STMicroelectronics Crolles 2 SAS Patent applications |
Patent application number | Title | Published |
20160133700 | NANOWIRE AND PLANAR TRANSISTORS CO-INTEGRATED ON UTBOX SOI SUBSTRATE - Fabrication of a microelectronic device on a semiconductor on insulator type substrate, the device being provided with a transistor of a given type, the channel structure of which is formed from semiconducting bar(s), a dielectric area different from the insulating layer of the substrate being provided to replace the insulating layer, facing the transistor channel structure, specifically for this given type of transistor. | 05-12-2016 |
20160099278 | BACK-ILLUMINATED INTEGRATED IMAGING DEVICE WITH SIMPLIFIED INTERCONNECT ROUTING - A back-illuminated integrated imaging device is formed from a semiconductor substrate including a zone of pixels bounded by capacitive deep trench isolations. A peripheral zone is located outside the zone of pixels. A continuous electrically conductive layer forms, in the zone of pixels, an electrode in a trench for each capacitive deep trench isolation, and forms, in the peripheral zone, a redistribution layer for electrically coupling the electrode to a biasing contact pad. The electrode is located in the trench between a trench dielectric and at least one material for filling the trench. | 04-07-2016 |
20160079984 | DEVICE FOR GENERATING A CLOCK SIGNAL BY FREQUENCY MULTIPLICATION - A pulse signal generator has an input receiving an initial pulse signal having an initial period, an oscillator generating an oscillator signal, a first stage and a second stage. The first stage is synchronized with the oscillator signal and configured to deliver a secondary pulse signal having a separation between successive pulses that is representative of an integer part of a division of the initial period by an integer N. The first stage further delivers an auxiliary signal representative of a fractional part of the division and containing, for each pulse of the secondary pulse signal, an indication of a time shift to be applied to the pulse taking into account the separation. The second stage is configured to receive the successive pulses and the corresponding time shift indications and generate successive corresponding pulses of an output pulse signal. | 03-17-2016 |
20160042955 | METHOD OF MAKING A TRANSISTOR - The invention relates to a method for manufacturing a transistor comprising the preparation of a stack of layers of the semiconductor on insulator type comprising at least one substrate on which an insulating layer and an initial semiconductor layer are successively disposed. The method includes the formation of at least one oxide pad extending from a top face of the insulating layer, the formation of an additional layer made from semiconductor material covering the oxide pad and intended to form a channel for the transistor, the formation of a gate stack above the oxide pad, and the formation of a source and drain on either side of the gate stack. | 02-11-2016 |
20160005862 | GENERATION OF LOCALIZED STRAIN IN A SOI SUBSTRATE - Method to strain a channel zone of a transistor of the semiconductor on insulator type transistor that makes use of an SMT stress memorisation technique in which regions located under the insulation layer of the substrate (FIG. | 01-07-2016 |
20150340269 | METHOD OF PLANARIZING RECESSES FILLED WITH COPPER - A structure includes a substrate having an upper surface provided with recesses and coated with a continuous barrier layer topped with a continuous copper layer filling at least the recesses. The structure is planarized by: a) chemical-mechanical polishing of the copper, such a polishing being selective with respect to the barrier layer so that copper remains in the recesses and is set back with respect to the upper surface of the substrate; b) depositing on the exposed surface of the structure a material covering at least the copper at the level of the recesses; and c) chemical-mechanical planarizing of the structure to expose the substrate with the copper remaining buried under the material. Two such structures are then direct bonded to each other with opposite areas of material having a same topology. | 11-26-2015 |
20150311277 | PMOS TRANSISTOR WITH IMPROVED MOBILITY OF THE CARRIERS - A substrate includes an active region oriented along a crystallographic face (100) and limited by an insulating region. A MOS transistor includes a channel oriented longitudinally along a crystallographic direction of the <110> type. A basic pattern made of metal and formed in the shape of a T is electrically inactive and situated over an area of the insulating region adjacent a transverse end of the channel. A horizontal branch of the T-shaped basic pattern is oriented substantially parallel to the longitudinal direction of the channel. | 10-29-2015 |
20150300328 | THERMOELECTRIC GENERATOR COMPRISING A DEFORMABLE BY-LAYER MEMBRANE EXHIBITING MAGNETIC PROPERTIES - An electrical generator is composed of a bi-layer membrane enabling the conversion of a thermal energy into electrical energy. The bi-layer membrane is deformable and includes at least two layers having different thermal expansion coefficients. The membrane moves between positions in a reversible fashion in response to heat dissipation and as a function of two flexing temperatures. A magnetic structure associated with the membrane functions to set the flexing temperatures as a function of ambient temperature. | 10-22-2015 |
20150287689 | INTEGRATED CIRCUIT CHIP AND FABRICATION METHOD - An integrated circuit chip includes a substrate die and integrated circuits and a layer incorporating a front electrical interconnect network formed on a front face of the substrate die. A local electrical connection via made of an electrically conductive material is formed in a hole of the substrate die. The via is linked to a connection portion of the electrical interconnect network. An electrical connection pillar made of an electrically conductive material is formed on a rear part of the electrical connection via. A local external protection layer at least partly covers the electrical connection via and the electrical connection pillar. | 10-08-2015 |
20150270192 | INTEGRATED CIRCUIT CHIP ASSEMBLED ON AN INTERPOSER - A device includes a chip assembled on an interposer. An electrically-insulating layer coats an upper surface of the interposer around the chip. First metal lines run on the upper surface of the interposer and are arranged between conductive elements of connection to the chip. An end of each first metal line is arranged to extend beyond a projection of the chip on the interposer. A thermally-conductive via connects the end of the first metal line to a heat sink supported at an upper surface of the device. | 09-24-2015 |
20150162433 | METHOD FOR THE FORMATION OF A FINFET DEVICE WITH EPITAXIALLY GROWN SOURCE-DRAIN REGIONS HAVING A REDUCED LEAKAGE PATH - Elongated fins of a first semiconductor material are insulated from and formed over an underlying substrate layer (of either SOI or bulk type). Elongated gates of a second semiconductor material are then formed to cross over the elongated fins at channel regions, and the gate side walls are covered by sidewall spacers. A protective material is provided to cover the underlying substrate layer and define sidewall spacers on side walls of the elongated fins between the elongated gates. The first semiconductor material and insulating material of the elongated fins located between the protective material sidewall spacers (but not under the elongated gates) is removed to form trenches aligned with the channel regions. Additional semiconductor material is then epitaxially grown inside each trench between the elongated gates to form source-drain regions adjacent the channel regions formed by the elongated fins of the first semiconductor material located under the elongated gates. | 06-11-2015 |
20150155319 | METHOD FOR PRODUCING AN INTEGRATED IMAGING DEVICE WITH FRONT FACE ILLUMINATION COMPRISING AT LEAST ONE METAL OPTICAL FILTER, AND CORRESPONDING DEVICE - An integrated imaging device supports front face illumination with one or more photosensitive regions formed in a substrate. A lower dielectric region is provided over the substrate, the lower dielectric region having an upper face. A metal optical filter having a metal pattern is provided on the upper face (or extending into the lower dielectric region from the upper face). An upper dielectric region is provided on top of the lower dielectric region and metal optical filter. The lower dielectric region is at least part of a pre-metal dielectric layer, and the upper dielectric region is at least part of a metallization layer. | 06-04-2015 |
20150137133 | FORMING OF A HEAVILY-DOPED SILICON LAYER ON A MORE LIGHTLY-DOPED SILICON SUBSTRATE - A method of forming a heavily-doped silicon layer on a more lightly-doped silicon substrate including the steps of depositing a heavily-doped amorphous silicon layer; depositing a silicon nitride layer; and heating the amorphous silicon layer to a temperature higher than or equal to the melting temperature of silicon. | 05-21-2015 |
20150115769 | SYSTEM FOR CONVERSING THERMAL ENERGY INTO ELECTRICAL ENERGY - An assembly converting thermal energy into electrical energy including: at least one temperature sensitive bimetallic strip arranged in a space delimited by a hot source and a cold source facing each other, the bimetallic strip extending along a longitudinal axis; at least one suspended element fixed in movement to the sensitive element and extending laterally from the sensitive element and including a free end; and at least one piezoelectric element suspended from a part fixed relative to the sensitive element and vibrated by the suspended element such that it is vibrated when the bimetallic strip changes configuration and the suspended element comes into contact with the piezoelectric element, the piezoelectric element being located outside the space defined between the bimetallic strip and the hot source and outside the space between the bimetallic strip and the cold source. | 04-30-2015 |
