| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 015003000 |
MACHINES
| 1293 |
| 015104001 |
IMPLEMENTS
| 1107 |
| 015246000 |
ATTACHMENTS
| 339 |
| 015100700 |
SUBMERGED CLEANERS WITH AMBIENT FLOW GUIDES
| 58 |
| 015257010 |
ACCESSORIES
| 50 |
| 015100510 |
ELECTROSTATIC CLEANING
| 9 |
| 015001000 |
MISCELLANEOUS | 4 |
| 20080271270 | PROBE CLEANING TUBE - A probe cleaning tube cleans a probe in a cleaning tub of an endoscope reprocessor having a water supply nozzle for supplying liquid for reprocessing, and is made of at least a soft resin tube. An aperture is made in a side of the soft resin tube, and has a diameter larger than an outer diameter of the probe. A removable water supply nozzle attachment is provided at one end of the soft resin tube for coupling to the water supply nozzle. A drain unit has a drain port at another end of the soft resin tube to stop passage of the probe. | 11-06-2008 |
| 20090241274 | METHOD OF REMOVING PARTICLES ON PHOTOMASK - Provided is a method of removing particles on a photomask. The method includes fabricating a photomask formed with a thin film pattern over a transparent substrate; identifying positions of particles on the photomask by inspecting the photomask; and removing the particles using a nanotweezer. | 10-01-2009 |
| 20080229526 | System for cleaning a wafer - A system for cleaning a wafer. At least one first chuck roller is connected to a first roller base and includes a first annular groove. A second roller base opposes the first roller base. At least one second chuck roller is connected to the second roller base and includes a second annular groove. A sensing chuck roller is connected to the second roller base and includes a third annular groove corresponding to the first and second annular grooves. A cleaning member covers the third annular groove. A circumferential edge of the wafer is positioned in the first and second annular grooves and abuts the cleaning member. The first and second chuck rollers rotate the wafer, enabling the circumferential edge thereof to rub against the cleaning member. | 09-25-2008 |
| 20090133203 | CAPTURE AND REMOVAL CLEANING SYSTEM - Example embodiments of the invention include a cleaning system having both daily cleaning tasks and periodic cleaning tasks for cleaning and dusting a room. By utilizing less inventory and more biocompatible, “bio-safe” products than traditional systems, embodiments of the cleaning system requires less tools yet, allows its users to combine cleaning processes in a time-saving feature. The invention further includes the use of an inventive cleaning brush apparatus for which allows dirt and dust to be swept into gaps between rows of bristles, which are attached to a handle via metal rails. Accordingly, dust is concurrently collected into a row of suction holes without requiring separate steps to sweep and collect the dust. As such, the spacing of the inner and outer bristles allows for dust to be trapped in the gaps rather than permanently dispersing into the breathing air. | 05-28-2009 |
