VISTEC ELECTRON BEAM GMBH Patent applications |
Patent application number | Title | Published |
20100148087 | Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns - The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate ( | 06-17-2010 |
20100122603 | Aerostatically Guided Table System for Vacuum Application - A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units ( | 05-20-2010 |
20100061667 | AEROSTATIC BEARING ARRANGEMENT AND ASSOCIATED ELECTROSTATIC PRELOADING UNIT, PARTICULARLY FOR VACUUM APPLICATION - A proposed aerostatic bearing arrangement for moving a device on a base structure, particularly in a vacuum environment, has at least one aerostatic bearing element comprising a bearing body having a load-carrying zone and a suction area. An electrostatic preloading unit having at least one electrode is associated with the at least one aerostatic bearing element, and a voltage can be applied to the electrode in such a way that a force component is generated in direction of the surface normal of the bearing body of the aerostatic bearing element. | 03-11-2010 |
20090255447 | TABLE GUIDED BY AEROSTATIC BEARING ELEMENTS FOR VACUUM APPLICATION - The invention is directed to a table for vacuum application which is guided by means of aerostatic bearing elements, having a fixedly mounted supporting structure and a tabletop which is displaceable in x-direction and y-direction with respect to the fixedly mounted supporting structure by means of slides. The slides are provided with the aerostatic bearing elements for guiding, these aerostatic bearing elements being connected to feed lines for supplying the gas required for the operation of the gas bearings and suction lines for removing this gas. The suction lines comprise at least one variable-length line arrangement having a first pipe member and a second pipe member which penetrate one inside the other without contacting, at least one sealing gap being provided between the pipe members. | 10-15-2009 |
20080197295 | Device And Method For Producing Resist Profiled Elements - The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam. | 08-21-2008 |