20150097241 | METHOD FOR RELAXING THE TRANSVERSE MECHANICAL STRESSES WITHIN THE ACTIVE REGION OF A MOS TRANSISTOR, AND CORRESPONDING INTEGRATED CIRCUIT - The transverse mechanical stress within the active region of a MOS transistor is relaxed by forming an insulating incursion, such as an insulated trench, within the active region of the MOS transistor. The insulated incursion is provided at least in a channel region of the MOS transistor so as to separate the channel region into two parts. The insulated incursion is configured to extend in a direction of a length of the MOS transistor. The insulated incursion may further extend into one or more of a source region or drain region located adjacent the channel region of the MOS transistor. | 04-09-2015 |
20150091089 | AIR-SPACER MOS TRANSISTOR - A MOS transistor has a gate insulator layer that is made of a material of high dielectric constant deposited on a substrate. The gate insulator layer extends, with a constant thickness, under and beyond a gate stack. Spacers of low dielectric constant are formed on either side of the gate stack and vertically separated from the substrate by the extension of the gate insulator layer beyond the sides of the gate stack. The spacers of low dielectric constant are preferably air spacers. | 04-02-2015 |
20150083900 | PROXIMITY SENSOR INCLUDING REFERENCE DETECTOR FOR STRAY RADIATION DETECTION - A proximity sensor includes a radiation source configured to emit a primary radiation beam and a primary detector configured to pick up a reflected primary radiation beam. The radiation source is further configured to emit stray radiation. The sensor further includes a reference detector arranged to receive the stray radiation. The stray radiation may, for example, be emitted from either a side of the radiation source or a bottom of the radiation source. | 03-26-2015 |
20150076573 | METHOD FOR PRODUCING AN OPTICAL FILTER IN AN INTEGRATED CIRCUIT, AND CORRESPONDING INTEGRATED CIRCUIT - An integrated circuit includes a substrate and an interconnect part above the substrate, and further includes a photosensitive region in the substrate. A filter is provided aligned with the photosensitive region. The filter is formed by at least one layer of filter material. In one implementation for front side illumination, the layer of filter material is positioned above the photosensitive region between the interconnect part and the substrate. In another implementation for back side illumination, the layer of filter material is positioned below the photosensitive region opposite the interconnect part. The layer of filter material is configured such that a product of the thickness of the layer of filter material and the imaginary part of the refractive index of the layer of filter material is above 1 nm. | 03-19-2015 |
20150075749 | INTEGRATED CIRCUIT CHIP COOLING DEVICE - An integrated circuit chip cooling device includes a network of micropipes. A first pipe portion and a second pipe portion of the network are connected by at least one valve. The valve is formed of a bilayer strip. In response to change in temperature, the shape of the bilayer strip changes to move the valve from a substantially closed position to an open position. In one configuration, the change is irreversible. In another configuration, the change is reversible in response to an opposite change in temperature. | 03-19-2015 |
20150054140 | STACK OF SEMICONDUCTOR STRUCTURES AND CORRESPONDING MANUFACTURING METHOD - A stack of a first and second semiconductor structures is formed. Each semiconductor structure includes: a semiconductor bulk, an overlying insulating layer with metal interconnection levels, and a first surface including a conductive area. The first surfaces of semiconductor structures face each other. A first interconnection pillar extends from the first surface of the first semiconductor structure. A housing opens into the first surface of the second semiconductor structure. The housing is configured to receive the first interconnection pillar. A second interconnection pillar protrudes from a second surface of the second semiconductor structure which is opposite the first surface. The second interconnection pillar is in electric contact with the first interconnection pillar. | 02-26-2015 |
20150054042 | PHOTODIODE OF HIGH QUANTUM EFFICIENCY - A photodiode includes at least one central pad arranged on a light-receiving surface of a photodiode semiconductor substrate. The pad is made of a first material and includes lateral sidewalls surrounded by a spacer made of a second material having a different optical index than the first material. The lateral dimensions of the pad are smaller than an operating wavelength of the photodiode. Both the first and second materials are transparent to that operating wavelength. The pads and spacers are formed at a same time gate electrodes and sidewall spacers of MOS transistors are formed. | 02-26-2015 |
20150053924 | SPAD PHOTODIODE OF HIGH QUANTUM EFFICIENCY - A SPAD-type photodiode has a semiconductor substrate with a light-receiving surface. A lattice formed of interlaced strips made of a first material covers the light receiving surface. The lattice includes lattice openings with lateral walls covered by a spacer made of a second material. Then first and second materials have different optical indices, and further each optical index is less than or equal to the substrate optical index. A pitch of the lattice is of the order of a magnitude of an operating wavelength of the photodiode. The first and second materials are transparent at that operating wavelength. The lattice is made of a conductive material electrically coupled to an electrical connection node (for example, a bias voltage node). | 02-26-2015 |
20150042205 | DEVICE FOR CONVERTING THERMAL POWER INTO ELECTRIC POWER - A device for converting thermal power into electric power includes many conversion cells arranged inside and on top of a substrate. Each conversion cell includes a curved bimetal strip and first and second diodes coupled to the bimetal strip. The diodes are arranged in a semiconductor region of the substrate. | 02-12-2015 |
20150035106 | BACK SIDE ILLUMINATION IMAGE SENSOR WITH LOW DARK CURRENT - An integrated circuit includes a back side illuminated image sensor formed by a substrate supporting at least one pixel, an interconnect part situated above a front side of the substrate and an anti-reflective layer situated above a back side of the substrate. The anti-reflective layer may be formed of a silicon nitride layer. An additional layer is situated above the anti-reflective layer. The additional layer is formed of one of amorphous silicon nitride or hydrogenated amorphous silicon nitride, in which the ratio of the number of silicon atoms per cubic centimeter to the number of nitrogen atoms per cubic centimeter is greater than 0.7. | 02-05-2015 |
20150022987 | ELECTRONIC DEVICE COMPRISING AN INTEGRATED CIRCUIT CHIP PROVIDED WITH PROJECTING ELECTRICAL CONNECTION PADS - An electronic device includes an integrated circuit chip with an insulating passivation layer. An opening in the passivation layer uncovers a first region of an electrical contact. An electrical connection pad is formed to fill the opening by covering the first region and extend in projection in such a way as to cover a second region situated on the passivation layer surrounding the opening. The periphery of at least one of the first and second regions has an elongate or oblong shape. Centers of the opening and the pad are aligned with each other. | 01-22-2015 |
20150021692 | METHOD OF LOCALIZED MODIFICATION OF THE STRESSES IN A SUBSTRATE OF THE SOI TYPE, IN PARTICULAR FD SOI TYPE, AND CORRESPONDING DEVICE - A substrate of the silicon on insulator type includes a semi-conducting film disposed on a buried insulating layer which is disposed on an unstressed silicon support substrate. The semi-conducting film includes a first film zone of tensile-stressed silicon and a second film zone of tensile-relaxed silicon. Openings through the buried insulating layer permit access to the unstressed silicon support substrate under the first and second film zones. An N channel transistor is formed from the first film zone and a P channel transistor is formed from the second film zone. The second film zone may comprise germanium enriched silicon forming a compressive-stressed region. | 01-22-2015 |
20150015112 | THERMO-MECHANO-ELECTRICAL CONVERTER - A thermo-mechano-electric converter including a plurality of shape memory bistable elements embedded in a resilient material intimately associated with a piezoelectric material. | 01-15-2015 |
20140374574 | FORMING OF A NANOSTRUCTURED SPECTRAL FILTER - A spectral filter includes an assembly of filtering cells. Each cell has a same nanostructured pattern and a preferential direction of the pattern. This preferential direction is, for each cell, oriented approximately radially with respect to a single point of the spectral filter. Alternatively, this preferential direction is, for each cell, oriented approximately ortho-radially with respect to the single point of the spectral filter. The single point may be a center point. Alternatively, the single point may correspond to an optical axis of a lens element associated with the spectral filter. | 12-25-2014 |
20140370668 | METHOD OF MAKING A TRANSITOR - The invention relates to a method for manufacturing a transistor comprising the preparation of a stack of layers of the semiconductor on insulator type comprising at least one substrate on which an insulating layer and an initial semiconductor layer are successively disposed. The method includes the formation of at least one oxide pad extending from a top face of the insulating layer, the formation of an additional layer made from semiconductor material covering the oxide pad and intended to form a channel for the transistor, the formation of a gate stack above the oxide pad, and the formation of a source and drain on either side of the gate stack. | 12-18-2014 |
20140370666 | METHOD OF MAKING A SEMICONDUCTOR LAYER HAVING AT LEAST TWO DIFFERENT THICKNESSES - A method is provided for producing a semiconductor layer having at least two different thicknesses from a stack of the semiconductor on insulator type including at least one substrate on which an insulating layer and a first semiconductor layer are successively disposed, the method including etching the first layer so that said layer is continuous and includes at least one first region having a thickness less than that of at least one second region; oxidizing the first layer to form an electrically insulating oxide film on a surface thereof so that, in the first region, the oxide film extends as far as the insulating layer; partly removing the oxide film to bare the first layer outside the first region; forming a second semiconductor layer on the stack, to form, with the first layer, a third continuous semiconductor layer having a different thickness than that of the first and second regions. | 12-18-2014 |
