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TOKYO CHKA KOGYO CO., LTD
| TOKYO CHKA KOGYO CO., LTD Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090117488 | COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD - The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. | 05-07-2009 |