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AURORA, IL US
1. 20110014858 GROOVED CMP POLISHING PAD - polishing pads for use in CMP processes 01-20-20112. 20110006393 Multilayer electronic devices for imbedded capacitor 01-13-2011
3. 20100314576 COMPOSITIONS FOR CMP OF SEMICONDUCTOR MATERIALS 12-16-2010
4. 20100308016 Polishing composition for nickel-phosphorous memory disks 12-09-2010
5. 20100287706 Anti Suffocation Inclined Sleep Aid for Infants with Reflux or Vomiting 11-18-2010
6. 20100279506 Polishing silicon carbide - method of chemically-mechanically polishing a substrate comprising at least one layer of single crystal silicon carbide 11-04-2010
7. 20100276392 CMP SYSTEM UTILIZING HALOGEN ADDUCT - method of polishing a substrate comprising providing a chemical-mechanical polishing system comprising a polishing 11-04-2010
8. 20100273399 CMP POROUS PAD WITH PARTICLES IN A POLYMERIC MATRIX 10-28-2010
9. 20100200802 OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS 08-12-2010
10. 20100193470 POLISHING COMPOSITION FOR NICKEL-PHOSPHOROUS MEMORY DISKS 08-05-2010
11. 20100190339 COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS 07-29-2010
12. 20100187200 CMP SENSOR AND CONTROL SYSTEM - Chemical-mechanical polishing systems comprising apparatus and methods which allow the physical and chemical 07-29-2010
13. 20100144245 METHODS AND APPARATUS FOR CHEMICAL-MECHANICAL POLISHING UTILIZING LOW SUSPENDED SOLIDS POLISHING COMPOSITIONS 06-10-2010
14. 20100144149 METHOD TO SELECTIVELY POLISH SILICON CARBIDE FILMS 06-10-2010
15. 20100118139 Portable Device to Detect the Spin of Table Tennis Ball 05-13-2010
16. 20100087845 METHODS FOR AMELIORATING TISSUE TRAUMA FROM SURGICAL INCISIONS 04-08-2010
17. 20100079137 METHOD AND APPARATUS FOR MEASUREMENT OF MAGNETIC PERMEABILITY OF A MATERIAL 04-01-2010
18. 20100075502 Barrier slurry for low-k dielectrics - chemical-mechanical polishing composition for polishing a substrate 03-25-2010
19. 20100062601 METHODS FOR POLISHING ALUMINUM NITRIDE - method for polishing an aluminum nitride substrate 03-11-2010
20. 20100029181 Methods and compositions for polishing silicon-containing substrates 02-04-2010
21. 20100022171 Glass polishing compositions and methods 01-28-2010
22. 20100012003 Safes without weak parts - The security class or burglary resistant capability of a safe is determined by the safe's weakest parts: combinations lock 01-21-2010
23. 20100009537 METHOD OF POLISHING NICKEL-PHOSPHOROUS - The invention is directed to a method of chemically-mechanically polishing a a surface of a substrate 01-14-2010
24. 20090314744 CMP method for metal-containing substrates 12-24-2009
25. 20090293369 WIRE SAW SLURRY RECYCLING PROCESS - method of recycling a water-based wire saw cutting slurry waste fluid comprising abrasive particles and waste solids 12-03-2009
26. 20090291559 STABLE, HIGH RATE SILICON SLURRY - chemical-mechanical polishing composition comprising wet-process silica 11-26-2009
27. 20090289033 Polishing composition containing polyether amine 11-26-2009
28. 20090251702 Stitching of near-nulled subaperture measurements 10-08-2009
29. 20090236559 COMPOSITIONS FOR POLISHING ALUMINUM/COPPER AND TITANIUM IN DAMASCENE STRUCTURES 09-24-2009
30. 20090232279 X-RAY SOURCE WITH NONPARALLEL GEOMETRY - improved electron bombardment device includes a first tubular member for containing a target material and a 09-17-2009
31. 20090215271 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios 08-27-2009
32. 20090191710 CMP method for improved oxide removal rate 07-30-2009
33. 20090173717 COMPOSITION AND METHOD FOR POLISHING NICKEL-PHOSPHOROUS-COATED ALUMINUM HARD DISKS 07-09-2009
34. 20090156006 COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS 06-18-2009
35. 20090152240 CHEMICAL-MECHANICAL POLISHING COMPOSITION AND METHOD FOR USING THE SAME 06-18-2009
36. 20090137124 POLISHING COMPOSITION AND METHOD FOR HIGH SILICON NITRIDE TO SILICON OXIDE REMOVAL RATE RATIOS 05-28-2009
37. 20090135132 Electronic display system to show large size visual content on a small size display device 05-28-2009
38. 20090134122 Copper-passivating CMP compositions and methods 05-28-2009
39. 20090126713 Slurry composition containing non-ionic polymer and method for use 05-21-2009
40. 20090124173 COMPOSITIONS AND METHODS FOR RUTHENIUM AND TANTALUM BARRIER CMP 05-14-2009
41. 20090103993 Method of Polishing a Tungsten Carbide Surface 04-23-2009
42. 20090090696 SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES 04-09-2009
43. 20090081927 POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE 03-26-2009
44. 20090081871 POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE 03-26-2009
45. 20090075566 LOW PH BARRIER SLURRY BASED ON TITANIUM DIOXIDE 03-19-2009
46. 20090056231 Copper CMP composition containing ionic polyelectrolyte and method 03-05-2009
47. 20090035942 Ruthenium CMP compositions and methods - chemical-mechanical polishing composition for polishing a ruthenium-containing substrate in the presence of an 02-05-2009
48. 20090032006 Wire saw process - method for increasing the cutting performance of a wire saw in cutting a substrate 02-05-2009
49. 20090029633 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC 01-29-2009
50. 20090009423 Variable size electronic display based on slide-out and slide-in mechanism 01-08-2009
51. 20090007766 CRUISE MUNITIONS DETONATOR PROJECTILE - projectile, , can be fired from a tank, modified grenade launcher or gun using a laser range finder, radar or 01-08-2009
52. 20080283502 Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates 11-20-2008
53. 20080274674 STACKED POLISHING PAD FOR HIGH TEMPERATURE APPLICATIONS 11-06-2008
54. 20080274619 CMP compositions containing a soluble peroxometalate complex and methods of use thereof 11-06-2008
55. 20080220610 Silicon oxide polishing method utilizing colloidal silica 09-11-2008
56. 20080214092 METHOD AND APPARATUS FOR MEASUREMENT OF MAGNETIC PERMEABILITY OF A MATERIAL 09-04-2008
57. 20080203059 DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT 08-28-2008
58. 20080200098 POLISHING SLURRY FOR ALUMINUM AND ALUMINUM ALLOYS 08-21-2008