VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATED, INC.
|VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATED, INC. Patent applications|
|Patent application number||Title||Published|
|20120056110||USING BEAM BLOCKERS TO PERFORM A PATTERNED IMPLANT OF A WORKPIECE - Blockers in an ion beam blocker unit selectively block or trim an ion beam. In one instance, the ion beam has first current regions and second current regions. These current regions may be unequal. The ion beam is then implanted into a workpiece to form regions with different doses. The workpiece may be scanned so that the entirety of its surface is implanted.||03-08-2012|