| Tower Semiconductor Ltd. Patent applications |
| Patent application number | Title | Published |
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| 20110121379 | Three-Terminal Single Poly NMOS Non-Volatile Memory Cell With Shorter Program/Erase Times - A three terminal non-volatile memory (NVM) cell for a CMOS IC is formed by either a standard CMOS process flow or a slightly modified CMOS process flow. The NVM cell includes read and injection transistors that share a common floating gate. The floating gate includes a portion disposed over the channel region of the read transistor, a portion disposed over the channel region of the injection transistor, and a portion extending into an enlarged drain diffusion area away from the channel regions, whereby the gate-to-drain capacitance is higher than the gate-to-source capacitances. The source/drain of the injection transistor are formed using different LDD implants to achieve faster program/erase. Alternatively, an optional CHE enhancing implant is added to the source/drain of the injection transistor to enhance CHE programming. Both HV LDD and LV LDD implants are introduced together enabling LDD implant merging under the floating gate extension. | 05-26-2011 |
| 20110050874 | CMOS Image Sensor Pixel Without Internal Sample/Hold Circuit - A very small area CMOS image sensor, e.g., for an endoscopic system, includes only four pads (power, ground, digital in, analog out), and includes an array of 4T pixels and associated control circuitry for performing correlated double sampling (CDS) to generate analog reset level and analog signal level values associated with light detected by photodiodes in each pixel. Instead of processing the analog values on-chip, the analog reset values and analog signal values are transmitted in separate sets one row at a time along with interleaved synchronization signals by way of a single analog contact pad, e.g., to a host device of an endoscopic system, which uses the synchronization signals to reconstruct the sensor's internal clock in order to process the analog values. An endoscope housing incorporating the CMOS image sensor thus requires only four wires. | 03-03-2011 |
| 20110013064 | CMOS Image Sensor With Wide (Intra-Scene) Dynamic Range - A CMOS image sensor uses a special exposure control circuit to independently adjust the photodiode exposure (integration) time for each pixel in a pixel array to obtain non-saturated photodiode charges for each pixel. Exposure time adjustment involves extrapolating a pixel's final photodiode charge using an intermediate photodiode charge measured after a predetermined portion of an exposure frame period. If the intermediate photodiode charge is, e.g., over 50% of the photodiode's full-well capacity after half of the exposure frame period, then saturation is likely and the photodiode is reset to integrate only during the remaining time. If not, then the photodiode integrates over the allotted exposure frame period. Data indicating the length of the exposure portion is stored as analog data on the memory node of each pixel, and readout of the final photodiode charge is performed using Correlated Double Sampling (CDS) techniques. | 01-20-2011 |
| 20100237228 | CMOS Image Sensor Pixel With Internal Charge Amplifier - A CMOS image sensor in which each column of pixels is connected to a signal line that is coupled to a current source, and each pixel includes a charge amplifier having a common source configuration arranged such that a charge generated by its photodiode is amplified by the charge amplifier and transmitted to readout circuitry by way of the signal line. In one embodiment the charge amplifier utilizes an NMOS transistor to couple the photodiode charge in an inverted manner to the signal line while converting the charge to a voltage through a capacitor coupled between the signal line and photodiode (i.e., forming a feedback of the NMOS amplifier transistor). | 09-23-2010 |
| 20100188901 | Three-Terminal Single Poly NMOS Non-Volatile Memory Cell - A three terminal non-volatile memory (NVM) cell for a CMOS IC is formed by a standard CMOS process flow. The NVM cell includes two transistors that share a common floating gate. The floating gate includes a first portion disposed over the channel region of the first (NMOS) transistor, a second portion disposed over the channel region of the second (NMOS or PMOS) transistor, and a third portion extending into an enlarged drain diffusion area away from the channel regions, whereby the gate-to-drain capacitance is higher than the gate-to-source capacitances. A pocket implant or CMOS standard LV N-LDD is formed under the second transistor to enhance CHE programming. Both HV LDD and LV LDD implants are introduced together enabling LDD implant merging under the floating gate extension. The floating gate is formed using substantially T-shaped, C-shaped, U-shaped, Y-shaped or O-shaped polysilicon structures. Various array addressing schemes are disclosed. | 07-29-2010 |
