| ZAO NIKON CO., LTD. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110261330 | Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure apparatus and exposure method, device manufacturing method - A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table. | 10-27-2011 |
| 20110122393 | Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method - A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member. | 05-26-2011 |
