| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 117011000 |
PROCESSES OF GROWTH FROM LIQUID OR SUPERCRITICAL STATE
| 246 |
| 117084000 |
FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION)
| 144 |
| 117200000 |
APPARATUS
| 85 |
| 117003000 |
PROCESSES OF GROWTH WITH A SUBSEQUENT STEP OF HEAT TREATING OR DELIBERATE CONTROLLED COOLING OF THE SINGLE-CRYSTAL
| 17 |
| 117004000 |
PROCESSES OF GROWTH FROM SOLID OR GEL STATE (E.G., SOLID PHASE RECRYSTALLIZATION)
| 9 |
| 117002000 |
PROCESSES OF GROWTH WITH A SUBSEQUENT STEP ACTING ON THE CRYSTAL TO ADJUST THE IMPURITY AMOUNT (E.G., DIFFUSING, DOPING, GETTERING, IMPLANTING)
| 7 |
| 117001000 |
PROCESSES JOINING INDEPENDENT CRYSTALS | 2 |
| 20080282967 | Crystal Growth Method and Apparatus - A method for forming a uniformly oriented crystalline sheet, wherein a plurality of crystallites are introduced into a liquid. At least a portion of the crystallites float on the surface of the liquid, and are induced to self-orientate until they are uniformly oriented in a compact mosaic configuration, while their sintering is prevented. A uniformly oriented crystalline sheet is formed from the compact mosaic configuration, for example, by sintering the crystallites. An apparatus for forming a crystalline sheet includes a container containing a liquid, wherein a plurality of crystallites are introduced and at least a portion thereof float on the surface of the liquid without sintering. The apparatus also includes a flow unit for inducing a flow of the liquid which moves the floating crystallites, and self-orientation means for allowing self-orientation of the floating crystallites, without sintering, until the floating crystallites are uniformly oriented in a compact mosaic configuration, ready for forming a uniformly oriented crystalline sheet, for example, by sintering the crystallites. | 11-20-2008 |
| 20090114146 | Method for Manufacturing Semiconductor Device and Substrate Processing Apparatus - To provide a method for manufacturing a semiconductor device and a substrate processing apparatus which contribute to forming high-density nuclei. The method for manufacturing a semiconductor device according to the invention includes the steps of: carrying a wafer | 05-07-2009 |