| 20100172184 | Asymmetric Single Poly NMOS Non-Volatile Memory Cell - An asymmetric non-volatile memory (NVM) cell for a CMOS IC formed by a standard CMOS process flow used to form both low voltage and high voltage transistors on a substrate. The NVM cell includes an NMOS floating gate transistor and an optional select transistor. The floating gate transistor includes an elongated floating gate having a first portion disposed over the channel region C | 07-08-2010 |
| 20100157669 | Floating Gate Inverter Type Memory Cell And Array - A non-volatile memory (NVM) cell and array includes a control capacitor, tunneling capacitor, CMOS inverter and output circuit. The CMOS inverter includes PMOS and NMOS inverter transistors. The control capacitor, tunneling capacitor and PMOS and NMOS inverter transistors share a common floating gate, which is programmed/erased by Fowler-Nordheim tunneling. The output circuit includes PMOS and NMOS select transistors. The PMOS inverter and select transistors share a common source/drain region. Similarly, the NMOS inverter and select transistors share a common source/drain region. This configuration minimizes the required layout area of the non-volatile memory cell and allows design of arrays with smaller footprints. Alternately, the tunneling capacitor may be excluded, further reducing the required layout area of the NVM cell. In this case, the NMOS inverter transistor functions as a tunneling capacitor for programming and erasing the cell, and the PMOS inverter transistor functions as a tunneling capacitor for erasing the cell. | 06-24-2010 |
| 20100102388 | LDMOS Transistor Having Elevated Field Oxide Bumps And Method Of Making Same - A low Rdson LDMOS transistor having a shallow field oxide region that separates a gate electrode of the transistor from a drain diffusion region of the transistor. The shallow field oxide region is formed separate from the field isolation regions (e.g., STI regions) used to isolate circuit elements on the substrate. Fabrication of the shallow field oxide region is controlled such that this region extends below the upper surface of the semiconductor substrate to a depth that is much shallower than the depth of field isolation regions. For example, the shallow field oxide region may extend below the upper surface of the substrate by only Angstroms or less. As a result, the current path through the resulting LDMOS transistor is substantially unimpeded by the shallow field oxide region, resulting in a low on-resistance. | 04-29-2010 |
| 20100027347 | Three-Terminal Single Poly NMOS Non-Volatile Memory Cell - A three terminal non-volatile memory (NVM) cell for a CMOS IC is formed by a standard CMOS process flow. The NVM cell includes two transistors that share a common floating gate. The floating gate includes a first portion disposed over the channel region of the first (NMOS) transistor, a second portion disposed over the channel region of the second (NMOS or PMOS) transistor, and a third portion extending into an enlarged drain diffusion area away from the channel regions, whereby the gate-to-drain capacitance is higher than the gate-to-source capacitances. A pocket implant or CMOS standard LV N-LDD is formed under the second transistor to enhance CHE programming. Both HV LDD and LV LDD implants are introduced together enabling LDD implant merging under the floating gate extension. The floating gate is formed using substantially T-shaped, C-shaped, U-shaped, Y-shaped or O-shaped polysilicon structures. Various array addressing schemes are disclosed. | 02-04-2010 |
| 20100027346 | Asymmetric Single Poly NMOS Non-Volatile Memory Cell - An asymmetric non-volatile memory (NVM) cell for a CMOS IC formed by a standard CMOS process flow used to form both low voltage and high voltage transistors on a substrate. The NVM cell includes an NMOS floating gate transistor and an optional select transistor. The floating gate transistor includes an elongated floating gate having a first portion disposed over the channel region C | 02-04-2010 |