20140367828 | PROCESS FOR PRODUCING A THROUGH-SILICON VIA AND A THROUGH-SILICON CAPACITOR IN A SUBSTRATE, AND CORRESPONDING DEVICE - A device includes a substrate and an integrated-circuit interconnect on a first side. A capacitor passes through the substrate possessing a first electrode having a first contact face electrically coupled to a first electrically conductive zone placed on a second side of the substrate and a second electrode electrically coupled to the interconnect. A through-silicon via passes through the substrate having at one end a first contact face electrically coupled to a second electrically conductive zone placed on said second side of the substrate and at the other end a part electrically coupled to the interconnect part. The two first contact faces are located in the same plane. | 12-18-2014 |
20140361440 | PROCESS FOR PRODUCING AT LEAST ONE THROUGH-SILICON VIA WITH IMPROVED HEAT DISSIPATION, AND CORRESPONDING THREE-DIMENSIONAL INTEGRATED STRUCTURE - A method for producing at least one through-silicon via inside a substrate may include forming a cavity in the substrate from a first side of the substrate until an electrically conductive portion is emerged onto. The method may also include forming an electrically conductive layer at a bottom and on walls of the cavity, and at least partly on a first side outside the cavity. The process may further include at least partially filling the cavity with at least one phase-change material. Another aspect is directed to a three-dimensional integrated structure. | 12-11-2014 |
20140361413 | PROCESS FOR FABRICATING A THREE-DIMENSIONAL INTEGRATED STRUCTURE WITH IMPROVED HEAT DISSIPATION, AND CORRESPONDING THREE-DIMENSIONAL INTEGRATED STRUCTURE - A three-dimensional integrated structure includes a first integrated circuit having a substrate assembled in an interlocking manner with a second integrated circuit having a substrate. The substrate of the first integrated circuit comprises first pores separated by first partitions, and the substrate of the second integrated circuit comprises second pores separated by second partitions. The first partitions interlock with the second pores and the second partitions interlock with the first pores so as to define at least one region bounded by the two substrates. A phase-change material is retained within the at least one region. | 12-11-2014 |
20140342524 | INTEGRATED CIRCUIT COMPRISING AN ISOLATING TRENCH AND CORRESPONDING METHOD - An integrated circuit including at least one isolating trench that delimits an active area made of a monocrystalline semiconductor material, the or each trench comprising an upper portion including an insulating layer that encapsulates a lower portion of the trench, the lower portion being at least partly buried in the active area and the encapsulation layer comprising nitrogen or carbon. | 11-20-2014 |
20140340133 | RADIATION HARDENED CIRCUIT - A circuit including a data storage element; first and second input circuitry coupled respectively to first and second inputs of the data storage element and each including a plurality of components adapted to generate, as a function of an initial signal, first and second input signals respectively provided to the first and second inputs; wherein the data storage element includes a first storage node and is configured such that a voltage state stored at the first storage node is protected from a change in only one of the first and second input signals by being determined by the conduction state of a first transistor coupled to the first storage node and controlled based on the first input signal and by the conduction state of a second transistor coupled to the first storage node and controlled based on the second input signal. | 11-20-2014 |
20140326955 | PLANAR TRANSISTORS WITH NANOWIRES COINTEGRATED ON A SOI UTBOX SUBSTRATE - Fabrication of a microelectronic device on a semiconductor on insulator type substrate, the device being provided with a transistor of a given type, the channel structure of which is formed from semiconducting bar(s), a dielectric area different from the insulating layer of the substrate being provided to replace the insulating layer, facing the transistor channel structure, specifically for this given type of transistor. | 11-06-2014 |
20140319616 | METHOD FOR PRODUCING A METAL-GATE MOS TRANSISTOR, IN PARTICULAR A PMOS TRANSISTOR, AND CORRESPONDING INTEGRATED CIRCUIT - At least one MOS transistor is produced by forming a dielectric region above a substrate and forming a gate over the dielectric region. The gate is formed to include a metal gate region. Formation of the metal gate region includes: forming a layer of a first material configured to reduce an absolute value of a threshold voltage of the transistor, and configuring a part of the metal gate region so as also to form a diffusion barrier above the layer of the first material. Then, doped source and drain regions are formed using a dopant activation anneal. | 10-30-2014 |
20140291778 | INTEGRATED DEVICE OF A CAPACITIVE TYPE FOR DETECTING HUMIDITY, IN PARTICULAR MANUFACTURED USING A CMOS TECHNOLOGY - An integrated capacitive-type humidity sensor formed in a semiconductor chip integrating a sensing capacitor and a reference capacitor. Each of the sensing and reference capacitors have at least a first electrode and at least a second electrode, the first and second electrodes of each of the sensing and reference capacitors being arranged at distance and mutually insulated. A hygroscopic layer extends on the sensing and reference capacitors and a conductive shielding region extends on the reference capacitor but not on the sensing capacitor. | 10-02-2014 |
20140283367 | SUPPORT FOR CAPILLARY SELF-ASSEMBLY WITH HORIZONTAL STABILISATION, FABRICATION METHOD AND USE - Support comprising a reception zone in which the external envelope matches the shape of a plate (P | 09-25-2014 |
20140217541 | BACK-SIDE ILLUMINATED IMAGE SENSOR WITH A JUNCTION INSULATION - A method for forming a back-side illuminated image sensor, including the steps of: a) forming, from the front surface, doped polysilicon regions, of a conductivity type opposite to that of the substrate, extending in depth orthogonally to the front surface and emerging into the first layer; b) thinning the substrate from its rear surface to reach the polysilicon regions, while keeping a strip of the first layer; c) depositing, on the rear surface of the thinned substrate, a doped amorphous silicon layer, of a conductivity type opposite to that of the substrate; and d) annealing at a temperature capable of transforming the amorphous silicon layer into a crystallized layer. | 08-07-2014 |
20140217520 | AIR-SPACER MOS TRANSISTOR - A MOS transistor including, above a gate insulator, a conductive gate stack having a height, a length, and a width, this stack having a lower portion close to the gate insulator and an upper portion, wherein the stack has a first length in its lower portion, and a second length shorter than the first length in its upper portion. | 08-07-2014 |
20140210071 | INTEGRATED STRUCTURE WITH IMPROVED HEAT DISSIPATION - An integrated structure includes a support supporting at least one chip and a heat dissipating housing, attached to the chip. The housing is thermally conductive and has a thermal expansion compatible with the chip. The housing may further including closed cavities filled with a phase change material. | 07-31-2014 |
20140183778 | METHOD FOR MAKING A STRUCTURE FOR RESUMING CONTACT - A method for making a conducting structure comprising steps of:
| 07-03-2014 |
20140170834 | METHOD FOR MANUFACTURING A HYBRID SOI/BULK SEMICONDUCTOR WAFER - A method for manufacturing a hybrid SOI/bulk substrate, including the steps of starting from an SOI wafer comprising a single-crystal semiconductor layer called SOI layer, on an insulating layer, on a single-crystal semiconductor substrate; depositing on the SOI layer at least one masking layer and forming openings crossing the masking layer, the SOI layer, and the insulating layer, to reach the substrate; growing by a repeated alternation of selective epitaxy and partial etching steps a semiconductor material; and etching insulating trenches surrounding said openings filled with semiconductor material, while encroaching inwards over the periphery of the openings. | 06-19-2014 |
20140145897 | ANTENNA CIRCUIT USING MULTIPLE INDEPENDENT ANTENNAS SIMULTANEOUSLY THROUGH A SINGLE FEED - An antenna circuit includes a first antenna tuned to a first fundamental frequency and a second antenna tuned to a second fundamental frequency different from the first fundamental frequency. A first filter has a first terminal connected to the first antenna and attenuates the frequency components outside of a band defined by the first fundamental frequency or its harmonics. A second filter has a first terminal coupled to the second antenna and attenuates the frequency components outside of a band defined by the second fundamental frequency or its harmonics. A passive recombination element couples the second terminals of the two filters to a common terminal. | 05-29-2014 |
20140145251 | METHOD FOR FORMING AN INSULATING TRENCH IN A SEMICONDUCTOR SUBSTRATE AND STRUCTURE, ESPECIALLY CMOS IMAGE SENSOR, OBTAINED BY SAID METHOD - A structure comprising at least one DTI-type insulating trench in a substrate, the trench being at the periphery of at least one active area of the substrate forming a pixel, the insulating trench including a cavity filled with a dielectric material, the internal walls of the cavity being covered with a layer made of a boron-doped material. | 05-29-2014 |
20140124866 | INTEGRATED CIRCUIT COMPRISING A MOS TRANSISTOR HAVING A SIGMOID RESPONSE AND CORRESPONDING METHOD OF FABRICATION - An integrated circuit may include at least one MOS transistor having a sigmoid response. The at least one MOS transistor may include a substrate, a source region, a drain region, a gate region, and insulating spacer regions on either side of the gate region. The substrate may include a first region situated under the gate region between the insulating spacer regions. At least one of the source and drain regions may be separated from the first region of the substrate by a second region of the substrate situated under an insulating spacer region, which may be of a same type of conductivity as the first region of the substrate. | 05-08-2014 |
