| SuVolta, Inc. Patent applications |
| Patent application number | Title | Published |
| 20120009743 | DYNAMIC RANDOM ACCESS MEMORY HAVING JUNCTION FIELD EFFECT TRANSISTOR CELL ACCESS DEVICE - A method of fabricating a dynamic random access memory (DRAM) can include depositing a semiconductor electrode layer in contact with a surface of a semiconductor substrate; patterning the electrode layer to form a plurality of access junction field effect transistor (JFET) gate electrodes and a plurality of sense amplifier bipolar junction transistor (BJT) electrodes; and forming a charge storage structure coupled to a source of each access JFET. | 01-12-2012 |
| 20110309450 | SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATION THEREOF WITH MIXED METAL TYPES - A semiconductor structure includes a first PMOS transistor element having a gate region with a first gate metal associated with a PMOS work function and a first NMOS transistor element having a gate region with a second metal associated with a NMOS work function. The first PMOS transistor element and the first NMOS transistor element form a first CMOS device. The semiconductor structure also includes a second PMOS transistor that is formed in part by concurrent deposition with the first NMOS transistor element of the second metal associated with a NMOS work function to form a second CMOS device with different operating characteristics than the first CMOS device. | 12-22-2011 |
| 20110303955 | Junction Field Effect Transistor Having A Double Gate Structure And Method of Making Same - A junction field effect transistor includes a channel region, a gate region coupled to the channel region, a well tap region coupled to the gate region and the channel region, and a well region coupled to the well tap region and the channel region. A double gate operation is achieved by this structure as a voltage applied to the gate region is also applied to the well region through the well tap region in order to open the channel from both the gate region and the well region. | 12-15-2011 |
| 20110074498 | Electronic Devices and Systems, and Methods for Making and Using the Same - A suite of novel structures and methods is provided to reduce power consumption in a wide array of electronic devices and systems. Some of these structures and methods can be implemented largely by reusing existing bulk CMOS process flows and manufacturing technology, allowing the semiconductor industry as well as the broader electronics industry to avoid a costly and risky switch to alternative technologies. As will be discussed, some of the structures and methods relate to a Deeply Depleted Channel (DDC) design, allowing CMOS based devices to have a reduced σV | 03-31-2011 |
| 20100315128 | CIRCUIT CONFIGURATIONS HAVING FOUR TERMINAL DEVICES - Circuits using four terminal transistors are disclosed. Such circuits can include various static and dynamic logic circuits, flip-flops, multiplexer, tri-state driver, phase detector, logic having variable speeds of operation, and/or analog circuit with such four terminal transistors operating in a linear or nonlinear mode. | 12-16-2010 |
| 20100149854 | SEMICONDUCTOR DEVICE STORAGE CELL STRUCTURE, METHOD OF OPERATION, AND METHOD OF MANUFACTURE - A method of fabricating an integrated circuit device storage cell may include forming a channel region comprising a semiconductor material doped to a first conductivity type; forming a store gate structure comprising a semiconductor material doped to a second conductivity type in contact with the channel region; and forming a control gate terminal from at least a portion of a semiconductor layer deposited on a substrate surface in contact with the channel region, the portion of the semiconductor layer being doped to the second conductivity type. | 06-17-2010 |