| 20090261235 | CMOS Image Sensor With High Sensitivity Wide Dynamic Range Pixel For High Resolution Applications - A CMOS image sensor in which each pixel includes a conventional pinned diode (photodiode), a Wide Dynamic Range (WDR) detection (e.g., a simplified time-to-saturation (TTS)) circuit, a correlated double sampling (CDS) circuit, and a single output chain that is shared by both the CDS and WDR circuits. The pinned diode is used in the conversion of photons into charge in each pixel. In one embodiment, light received by the photodiode is processed using a TTS operation during the CDS integration phase, and the resulting TTS output signal is used to determine whether the photodiode is saturated. When the photodiode is saturated, the TTS output signal is processed to determine the amount of light received by the photodiode. When the photodiode is not saturated, the amount of light received by the photodiode is determined using signals generated by the readout phase of the CDS operation. | 10-22-2009 |
| 20090239351 | Method For Fabricating Capacitor Structures Using The First Contact Metal - A capacitor structure is fabricated with only slight modifications to a conventional single-poly CMOS process. After front-end processing is completed, grooves are etched through the pre-metal dielectric layer to expose polysilicon structures, which may be salicided or non-salicided. A dielectric layer is formed over the exposed polysilicon structures. A conventional contact process module is then used to form contact openings through the pre-metal dielectric layer. The mask used to form the contact openings is then removed, and conventional contact metal deposition steps are performed, thereby simultaneously filling the contact openings and the grooves with the contact (electrode) metal stack. A planarization step removes the upper portion of the metal stack, thereby leaving metal contacts in the contact openings, and metal electrodes in the grooves. The metal electrodes may form, for example, transistor gates, EEPROM control gates or capacitor plates. | 09-24-2009 |
| 20090213660 | Three-Terminal Single Poly NMOS Non-Volatile Memory Cell - A three terminal non-volatile memory (NVM) cell for a CMOS IC is formed by a standard CMOS process flow. The NVM cell includes two transistors that share a common floating gate. The floating gate includes a first portion disposed over the channel region of the first (NMOS) transistor, a second portion disposed over the channel region of the second (NMOS or PMOS) transistor, and a third portion extending into an enlarged drain diffusion area away from the channel regions, whereby the gate-to-drain capacitance is higher than the gate-to-source capacitances. A pocket implant or CMOS standard LV N-LDD is formed under the second transistor to enhance CHE programming. Both HV LDD and LV LDD implants are introduced together enabling LDD implant merging under the floating gate extension. The floating gate is formed using substantially T-shaped, C-shaped, U-shaped, Y-shaped or O-shaped polysilicon structures. Various array addressing schemes are disclosed. | 08-27-2009 |
| 20090212342 | Asymmetric Single Poly NMOS Non-Volatile Memory Cell - An asymmetric non-volatile memory (NVM) cell for a CMOS IC formed by a standard CMOS process flow used to form both low voltage and high voltage transistors on a substrate. The NVM cell includes an NMOS floating gate transistor and an optional select transistor. The floating gate transistor includes an elongated floating gate having a first portion disposed over the channel region C | 08-27-2009 |
| 20090181530 | High-K Dielectric Stack And Method Of Fabricating Same - A method for improving the reliability of a high-k dielectric layer or a high-k dielectric stack by forming an amorphous high-k dielectric layer over an insulating layer, doping the amorphous high-k dielectric layer with nitrogen atoms, and subsequently heating the resulting structure at a temperature greater than or equal to the crystallization temperature of the high-k dielectric material, thereby transforming the high-k dielectric material from an amorphous state to a crystalline state, and causing nitrogen atoms to diffuse into the insulating layer. | 07-16-2009 |