20140106529 | FINFET DEVICE WITH SILICIDED SOURCE-DRAIN REGIONS AND METHOD OF MAKING SAME USING A TWO STEP ANNEAL - A thermal annealing flow process includes the steps of: depositing a metal or metal alloy on a silicon semiconductor structure, performing a first annealing of a rapid thermal anneal (RTA) type to produce a metal rich phase in a portion of the silicon semiconductor structure, removing unreacted metal or metal alloy and performing a second annealing as a millisecond annealing at a temperature that is below a melt temperature of the silicon material present in the silicon semiconductor structure. | 04-17-2014 |
20140091451 | SEMICONDUCTOR DEVICE COMPRISING A CRACK STOP STRUCTURE - A semiconductor device may include at least one pad adjacent a top surface of the device, and a metal crack stop structure below the at least one pad. The metal crack structure may have an inner envelope and an outer envelope, and may be configured to be vertically aligned with the at least one pad so that an edge of the at least one pad is between the inner and outer envelopes. | 04-03-2014 |
20140075726 | METHOD FOR MANUFACTURING BAW RESONATORS ON A SEMICONDUCTOR WAFER - A method for manufacturing a wafer on which are formed resonators, each resonator including, above a semiconductor substrate, a stack of layers including, in the following order from the substrate surface: a Bragg mirror; a compensation layer made of a material having a temperature coefficient of the acoustic velocity of a sign opposite to that of all the other stack layers; and a piezoelectric resonator, the method including the successive steps of: a) depositing the compensation layer; and b) decreasing thickness inequalities of the compensation layer due to the deposition method, so that this layer has a same thickness to within better than 2%, and preferably to within better than 1%, at the level of each resonator. | 03-20-2014 |
20140070317 | METHOD FOR MANUFACTURING A SUSPENDED MEMBRANE AND DUAL-GATE MOS TRANSISTOR - A method for manufacturing a suspended membrane in a single-crystal semiconductor substrate, including the steps of: forming in the substrate an insulating ring delimiting an active area, removing material from the active area, successively forming in the active area a first and a second layers, the second layer being a single-crystal semiconductor layer, etching a portion of the internal periphery of said ring down to a depth greater than the thickness of the second layer, removing the first layer so that the second layer formed a suspended membrane anchored in the insulating ring. | 03-13-2014 |
20140070163 | PHASE-CHANGE MEMORY CELL - A memory cell including a via made of a phase-change material arranged between a lower electrode and an upper electrode, wherein the via includes a first region adjacent to a second region itself adjacent to at least one third region, the first, second, and third regions each extending from the upper electrode to the lower electrode, the crystallization temperature of the second region ranging between that of the first region and that of the third region, and the melting temperatures of the first, second, and third regions being substantially identical. | 03-13-2014 |
20140070158 | PHASE-CHANGE MEMORY CELL - A memory cell including a via made of a phase-change material arranged between a lower electrode and an upper electrode, wherein the via includes a central region laterally surrounded with a peripheral region, the crystallization and melting temperatures of the central region being respectively lower than those of the peripheral region. | 03-13-2014 |
20140027886 | METHOD OF FABRICATING A DEVICE WITH A CONCENTRATION GRADIENT AND THE CORRESPONDING DEVICE - A semiconductive device is fabricated by forming, within a semiconductive substrate, at least one continuous region formed of a material having a non-uniform composition in a direction substantially perpendicular to the thickness of the substrate. | 01-30-2014 |
20140021586 | METHOD FOR MANUFACTURING A POLYCRYSTALLINE DIELECTRIC LAYER - A method manufactures a capacitor having polycrystalline dielectric layer between two metallic electrodes. The dielectric layer is formed by a polycrystalline growth of a dielectric metallic oxide on one of the metallic electrodes. At least one polycrystalline growth condition of the dielectric oxide is modified during the formation of the polycrystalline dielectric layer, which results in a variation of the polycrystalline properties of the dielectric oxide within the thickness of said layer. | 01-23-2014 |
20130292952 | DEVICE FOR CONVERTING THERMAL ENERGY INTO ELECTRIC ENERGY IN THE PRESENCE OF A HOT SOURCE - A device for converting thermal energy into electric energy intended to be used in combination with a hot source including: a capacitor of variable capacitance, including two electrodes separated by an electrically-insulating material, one of these electrodes being deformable and being associated with an element forming a bimetallic strip, said bimetallic strip including at least two layers of materials having different thermal expansion coefficients, said bimetallic strip being free to deform when it is submitted to the heat of said hot source; a second capacitor having a first electrode connected to a first electrode of said capacitor of variable capacitance; a harvesting circuit electrically connected between the second electrode of the capacitor of variable capacitance and the second electrode of the second capacitor, said harvesting circuit being capable of conducting the current flowing between said second electrodes. | 11-07-2013 |
20130292823 | STACK OF SEMICONDUCTOR STRUCTURES AND CORRESPONDING MANUFACTURING METHOD - A stack of a first and second semiconductor structures is formed. Each semiconductor structure includes: a semiconductor bulk, an overlying insulating layer with metal interconnection levels, and a first surface including a conductive area. The first surfaces of semiconductor structures face each other. A first interconnection pillar extends from the first surface of the first semiconductor structure. A housing opens into the first surface of the second semiconductor structure. The housing is configured to receive the first interconnection pillar. A second interconnection pillar protrudes from a second surface of the second semiconductor structure which is opposite the first surface. The second interconnection pillar is in electric contact with the first interconnection pillar. | 11-07-2013 |
20130288450 | SHALLOW TRENCH FORMING METHOD - A method for forming a trench filled with an insulator crossing a single-crystal silicon layer and a first SiO | 10-31-2013 |
20130280549 | CURVED PLATE AND METHOD OF FORMING THE SAME - A method of forming at least one curved plate having first and second layers, the first layer being formed of a first material and the second layer being formed of a second material, the method including forming one or more blocks of a fusible material on a surface of a substrate; baking the one or more blocks to deform their shape; and depositing the first and second materials over the one or more deformed blocks to form the first and second layers. | 10-24-2013 |
20130273440 | HOUSING, IN PARTICULAR FOR A BIOFUEL CELL - A housing includes a body with a first silicon element and a second porous silicon element, at least one first cavity provided in the porous silicon element, a first electrically conducting contact area electrically coupled to at least a portion of at least one internal wall of the at least one first cavity, and a second electrically conducting contact area electrically coupled to a different portion of the at least one internal wall of the second porous silicon element of the at least one first cavity, wherein the two contact areas are electrically isolated from each other. | 10-17-2013 |
20130270662 | IMAGE SENSOR OF CURVED SURFACE - A method for manufacturing an image sensor, including the steps of: forming elementary structures of an image sensor on the first surface of a semiconductor substrate; installing a handle on the first surface; defining trenches in the handle, the trenches forming a pattern in the handle; and installing, on a hollow curved substrate, the obtained device on the free surface side of the handle, the pattern being selected according to the shape of the support surface. | 10-17-2013 |
20130257219 | ENERGY HARVESTING DEVICE - An energy harvester including first and second sheets; and a plurality of walls, each wall being sandwiched between the first and second sheets and surrounding a cavity, wherein each cavity houses at least one curved plate adapted to change from a first shape to a second shape when its temperature reaches a first threshold and to return to the first shape when its temperature falls to a second threshold lower than said first threshold. | 10-03-2013 |
20130240999 | EFFECTING SELECTIVITY OF SILICON OR SILICON-GERMANIUM DEPOSITION ON A SILICON OR SILICON-GERMANIUM SUBSTRATE BY DOPING - A method for selective deposition of Si or SiGe on a Si or SiGe surface exploits differences in physico-chemical surface behavior according to a difference in doping of first and second surface regions. By providing at least one first surface region with a Boron doping of a suitable concentration range and exposing the substrate surface to a cleaning and passivating ambient atmosphere in a prebake step at a temperature lower or equal than 800° C., a subsequent deposition step of Si or SiGe will not lead to a layer deposition in the first surface region. This effect is used for selective deposition of Si or SiGe in the second surface region, which is not doped with Boron in the suitable concentration range, or doped with another dopant, or not doped. Several devices are, thus, provided. The method thus saves a usual photolithography sequence required for selective deposition of Si or SiGe in the second surface region according to the prior art. | 09-19-2013 |
20130207279 | METHOD FOR MANUFACTURING AN INTEGRATED CIRCUIT COMPRISING VIAS CROSSING THE SUBSTRATE - A method for forming an integrated circuit including the steps of:
| 08-15-2013 |
20130207268 | CHIP ASSEMBLY SYSTEM - An assembly of semiconductor wafers/chips wherein the adjacent surfaces of the two wafers/chips comprise an insulating layer having opposite copper pads inserted therein. The insulating layer is made of a material selected from the group including silicon nitride and silicon carbon nitride. | 08-15-2013 |
