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TOKYO OHKAKOGYO CO.,LTD.

TOKYO OHKAKOGYO CO.,LTD. Patent applications
Patent application numberTitlePublished
20090035697NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A chemically amplified negative resist composition is provided in addition to a method of forming a resist pattern from which a desirable pattern shape can be obtained. A negative resist composition in which a resin component (A) contains a resin component (A1) having a structural unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group and a structural unit (a2) derived from an acrylic acid ester and containing a hydroxyl group-containing alicyclic group; and an acid generator component (B) contains an acid generator (B1) expressed by the following general formula (B1):02-05-2009