TOKYO ELECTRON LTD.
|TOKYO ELECTRON LTD. Patent applications|
|Patent application number||Title||Published|
|20130340837||DEVICE AND METHOD FOR SUPPLYING GAS WHILE DIVIDING TO CHAMBER FROM GAS SUPPLYING FACILITY EQUIPPED WITH FLOW CONTROLLER - The invention supplies a quantity Q of gas while dividing at flow rate ratio Q||12-26-2013|
|20130220451||FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP||08-29-2013|
|20110094596||Apparatus and method of dividing and supplying gas to a chamber from a gas supply apparatus equipped with flow-rate control system - The present-invention supplies a quantity Q of gas while dividing at flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller. A a total quantity Q=Q1+Q2 of gas is supplied into a chamber at flow rate Q1 and Q2 through shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GL||04-28-2011|
|20100139775||FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow control device enabling a reduction in size and an installation cost by accurately controlling the flow of a fluid in a wide flow range. Specifically, the flow of the fluid flowing in an orifice (||06-10-2010|
Patent applications by TOKYO ELECTRON LTD.