20130181220 | METHOD FOR ESTIMATING THE DIFFUSION LENGTH OF METALLIC SPECIES WITHIN A THREE-DIMENSIONAL INTEGRATED STRUCTURE, AND CORRESPONDING THREE-DIMENSIONAL INTEGRATED STRUCTURE - A three-dimensional integrated structure may include two assembled integrated circuits respectively including two metallic lines, and at least two cavities passing through one of the integrated circuits and opening onto two locations respectively in electrical contact with the two metallic lines. The cavities may be sized to place a measuring apparatus at the bottom of the cavities, and in electrical contact with the two locations. | 07-18-2013 |
20130180562 | TUNNEL-EFFECT POWER CONVERTER - A tunnel-effect power converter including first and second electrodes having opposite surfaces, wherein the first electrode includes protrusions extending towards the second electrode. | 07-18-2013 |
20130164658 | PROCESS AND SYSTEM FOR DESIGNING A PHOTOLITHOGRAPHY MASK AND A LIGHT SOURCE - A method for designing a photolithography mask and a light source may include designing an initial photolithography mask and an initial light source using an initial target pattern corresponding to a desired target pattern in a resist layer. The method may also include designing a new target pattern and designing a new photolithography mask and/or a new light source using the new target pattern. | 06-27-2013 |
20130157562 | WIRELESS DEVICE PAIRING - A wireless unit includes a first motion sensitive device; communications circuitry for wirelessly communicating with a further wireless unit; and a processing device configured to compare at least one first motion vector received from the first motion sensitive device with at least one second motion vector received from a second motion sensitive device of the further wireless unit. | 06-20-2013 |
20130154051 | METHOD FOR FORMING A DEEP TRENCH IN A MICROELECTRONIC COMPONENT SUBSTRATE - A trench is formed in a semiconductor substrate by depositing an etch mask on the substrate having an opening, etching of the trench through the opening, and doping the walls of the trench. The etching step includes a first phase having an etch power set to etch the substrate under the etch mask, and a second phase having an etch power set smaller than the power of the first phase. Further, the doping of the walls of the trench is applied through the opening of the etch mask. | 06-20-2013 |
20130121070 | Memory Device - A memory device includes first and second inverters cross-coupled between first and second nodes. The first inverter is configured to be supplied by a first supply voltage via a first transistor and the second inverter is configured to be supplied by the first supply voltage via a second transistor. A first control circuit is configured to control a gate node of the first transistor based on the voltage at the second node and at a gate node of the second transistor. A second control circuit is configured to control the gate node of the second transistor based on the voltage at the first node and at the gate node of the first transistor. | 05-16-2013 |
20130112974 | METHOD FOR DETERMINING THE LOCAL STRESS INDUCED IN A SEMICONDUCTOR MATERIAL WAFER BY THROUGH VIAS - A method for determining, in a first semiconductor material wafer having at least one through via, mechanical stress induced by the at least one through via, this method including the steps of: manufacturing a test structure from a second wafer of the same nature as the first wafer, in which the at least one through via is formed by a substantially identical method, a rear surface layer being further arranged on this second wafer so that the via emerges on the layer; measuring the mechanical stress in the rear surface layer; and deducing therefrom the mechanical stress induced in the first semiconductor material wafer. | 05-09-2013 |
20130099797 | Variable Impedance Device - A variable impedance device includes a passive tuner that includes at least one variable component, which is controllable to apply a variable impedance value to an input signal of the passive tuner. A low noise amplifier is configured to supply the input signal to the passive tuner by amplifying an input RF (radio frequency) signal. | 04-25-2013 |
20130099329 | METHOD FOR MANUFACTURING INSULATED-GATE MOS TRANSISTORS - A method for defining an insulator in a semiconductor substrate includes forming a trench in the substrate, forming in the trench an insulating material having its upper surface arranged above the surface of the substrate, and forming a diffusion barrier layer in a portion of the insulating material located above the surface of the semiconductor substrate. Such insulators can be used, for example, to insulate and delineate electronic components or portions of components formed in the substrate. | 04-25-2013 |
20130099322 | METHOD FOR MANUFACTURING INSULATED-GATE TRANSISTORS - A method for defining an insulating area in a semiconductor substrate, including a step of forming of a bonding layer on the walls and the bottom of a trench defined in the substrate. A step of passivation of the apparent surface of said bonding layer, at least close to the surface of said semiconductor substrate. | 04-25-2013 |
20130095636 | PROCESS FOR PRODUCING AT LEAST ONE DEEP TRENCH ISOLATION - A method for producing at least one deep trench isolation in a semiconductor substrate including silicon and having a front side may include forming at least one cavity in the semiconductor substrate from the front side. The method may include conformally depositing dopant atoms on walls of the cavity, and forming, in the vicinity of the walls of the cavity, a silicon region doped with the dopant atoms. The method may further include filling the cavity with a filler material to form the at least one deep trench isolation. | 04-18-2013 |
20130084687 | METHOD FOR FORMATION OF AN ELECTRICALLY CONDUCTING THROUGH VIA - A method is for formation of an electrically conducting through-via within a first semiconductor support having a front face and comprising a silicon substrate. The method may include forming of a first insulating layer on top of the front face of the first semiconductor support, fabricating a handle including, within an additional rigid semiconductor support having an intermediate semiconductor layer, and forming on either side of the intermediate semiconductor layer of a porous region and of an additional insulating layer. The method may also include direct bonding of the first insulating layer and of the additional insulating layer, and thinning of the silicon substrate of the first semiconductor support so as to form a back face opposite to the front face. | 04-04-2013 |
20130083586 | INTEGRATED CIRCUIT WITH A SELF-PROGRAMMED IDENTIFICATION KEY - A structure for storing a native binary code in an integrated circuit, including an array of planar MIM capacitors above an insulating layer formed above a copper metallization network, wherein at least one metallization portion is present under each MIM capacitor. The size of the portion(s) is selected so that from 25 to 75% of the MIM capacitors have a breakdown voltage smaller by at least 10% than that of the other MIM capacitors. | 04-04-2013 |
20130075870 | METHOD FOR PROTECTION OF A LAYER OF A VERTICAL STACK AND CORRESPONDING DEVICE - A device and corresponding fabrication method includes a vertical stack having an intermediate layer between a lower region and an upper region. The intermediate layer is extended by a protection layer. The vertical stack has a free lateral face on which the lower region, the upper region and the protection layer are exposed. | 03-28-2013 |
20130072032 | METHOD FOR DEPOSITING A SILICON OXIDE LAYER OF SAME THICKNESS ON SILICON AND ON SILICON-GERMANIUM - A method for depositing a silicon oxide layer on a substrate including a silicon region and a silicon-germanium region, including the steps of: forming a very thin silicon layer having a thickness ranging from 0.1 to 1 nm above silicon-germanium; and depositing a silicon oxide layer on the substrate. | 03-21-2013 |
20130065392 | METHOD FOR FORMING A SILICIDE LAYER AT THE BOTTOM OF A HOLE AND DEVICE FOR IMPLEMENTING SAID METHOD - A method for manufacturing a silicide layer in a hole formed across the entire thickness of a layer of a material deposited on a silicon layer, including: a first step of bombarding of the hole with particles to sputter the silicon at the bottom of the hole and deposit sputtered silicon on lateral walls of the hole; a second step of deposition in the hole of a layer of silicide precursor; a second step of bombarding of the hole with particles to sputter the silicon precursor at the bottom of the hole and deposit sputtered precursor on the internal walls of the hole; a second step of deposition in the hole of a layer of silicide precursor; and an anneal step to form a silicide layer in the hole. | 03-14-2013 |
20130059254 | PHOTOLITHOGRAPHY METHOD USING A CHEMICALLY-AMPLIFIED RESIST - A photolithography method, including the steps of: S | 03-07-2013 |
20130058155 | SRAM DIMENSIONED TO PROVIDE BETA RATIO SUPPORTING READ STABILITY AND REDUCED WRITE TIME - A 6T SRAM includes two inverters connected in antiparallel, and two access transistors, each connected between a bit line and a common node of the inverters. Each inverter includes a pullup transistor and a pulldown transistor. A product formed by a ratio of the pulldown transistor gate width to the access transistor gate width multiplied by a ratio of the access transistor gate length to the pulldown transistor gate length is smaller than one. Furthermore, the pullup transistor gate width is greater than or equal to the pulldown transistor gate width. | 03-07-2013 |
20130056845 | METHOD FOR FORMING AN ISOLATION TRENCH - A method forms at least one isolation trench in a substrate having an upper surface. The method includes at least: forming, across the substrate thickness, at least one first cavity opened towards the upper surface; totally filling this first cavity with a dielectric material of a first type; forming a second cavity in an upper portion of the first cavity thus filled, said second cavity being opened towards the upper surface and having a substantially concave profile; totally filling this second cavity with a dielectric material of a second type; and leveling the free surface of the trench substantially down to the upper surface level. | 03-07-2013 |
