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TOKYO ELECTRON LTD.
TOKYO, JP
| TOKYO ELECTRON LTD. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110094596 | Apparatus and method of dividing and supplying gas to a chamber from a gas supply apparatus equipped with flow-rate control system - The present-invention supplies a quantity Q of gas while dividing at flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller. A a total quantity Q=Q1+Q2 of gas is supplied into a chamber at flow rate Q1 and Q2 through shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GL | 04-28-2011 |
| 20100139775 | FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow control device enabling a reduction in size and an installation cost by accurately controlling the flow of a fluid in a wide flow range. Specifically, the flow of the fluid flowing in an orifice ( | 06-10-2010 |