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TOSOH COPORATION
| TOSOH COPORATION Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090008366 | ETCHING COMPOSITION AND METHOD FOR ETCHING A SUBSTRATE - This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound. | 01-08-2009 |