20130049155 | PHOTOSITE WITH PINNED PHOTODIODE - A photosite is formed in a semiconductor substrate and includes a photodiode confined in a direction orthogonal to the surface of the substrate. The photodiode includes a semiconductor zone for storing charge that is formed in an upper semiconductor region having a first conductivity type and includes a main well of a second conductivity type opposite the first conductivity type and laterally pinned in a first direction parallel to the surface of the substrate. The photodiode further includes an additional semiconductor zone including an additional well having the second conductivity type that is buried under and makes contact with the main well. | 02-28-2013 |
20130040230 | METHOD OF DETERMINING FOCUS AND DOSE OF AN APPARATUS OF OPTICAL MICRO-LITHOGRAPHY - In one or more embodiments, the disclosure relates to a method of setting a photolithography exposure machine, comprising: forming on a photolithography mask test patterns and circuit patterns, transferring the patterns to a resin layer covering a wafer, measuring a critical dimension of each test pattern transferred, and determining a focus setting error value of the photolithography machine from the measure of the critical dimension of each pattern, the test patterns formed on the mask comprising a first reference test pattern and a second test pattern forming for a photon beam emitted by the photolithography machine and going through the mask, an optical path having a length different from an optical path formed by the first test pattern and the circuit patterns formed on the mask. | 02-14-2013 |
20130039113 | INTEGRATED DRAM MEMORY DEVICE - A DRAM memory device includes at least one memory cell including a transistor having a first electrode, a second electrode and a control electrode. A capacitor is coupled to the first electrode. At least one electrically conductive line is coupled to the second electrode and at least one second electrically conductive line is coupled to the control electrode. The electrically conductive lines are located between the transistor and the capacitor. The capacitor can be provided above a fifth metal level. | 02-14-2013 |
20130027274 | INTEGRATED MILLIMETER WAVE TRANSCEIVER - A millimeter wave transceiver including a plate forming an interposer having its upper surface supporting an interconnection network and having its lower surface intended to be assembled on an electronic device; at least one integrated circuit chip assembled on the upper surface of the interposer; at least one antenna including at least one track formed on the upper surface of the interposer; and at least one block attached under the plate and including in front of each antenna a cavity having a metalized bottom, the distance between each antenna and the bottom being on the order of one quarter of the wavelength, taking into account the dielectric constants of the interposed materials. | 01-31-2013 |
20130026846 | TRANSFORMER OF THE BALANCED-UNBALANCED TYPE - A transformer of the balanced-unbalanced type includes a primary inductive circuit and a secondary inductive circuit housed inside an additional inductive winding connected in parallel to the terminals of the secondary circuit and inductively coupled with the primary circuit and the secondary circuit. | 01-31-2013 |
20130026627 | ELECTRONIC CHIP COMPRISING CONNECTION PILLARS AND MANUFACTURING METHOD - An electronic chip including a semiconductor substrate ( | 01-31-2013 |
20130026546 | INTEGRATED CIRCUIT COMPRISING AN ISOLATING TRENCH AND CORRESPONDING METHOD - An integrated circuit including at least one isolating trench that delimits an active area made of a monocrystalline semiconductor material, the or each trench including an upper portion including an insulating layer that encapsulates a lower portion of the trench, the lower portion being at least partly buried in the active area and the encapsulation layer including nitrogen or carbon. | 01-31-2013 |
20120319206 | INTEGRATED CIRCUIT COMPRISING AN ISOLATING TRENCH AND CORRESPONDING METHOD - An integrated circuit including at least one isolating trench that delimits an active area made of a monocrystalline semiconductor material, the or each trench comprising an upper portion including an insulating layer that encapsulates a lower portion of the trench, the lower portion being at least partly buried in the active area and the encapsulation layer comprising nitrogen or carbon. | 12-20-2012 |
20120313182 | ELECTRONIC COMPONENT COMPRISING A NUMBER OF MOSFET TRANSISTORS AND MANUFACTURING METHOD - An electronic component including a number of insulated-gate field effect transistors, said transistors belonging to at least two distinct subsets by virtue of their threshold voltage, wherein each transistor includes a gate that has two electrodes, namely a first electrode embedded inside the substrate where the channel of the transistor is defined and a second upper electrode located above the substrate facing buried electrode relative to channel and separated from said channel by a layer of dielectric material and wherein the embedded electrodes of all the transistors are formed by an identical material, the upper electrodes having a layer that is in contact with the dielectric material which is formed by materials that differ from one subset of transistors to another. | 12-13-2012 |
20120306035 | PROCESS FOR FABRICATING A BACKSIDE-ILLUMINATED IMAGING DEVICE AND CORRESPONDING DEVICE - An integrated imaging device includes a silicon layer provided over a dielectric multilayer. The dielectric multilayer includes a top silicon-dioxide layer, an intermediate silicon-nitride layer and a bottom silicon-dioxide layer. Imaging circuitry is formed at a frontside of the silicon layer. An isolating structure surrounds the imaging circuitry and extends from the frontside through the silicon layer and top silicon-dioxide layer into and terminating within the intermediate silicon-nitride layer. A filter for the imaging circuitry is mounted to a backside of the bottom silicon-dioxide layer. The isolating structure is formed by a trench filled with a dielectric material. | 12-06-2012 |
20120305750 | MATRIX IMAGING DEVICE COMPRISING AT LEAST ONE SET OF PHOTOSITES WITH MULTIPLE INTEGRATION TIMES - A method for controlling a pixel may include first and second photosites, each having a photodiode and a charge-transfer transistor, a read node, and an electronic read element, all of which are common to all the photosites. The method may include an accumulation of photogenerated charges in the photodiode of the first photosite during a first period, an accumulation of photogenerated charges in the photodiode of the second photosite during a second period shorter than the first period, a selection of the signal corresponding to the quantity of charges accumulated in the photodiode of a photosite having the highest unsaturated intensity or else a saturation signal, and a digitization of the selected signal. | 12-06-2012 |
20120282747 | EFFECTING SELECTIVITY OF SILICON OR SILICON-GERMANIUM DEPOSITION ON A SILICON OR SILICON-GERMANIUM SUBSTRATE BY DOPING - A method for selective deposition of Si or SiGe on a Si or SiGe surface exploits differences in physico-chemical surface behavior according to a difference in doping of first and second surface regions. By providing at least one first surface region with a Boron doping of a suitable concentration range and exposing the substrate surface to a cleaning and passivating ambient atmosphere in a prebake at a temperature lower or equal to 800° C., a subsequent deposition step will prevent deposition in the first surface region. This allows selective deposition in the second surface region, which is not doped with the Boron (or doped with another dopant or not doped). Several devices are, thus, provided. The method saves a usual photolithography sequence, which according to prior art is required for selective deposition of Si or SiGe in the second surface region. | 11-08-2012 |
20120273952 | MICROELECTRONIC CHIP, COMPONENT CONTAINING SUCH A CHIP AND MANUFACTURING METHOD - Microelectronic chip including a semiconductor substrate; at least one area of its surface which is suitable to be electrically connected to a metal frame designed to accommodate the chip; at least one interconnect area formed by a copper-based conductive layer and comprising a connecting device, the interconnect area being connected to the area by a conductor, wherein the area is formed by a layer forming a copper diffusion barrier inserted between interconnect area and the substrate. | 11-01-2012 |
20120261784 | METHOD FOR FORMING A BACK-SIDE ILLUMINATED IMAGE SENSOR - A method for forming a back-side illuminated image sensor from a semiconductor substrate, including the steps of: a) forming, from the front surface of the substrate, areas of same conductivity type as the substrate but of higher doping level, extending deep under the front surface, these areas being bordered with insulating regions orthogonal to the front surface; b) thinning the substrate from the rear surface to the vicinity of these areas and all the way to the insulating regions; c) partially hollowing out the insulating regions on the rear to surface side; and d) performing a laser surface anneal of the rear surface of the substrate. | 10-18-2012 |
20120261783 | BACK-SIDE ILLUMINATED IMAGE SENSOR PROVIDED WITH A TRANSPARENT ELECTRODE - A back-side illuminated image sensor formed from a thinned semiconductor substrate, wherein: a transparent conductive electrode, insulated from the substrate by an insulating layer, extends over the entire rear surface of the substrate; and conductive regions, insulated from the substrate by an insulating coating, extend perpendicularly from the front surface of the substrate to the electrode. | 10-18-2012 |
20120261732 | METHOD FOR FORMING A BACK-SIDE ILLUMINATED IMAGE SENSOR - A method for forming a back-side illuminated image sensor from a semiconductor substrate, including the steps of: a) thinning the substrate from its rear surface; b) depositing, on the rear surface of the thinned substrate, an amorphous silicon layer of same conductivity type as the substrate but of higher doping level; and c) annealing at a temperature enabling to recrystallized the amorphous silicon to stabilize it. | 10-18-2012 |
