| 20110089031 | Sputtering System with Normal Target and Slant Targets on the Side - A sputtering system aimed for sputtering workpieces that have non-planar surfaces, such as concaves, pillars, and steps of a case of a laptop. The sputtering system comprises a sputtering chamber including a carrier, a first sputtering source, and a second sputtering source. The first sputtering source is located over the carrier main to sputter planar portion of the workpiece. The second sputtering source is inclined at an angle so as to sputter the vertical portion of the workpiece. | 04-21-2011 |