| 20090181491 | High-Resolution Integrated X-Ray CMOS Image Sensor - An X-ray image sensor having scintillating material embedded into wave-guide structures fabricated in a CMOS image sensor (CIS). After the CIS has been fabricated, openings (deep pores) are formed in the back side of the CIS wafer. These openings terminate at a distance of about 1 to 5 microns below the upper silicon surface of the wafer. The depth of these openings can be controlled by stopping on a buried insulating layer, or by stopping on an epitaxial silicon layer having a distinctive doping concentration. The openings are aligned with corresponding photodiodes of the CIS. The openings may have a shape that narrows as approaching the photodiodes. A thin layer of a reflective material may be formed on the sidewalls of the openings, thereby improving the efficiency of the resulting waveguide structures. Scintillating material (e.g., CsI(Tl)) is introduced into the openings using a ForceFill™ technology or by mechanical pressing. | 07-16-2009 |
| 20090033532 | HIGH RESOLUTION COLUMN-BASED ANALOG-TO-DIGITAL CONVERTER WITH WIDE INPUT VOLTAGE RANGE FOR DENTAL X-RAY CMOS IMAGE SENSOR - An imaging system including column-parallel ADCs that operate in response to a single slope global ramp signal and a matched global ramp line signal that has a voltage representative of a dark pixel value. The signal paths of the global ramp signal and the matched global ramp line signal are matched to minimize noise effects. Prior to performing a pixel read operation, the global ramp signal is increased through a first voltage range (below the dark pixel value) to ensure that the column-parallel ADCs are operating in a linear range. The first voltage range can be adjusted to cancel offset error associated with the column parallel ADCs. The column-parallel ADCs provide output signals having a full voltage swing between V | 02-05-2009 |
| 20090033370 | COMPARATOR WITH LOW SUPPLIES CURRENT SPIKE AND INPUT OFFSET CANCELLATION - A current control circuit is coupled in parallel with the current paths of a differential comparator circuit to ensure that a substantially constant current is drawn from a current source during all operating phases of a comparator. The current control circuit is biased by a reference voltage, which is also used to bias a V− input terminal of the differential comparator circuit. The reference voltage is stored by a sample capacitor, which is charged by applying the reference voltage to a V+ input terminal of the differential comparator circuit while coupling an output terminal of the differential comparator circuit to the sample capacitor in a unity feedback configuration. | 02-05-2009 |
| 20090011576 | Ultra-Violet Protected Tamper Resistant Embedded EEPROM - A pre-metal dielectric structure of a single-poly EEPROM structure includes a UV light-absorbing film, which prevents the charge on a floating gate of the EEPROM structure from being changed in response to UV radiation. In one embodiment, the pre-metal dielectric structure includes a first pre-metal dielectric layer, an amorphous silicon layer located over the first pre-metal dielectric layer, and a second pre-metal dielectric layer located over the amorphous silicon layer. | 01-08-2009 |
| 20080242033 | Self-Aligned LDMOS Fabrication Method Integrated Deep-Sub-Micron VLSI Process, Using A Self-Aligned Lithography Etches And Implant Process - An integrated circuit includes both LDMOS devices and one or more low-power CMOS devices that are concurrently formed on a substrate using a deep sub-micron VLSI fabrication process. The LDMOS polycrystalline silicon (polysilicon) gate structure is patterned using a two-mask etching process. The first etch mask is used to define a first edge of the gate structure located away from the deep body/drain implant. The second etch mask is then used to define a second edge of the gate structure, and the second etch mask is then retained on the gate structure during subsequent formation of the deep body/drain implant. After the deep implant, shallow implants and metallization are formed to complete the LDMOS device. | 10-02-2008 |
| 20080237653 | Deep Implant Self-Aligned To Polysilicon Gate - A CMOS image sensor includes a pinned photodiode and a transfer gate that are formed using a thick mask that is self-aligned to at least one edge of the polysilicon gate structure to facilitate both the formation of a deep implant and to provide proper alignment between the photodiode implant and the gate. In one embodiment a drain side implant is formed concurrently with the deep n-type implant of the photodiode. After the deep implant, the mask is removed and a shallow p+ implant is formed to complete the photodiode. In another embodiment, the polysilicon is etched to define only a drain side edge, a shallow drain side implant is performed, and then a thick mask is provided and used to complete the gate structure, and is retained during the subsequent high energy implant. Alternatively, the high energy implant is performed prior to the shallow drain side implant. | 10-02-2008 |