20120261670 | BACK-SIDE ILLUMINATED IMAGE SENSOR WITH A JUNCTION INSULATION - A method for forming a back-side illuminated image sensor, including the steps of: a) forming, from the front surface, doped polysilicon regions, of a conductivity type opposite to that of the substrate, extending in depth orthogonally to the front surface and emerging into the first layer; b) thinning the substrate from its rear surface to reach the polysilicon regions, while keeping a strip of the first layer; c) depositing, on the rear surface of the thinned substrate, a doped amorphous silicon layer, of a conductivity type opposite to that of the substrate; and d) annealing at a temperature capable of transforming the amorphous silicon layer into a crystallized layer. | 10-18-2012 |
20120252174 | PROCESS FOR FORMING AN EPITAXIAL LAYER, IN PARTICULAR ON THE SOURCE AND DRAIN REGIONS OF FULLY-DEPLETED TRANSISTORS - A layer of a semiconductor material is epitaxially grown on a single-crystal semiconductor structure and on a polycrystalline semiconductor structure. The epitaxial layer is then etched in order to preserve a non-zero thickness of said material on the single-crystal structure and a zero thickness on the polycrystalline structure. The process of growth and etch is repeated, with the same material or with a different material in each repetition, until a stack of epitaxial layers on said single-crystal structure has reached a desired thickness. The single crystal structure is preferably a source/drain region of a transistor, and the polycrystalline structure is preferably a gate of that transistor. | 10-04-2012 |
20120248568 | METHOD FOR CONTROLLING THE ELECTRICAL CONDUCTION BETWEEN TWO METALLIC PORTIONS AND ASSOCIATED DEVICE - A method for controlling the electrical conduction between two electrically conductive portions may include placing of an at least partially ionic crystal between the two electrically conductive portions. The crystal may include at least one surface region coupled to the two electrically conductive portions. The surface region is insulating under the application of an electrical field to the surface region, and electrically conductive in the absence of the electrical field. An application or not of an electrical field to the at least one surface region reduces or establishes the electrical conduction. | 10-04-2012 |
20120228992 | THERMOELECTRIC GENERATOR - A thermoelectric generator including a sheet of a deformable material containing closed cavities, each of which contains a drop of a vaporizable liquid, and a mechanism for transforming into electricity the power resulting from the deformation of the sheet linked to the evaporation/condensation of the liquid. | 09-13-2012 |
20120225560 | MANUFACTURING METHOD OF INTEGRATED CIRCUITS BASED ON FORMATION OF LINES AND TRENCHES - The disclosure relates to a method for etching a target layer, comprising: depositing a hard mask layer onto a target layer and onto the hard mask layer, a first photosensitive layer, exposing the first photosensitive layer through a first mask to transfer first patterns into the photosensitive layer, transferring the first patterns into the hard mask layer, depositing onto the hard mask layer etched a second photosensitive layer, exposing the second photosensitive layer through a second mask to transfer second patterns into the second photosensitive layer, transferring the second patterns into the hard mask layer by etching this layer, and transferring the first and second patterns into the target layer through the hard mask, the second patterns forming lines, and the first patterns forming trenches cutting the lines in the hard mask. | 09-06-2012 |
20120225326 | MODULE ELEMENT, IN PARTICULAR FOR A BIOFUEL CELL, AND MANUFACTURING PROCESS - A module of a biofuel cell includes three module elements each having a porous membrane. At least two of the porous membranes are electrically conducting and form the cathode and the anode of the biofuel cell. The third membrane, which is preferably positioned between the two electrically conducting membranes need not be conducting, but defines two emergent cavities within the module. A porous through-channel extends through a silicon support of the module so as to connect one of the emergent cavities to at least one external wall of the silicon support. | 09-06-2012 |
20120211804 | CHARGE TRANSFER PHOTOSITE - A photosite may include, in a semi-conductor substrate, a photodiode pinched in the direction of the depth of the substrate including a charge storage zone, and a charge transfer transistor to transfer the stored charge. The charge storage zone may include a pinching in a first direction passing through the charge transfer transistor defining a constriction zone adjacent to the charge transfer transistor. | 08-23-2012 |
20120211646 | DEVICE AND METHOD FOR MEASURING LIGHT ENERGY RECEIVED BY AT LEAST ONE PHOTOSITE - A method is for measuring light energy received by a pixel including a transfer transistor, and a photodiode including a charge storage region. The method may include encapsulating the gate of the transfer transistor of the pixel in a semiconductor layer, at least one part of which includes a hydrogenated amorphous semiconductor. The method also may include grounding the charge storage region of the pixel, and determining the drift over time in the magnitude of the drain-source current of the transfer transistor. | 08-23-2012 |
20120199947 | METHOD FOR MANUFACTURING AND REOXIDIZING A TIN/TA2O5/TIN CAPACITOR - A method for manufacturing a TiN/Ta2O5/TiN capacitor, including the steps of forming a Ta | 08-09-2012 |
20120171877 | INTEGRATED CIRCUIT CHIP AND FABRICATION METHOD - An electrical connection structure for an integrated circuit chip includes a through via provided in a opening and a laterally adjacent void that are formed in a rear face of a substrate die. A front face of the substrate die includes integrated circuits and a layer incorporating a front electrical interconnect network. The via extends through the substrate die to reach a connection portion of the front electrical interconnect network. An electrical connection pillar made of an electrically conductive material is formed on a rear part of the electrical connection via above the void. A local external protection layer may at least partly cover the electrical connection via and the electrical connection pillar. | 07-05-2012 |
20120170170 | METHOD FOR MANUFACTURING A POLYCRYSTALLINE DIELECTRIC LAYER - A method manufactures a capacitor having polycrystalline dielectric layer between two metallic electrodes. The dielectric layer is formed by a polycrystalline growth of a dielectric metallic oxide on one of the metallic electrodes. At least one polycrystalline growth condition of the dielectric oxide is modified during the formation of the polycrystalline dielectric layer, which results in a variation of the polycrystalline properties of the dielectric oxide within the thickness of said layer. | 07-05-2012 |
20120161269 | LOW-CROSSTALK FRONT-SIDE ILLUMINATED IMAGE SENSOR - A front-side illuminated image sensor, including photodetection regions, charge transfer elements, and an interconnection stack, all formed at the surface of a semiconductor substrate, microcavities being formed in the interconnection stack in front of the photodetection regions, microcavities being filled with materials forming color filters including metal pigments, regions of a material forming a barrier against ionic diffusion extending on the lateral walls of the microcavities. | 06-28-2012 |
20120161213 | MATRIX IMAGING DEVICE HAVING PHOTOSITES WITH GLOBAL SHUTTER CHARGE TRANSFER - An imaging device is formed in a semiconductor substrate. The device includes a matrix array of photosites. Each photosite is formed of a semiconductor region for storing charge, a semiconductor region for reading charge specific to said photosite, and a charge transfer circuit configured so as to permit a transfer of charge between the charge storage region and the charge reading region. Each photosite further includes at least one buried first electrode. At least one part of that buried first electrode bounds at least one part of the charge storage region. The charge transfer circuit for each photosite includes at least one second buried electrode. | 06-28-2012 |
20120156859 | PROCESS FOR FABRICATING INTEGRATED-CIRCUIT CHIPS - Front-side integrated parts of integrated-circuit chips are produced at locations on a substrate wafer. The front-side parts have a front side. A support wafer having a bearing side is mounted with the bearing side on top of said front-side parts. The support wafer includes at least one weak surface layer. This weak surface layer is attached to the substrate wafer using a retaining adhesive. In one implementation, the weak surface layer is attached to a front surface of the wafer. In another implementation, the weak surface layer is attached to a peripheral edge of the wafer. After attaching the support wafer, back-side integrated parts of the integrated-circuit chips are produced on the substrate wafer. The weak surface layer is then destroyed so as to demount the support wafer from the substrate wafer. | 06-21-2012 |
20120153905 | ELECTRICAL ENERGY GENERATION DEVICE - A device for generating electrical energy from the heat dissipated by a heat source, comprising: a capacitor comprising two electrodes between which a ferroelectric material is present, said capacitor being arranged so as to be positioned to capture all or part of the heat dissipated by said heat source; a capacitive element a first electrode of which is connected to a first electrode of said capacitor; a recovery circuit interposed between the second electrode of said capacitor and the second electrode of the capacitive element, and able to have the current flowing between said second electrodes pass through it. a mechanism adapted to move the capacitor with respect to the heat source, said mechanism having at least one arm able to move between two positions, the capacitor being closer to the heat source in one of the two positions. | 06-21-2012 |
20120153490 | INTERCONNECTION STRUCTURE FOR AN INTEGRATED CIRCUIT - The disclosure relates to a method of fabricating an interconnection structure of an integrated circuit, comprising the steps of: forming a first conductive element within a first dielectric layer; depositing a first etch stop layer above the first conductive element and the first dielectric layer; forming an opening in the first etch stop layer above the first conductive element, to form a first connection area; depositing a second dielectric layer above the etch stop layer and above the first conductive element in the connection area; etching the second dielectric layer to form at least one hole which is at least partially aligned with the connection area; and filling the hole with a conductive material to form a second conductive element in electrical contact with the first conductive element. | 06-21-2012 |
