VAPOR TECHNOLOGIES, INC.
|VAPOR TECHNOLOGIES, INC. Patent applications|
|Patent application number||Title||Published|
|20140076718||Remote Arc Discharge Plasma Assisted Processes - A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.||03-20-2014|
|20140076716||Low Pressure Arc Plasma Immersion Coating Vapor Deposition And Ion Treatment - A vacuum coating and plasma treatment system includes a magnetron cathode with a long edge and a short edge. The magnetic pole of the magnetron results in an electromagnetic barrier. At least one remote arc discharge is generated separate from the magnetron cathode and in close proximity to the cathode so that it is confined within a volume adjacent to the magnetron target. The remote arc discharge extends parallel to the long edge of the magnetron target and is defined by the surface of the target on one side and the electromagnetic barrier on all other sides. There is a remote arc discharge cathode hood and anode hood extending over the arc discharge and across the short edge of the magnetron cathode. Outside of the plasma assembly is a magnetic system creating magnetic field lines which extend into and confine the plasma in front of the substrate.||03-20-2014|
|20140076715||Low Pressure Arc Plasma Immersion Coating Vapor Deposition and Ion Treatment - A coating system includes a vacuum chamber and a coating assembly. The coating assembly includes a vapor source, a substrate holder, a remote anode electrically coupled to the cathode target, and a cathode chamber assembly. The cathode chamber assembly includes a cathode target, an optional primary anode and a shield which isolates the cathode target from the vacuum chamber. The shield defines an opening for transmitting an electron emission current of a remote arc discharge from the cathode target to the remote anode that streams along the target face long dimension. A primary power supply is connected between the cathode target and the primary anode while a secondary power supply is connected between the cathode target and the remote anode. Characteristically, a linear remote anode dimension and a vapor source short dimension are parallel to a dimension in which an arc spot is steered along the cathode target.||03-20-2014|
|20140076437||FAUCET COMPONENT WITH IMPROVED COATING - A component for a faucet includes a substrate including alumina and a first material provided over at least a portion of the substrate. The first material includes titanium and carbon. The component also includes a second material provided over the first material, the second material including carbon and having carbon sp3 bonding of at least 40 percent.||03-20-2014|
|20130126333||Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions - A vacuum deposition system for forming a dense coating includes a substrate holder for holding a substrate having a substrate surface to be coated, a magnetic field generator, an optional electron source, an optional electron drain, and a deposition source. The magnetic field generator generates a magnetic field in which the substrate is at least partially immersed such that a component of the magnetic field is parallel to the substrate surface such that electrons are forced along a path that causes ionization in the vicinity of the substrate surface. The magnetic field strength at the substrate surface is between 5 and 1000 Gauss. The deposition source provides material to coat the substrate. The vacuum deposition system includes the optional electron source if the deposition source does not provide a source of electrons. A method for depositing a dense coating is also provided.||05-23-2013|
|20130084465||Stainless Steel and Silver Colored PVD Coatings - A method of making a coated substrate comprises depositing a base layer onto a substrate to form a first coated substrate. A chromium nitride layer is then deposited onto the first coated substrate to form a second coated substrate. The chromium nitride has an atomic percent of nitrogen less that about||04-04-2013|
|20120199070||FILTER FOR ARC SOURCE - An arc source filter is disposed between an arc cathode and a substrate in a vacuum arc deposition system. The filter includes a plurality of duct elements that surround the arc source. The duct elements have sufficient spatial dimensions to block particles. In addition, the duct elements have electrical and magnetic properties that are conducive for plasma transmission through the filter. On passing through the filter, the highly ionized arc plasma is essentially rid of particles making a source plasma for reacted as well as un-reacted coatings characterized by high density and near defect free quality. The design allows for flexibility in terms of filtering degree, length of coating zone as well as choice of arc source.||08-09-2012|
Patent applications by VAPOR TECHNOLOGIES, INC.