second coil springs that are provided at the two ends, respectively, of the shaft member, and a substrate chuck plate provided at the end of the shaft member, and is additionally attached to the substrate holder using the substrate chuck plate by elastic biasing of the first coil spring. The holding state of the substrate on the substrate holder is changed by the expansion/contraction actions of the first and second coil springs in accordance with the reciprocal movement of the substrate holder.06-30-2011
118070000 WITH CLEANING OR RECONDITIONING WORK SUPPORT OR CONVEYER 3
20080236483METHOD FOR LOW TEMPERATURE THERMAL CLEANING - Methods and apparatus for cleaning undesired substances from a surface in a semiconductor processing chamber. A gas mixture containing a fluorine source and an oxygen source is pre-treated to contain active fluorine species. The pre-treated mixture is stored for a time in a gas storage device, and then introduced to a semiconductor processing chamber. Prior to introduction of the pre-treated gas, the temperature in the chamber is lowered to a temperature equal to or lower than the normal operating temperature. Undesired substances are removed or cleaned through chemical reaction with the pre-treated gas mixture, without the generation of a plasma or a high temperature condition in the chamber.10-02-2008
20080236482METHOD FOR LOW TEMPERATURE THERMAL CLEANING - Methods and apparatus for cleaning undesired substances from a surface in a semiconductor processing chamber. A gas mixture containing a fluorine source and an oxygen source is pre-treated to contain active fluorine species. The pre-treated mixture is stored for a time in a gas storage device, and then introduced to a semiconductor processing chamber. Prior to introduction of the pre-treated gas, the temperature in the chamber is lowered to a temperature equal to or lower than the normal operating temperature. Undesired substances are removed or cleaned through chemical reaction with the pre-treated gas mixture, without the generation of a plasma or a high temperature condition in the chamber.10-02-2008
20110011336TREATMENT SYSTEM AND METHOD FOR THE SURFACE TREATMENT OF WORKPIECES, PARTICULARLY VEHICLE BODIES - A treatment system for the surface treatment of workpieces, particularly vehicle bodies, includes a plurality of transport devices, on which at least one workpiece to be treated can be attached in a releasable manner. A conveying device moves the transport devices through the treatment system. At least one treatment bath is disposed in a first conveying plane of the treatment system and the transport devices with the workpieces arranged thereon are introduced into the treatment bath. At least one cleaning device, which is suitable and designed for cleaning the transport devices after the surface treatment of the workpieces, is disposed in a second conveying plane of the treatment system. The second conveying plane is offset in the vertical direction relative to the first conveying plane.01-20-2011
118071000 WITH SUPPORT FOR EXTRANEOUS ARTICLE OF MATERIAL 2
20110214607SPRAY EDGER DEVICES SUITABLE FOR USE WITH MATERIAL APPLICATION APPARATUS - A spray edger device, which is suitable for use with a material application apparatus, said spray edger device includes a planar blade member, a substantially V-shaped frame member for supporting the planar blade member, and a collar member configured for moveably connecting the planar blade member to a barrel portion of a material application apparatus.09-08-2011
20110220016OVERSPRAY SHIELD DEVICES SUITABLE FOR USE WITH MATERIAL APPLICATION APPARATUS - An overspray shield device, which is suitable for use with a material application apparatus, said overspray shield device includes a shield member and a collar member. The shield member includes a body wall having an outer surface and an inner surface defining a cavity, wherein the body wall includes a throughhole. The collar member is mounted adjacent the throughhole, said collar member configured to moveably connect the shield member to a material application apparatus.09-15-2011
118044000 WITH MEANS TO DEFORM WORK 2
20100229790TRANSFER METHOD AND TRANSFER APPARATUS - An intermittent coating member 09-16-2010
20110303144APPARATUS FOR MANUFACTURING LIGHT GUIDE FILM - An exemplary apparatus for manufacturing a light guide film having patterns simultaneously formed on two opposite surfaces thereof, includes a first conveyor roller, a second conveyor roller, a imprinting group roller, two coating devices, two solidifying devices, a first template and a second template. The imprinting group rollers are positioned between the first and second conveyor rollers, including a first imprinting roller and a second imprinting roller opposite to the first imprinting roller. The two coating devices are positioned between the first conveyor roller and the imprinting group roller. The two solidifying devices are positioned between the imprinting group rollers and the second conveyor roller. The first template has a first imprinting pattern, and is fixed on a circumferential surface of the first imprinting roller. The second template has a second imprinting pattern, and is fixed on a circumferential surface of the second imprinting roller.12-15-2011
