| 20110204470 | METHOD, SYSTEM, AND APPARATUS FOR ADJUSTING LOCAL AND GLOBAL PATTERN DENSITY OF AN INTEGRATED CIRCUIT DESIGN - An integrated circuit (IC) design method providing a circuit design layout having a plurality of functional blocks disposed a distance away from each other; identifying a local pattern density to an approximate dummy region, on the circuit design layout, within a predefined distance to one of the functional blocks; performing a local dummy insertion to the approximate dummy region according to the local pattern density; repeating the identifying and performing to at least some other of the functional blocks; and implementing a global dummy insertion to a non-local dummy region according to a global pattern density. | 08-25-2011 |