118072000 WITH MEANS TO PREPARE WORK SURFACE FOR COATING 2
20110203518SUBSTRATE PROCESSING METHOD AND APPARATUS - A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.08-25-2011
20080196659METHOD AND APPARATUS FOR CONTINUOUS PROCESSING OF BUFFER LAYERS FOR GROUP IBIIIAVIA SOLAR CELLS - A deposition method which deposits a CdS buffer layer on a surface of a solar cell from a process solution including all chemical components of the CdS buffer layer material. CdS is deposited in a deposition chamber by heating the surface of the solar cell absorber to cause the transfer of heat from the solar cell absorber layer to at least a portion of the process solution that is in contact with the surface. Used solution is cooled, and replenished in a solution container and redirected into the deposition chamber.08-21-2008
118506000 MISCELLANEOUS 1
20080223295METHOD FOR PRODUCING A TOOL WHICH CAN BE USED TO CREATE OPTICALLY ACTIVE SURFACE STRUCTRES IN THE SUB-nuM RANGE AND A CORRESPONDING TOOL - The invention is a method for producing a tool which can be used to create optically active surface structures in the sub-μm range, having a support surface onto which relief surface structures are applied over the support surface by means of material deposition. The invention is distinguished by the support surface being directly contacted with a mask in which openings with diameters in the sub-μm range are provided or can be provided, by the support surface including the mask being subjected to a coating process in which the coating material deposits through the openings of the mask onto the support surface, and the mask is removed from the support surface when a partial amount of an average end structure height of the surface structures is reached and the coating procedure is then continued without the mask using the same coating material or different coating materials.09-18-2008
118045000 COATED SURFACE PROTECTING MEANS, E.G., SLIP SHEETS 1
20100186663METHODS AND APPARATUS FOR PROTECTING A SUBSTRATE SUPPORT IN A SEMICONDUCTOR PROCESS CHAMBER - Methods and apparatus for protecting a substrate support in a semiconductor process chamber are provided herein. In some embodiments, an apparatus for protecting a substrate support in a semiconductor process chamber includes a semiconductor substrate and a coating comprising yttrium disposed on an upper surface of the semiconductor substrate. The semiconductor substrate is configured to be removably placed on the substrate support. In some embodiments, the semiconductor substrate comprises silicon. In some embodiments, the coating comprises yttrium and oxygen. In some embodiments, the protective apparatus may be disposed atop a substrate support within a semiconductor process chamber. In some embodiments, the protective apparatus may protect the surface of the substrate support from damage during one or more chamber processes, such as marathon testing or chamber cleaning.07-29-2010
118076000 RUBBING TRANSFER OF SOLID COATING MATERIAL ONTO WORK 1
20100288193Film Transfer Tool with Application Head Moveable between Exposed and Stowed Positions - A film transfer tool includes an application head which is adapted to be moved to a stowed position and a reel assembly having a wall and two stopping members extended therefrom. The reel assembly and a shell have an active member disposed therebetween. The active member has a looped passage that the two stopping members are adapted to move thereon and the two stopping members can make the reel assembly position in a retained position in which the head extends outside the shell, and release the reel assembly from the retained position in order that the head is stowed inside the shell.11-18-2010
118310500 BODY MEMBER PRINTING TYPE (E.G., FINGER PRINTING) 1
20090126625Non-intrusive portable safety seal used to obtain people's dna and genetic patterns through fingerprinting - A non-intrusive portable safety seal to collect human organic remnants in order to obtain DNA and genetic patterns of fingerprints is provided. The proposed seal comprises four related basic components: a sheet of paper or base forming a triptych, which serves to support the entire set, an adhesive-covered central sheet bearing a safety seal on the front surface, a two-surfaced sheet with adhesive on both surfaces and a graphite or granulated sheet adheres to it. In addition, the seal has two adhesive-covered safety flaps that protect the entire set. An alternative seal comprises a base sheet that is able to receive four fingerprints of four fingers, containing a fifth separation sheet between the graphite or granulated sheet and the two-surfaced adhesive layer.05-21-2009

Patent applications in all subclasses Coating apparatus