20120153475 | METHOD OF ASSEMBLING TWO INTEGRATED CIRCUITS AND CORRESPONDING STRUCTURE - A semiconductor device includes an assembly of two integrated circuits. The assembly has a layer of photoresist filling the space between the two integrated circuits, and at least one electrically conducting pillar within the resist and electrically coupling the two integrated circuits. | 06-21-2012 |
20120153425 | PROCESS FOR FABRICATING INTEGRATED-CIRCUIT CHIPS - Integrated-circuit chips are fabricated according to a process wherein weak portions are formed in a substrate wafer surrounding a plurality of locations. An integrated-circuit chip is defined at each location by destroying the weak portions so as to singulate integrated-circuit chips. | 06-21-2012 |
20120153128 | IMAGE SENSOR WITH REDUCED OPTICAL CROSSTALK - A method of fabricating an image sensor includes the steps of: forming at least two photosites in a semiconductor substrate; forming a trench between the photosites; forming a thin liner on at least the sidewalls of the trench; depositing a conductive material having a first refractive index in the trench; and forming a region surrounded by the conductive material and having a second refractive index lower than the first index of refraction within the conductive material in the trench. | 06-21-2012 |
20120146226 | INTEGRATED CIRCUIT CHIP AND FABRICATION METHOD - An integrated circuit chip includes a substrate die and integrated circuits and a layer incorporating a front electrical interconnect network formed on a front face of the substrate die. A local electrical connection via made of an electrically conductive material is formed in a hole of the substrate die. The via is linked to a connection portion of the electrical interconnect network. An electrical connection pillar made of an electrically conductive material is formed on a rear part of the electrical connection via. A local external protection layer at least partly covers the electrical connection via and the electrical connection pillar. | 06-14-2012 |
20120133021 | SEMICONDUCTOR DEVICE COMPRISING A CAPACITOR AND AN ELECTRICAL CONNECTION VIA, AND FABRICATION METHOD - A main blind hole is formed in a front face of a wafer having a rear face. A through capacitor is formed in the main blind hole including a conductive outer electrode, a dielectric intermediate layer, and a filling conductive material forming an inner electrode. Cylindrical portions of the outer electrode, the dielectric intermediate layer and the inner electrode have front ends situated in a plane of the front face of the wafer. A secondary rear hole is formed in the rear face of the wafer to reveal a bottom of the outer electrode. A rear electrical connection is made to contact the bottom of the outer electrode through the secondary rear hole. A through hole via filled with a conductive material is provided adjacent the through capacitor. An electrical connection is made on the rear face between the rear electrical connection and the through hole via. | 05-31-2012 |
20120115311 | METHOD FOR FORMING A MULTILAYER STRUCTURE - The method for forming a multilayer structure on a substrate comprises providing a stack successively comprising an electron hole blocking layer, a first layer made from N-doped semiconductor material having a dopant concentration greater than or equal to 10 | 05-10-2012 |
20120112259 | INTEGRATED CIRCUIT WITH PROTECTION FROM COPPER EXTRUSION - An integrated circuit may include an element placed in an insulating region adjacent to a copper metallization level and including a barrier layer in contact with a metallization level. The element may be electrically connected to and spaced away from a copper line of the metallization level by way of an electrical link passing through the barrier layer and including an electrically conductive material different from copper in direct contact with the copper line. | 05-10-2012 |
20120100657 | SIMPLIFIED COPPER-COPPER BONDING - A method for bonding a first copper element onto a second copper element including forming a crystalline copper layer enriched in oxygen on each of surfaces of each of the first and second elements through which the elements will be in contact, the total thickness of both layers being less than 6 nm, which includes: a) polishing the surfaces so as to obtain a roughness of less than 1 nm RMS, and hydrophilic surfaces, b) cleaning the surfaces to suppress presence of particles due to the polishing and the major portion of corrosion inhibitors, and c) putting both crystalline copper layer enriched in oxygen in contact with each other. | 04-26-2012 |
20120094470 | METHOD FOR FORMING INTEGRATED CIRCUITS ON A STRAINED SEMICONDUCTOR SUBSTRATE - A method for forming an electronic circuit on a strained semiconductor substrate, including the steps of: forming, on a first surface of a semiconductor substrate, electronic components defining electronic chips to be sawn; and forming at least portions of a layer of a porous semiconductor material on the side of a second surface of the semiconductor substrate, opposite to the first surface, to bend the semiconductor substrate. | 04-19-2012 |
20120086608 | Antenna Array for Transmission/Reception Device for Signals with a Wavelength of the Microwave, Millimeter or Terahertz Type - Transmission/reception device for signals having a wavelength of the microwaves, millimeter or terahertz type, comprising an antenna array. The antenna array comprises a first group of first omni-directional antennas and a second group of second directional antennas disposed around the first group of antennas. | 04-12-2012 |
20120083110 | METHOD FOR MANUFACTURING MOS TRANSISTORS WITH DIFFERENT TYPES OF GATE STACKS - A method for manufacturing three types of MOS transistors in three regions of a same substrate, including the steps of: forming a first insulating layer, removing the first insulating layer from the first and second regions, forming a silicon oxide layer, depositing an insulating layer having a dielectric constant which is at least twice greater than that of silicon oxide, depositing a first conductive oxygen scavenging layer, removing the first conductive layer from the second and third regions, and annealing. | 04-05-2012 |
20120081978 | READ BOOST CIRCUIT FOR MEMORY DEVICE - A read boost circuit arranged to boost the voltage difference between a pair of complementary bit lines of a memory device during a read operation, the read boost circuit including: a first transistor adapted to be controlled by the voltage level on a first bit line of the pair of bit lines to couple a second bit line of the pair of bit lines to a first supply voltage; and a second transistor connected directly to ground and adapted to be controlled by the voltage level on the second bit line to couple the first bit line to ground. | 04-05-2012 |
20120074527 | INTEGRATED CIRCUIT COMPRISING A DEVICE WITH A VERTICAL MOBILE ELEMENT INTEGRATED IN A SUPPORT SUBSTRATE AND METHOD FOR PRODUCING THE DEVICE WITH A MOBILE ELEMENT - The integrated circuit comprises a support substrate having opposite first and second main surfaces. A cavity passes through the support substrate and connects the first and second main surfaces. The integrated circuit comprises a device with a mobile element, the mobile element and a pair of associated electrodes of which are included in a cavity. An anchoring node of the mobile element is located at the level of the first main surface. The integrated circuit comprises a first elementary chip arranged at the level of the first main surface and electrically connected to the device with a mobile element. | 03-29-2012 |
20120062268 | METHOD AND DEVICE FOR MEASURING THE RELIABILITY OF AN INTEGRATED CIRCUIT - Electromigration may cause a fault to appear in an integrated circuit located on a semiconductor chip. To detect such a fault, at least one resistive test structure is provided separated from the integrated circuit and located on at least one metallization level of the integrated circuit. During operation of the integrated circuit, the resistive test structure is sensed. Detection of a voltage difference between two points of the resistive test structure is indicative of a fault. | 03-15-2012 |
20120042292 | METHOD OF SYNTHESIS OF AN ELECTRONIC CIRCUIT - A method of synthesis of at least one logic device coupled between first and second supply voltages and having a plurality of inputs and an output, the logic device including a plurality of transistors having a standard gate length, the method including: identifying, in the at least one logic device, one or more transistors connected between the first or second supply voltage and the output node; and increasing the gate length of each of the identified one or more transistors. | 02-16-2012 |
20120040525 | METHOD FOR FORMING INTERCONNECTION LEVELS OF AN INTEGRATED CIRCUIT - A method for forming interconnection levels of an integrated circuit, including the steps of: (a) forming an interconnection level including conductive tracks and vias separated by a porous dielectric material; (b) forming, on the interconnection level, a layer of a non-porous insulating material, said layer comprising openings above portions of porous dielectric material; (c) repeating steps (a) and (b) to obtain the adequate number of interconnection levels; and (d) annealing the structure. | 02-16-2012 |
20120032291 | Stand-Alone Device - A stand-alone device comprising a silicon wafer having its front surface including a first layer of a first conductivity type and a second layer of a second conductivity type forming a photovoltaic cell; first vias crossing the wafer from the rear surface of the first layer and second vias crossing the wafer from the rear surface of the second layer; metallization levels on the rear surface of the wafer, the external level of these metallization levels defining contact pads; an antenna formed in one of the metallization levels; and one or several chips assembled on said pads; the metallization levels being shaped to provide selected interconnects between the different elements of the device. | 02-09-2012 |
20120018889 | PROCESS FOR PRODUCING A METALLIZATION LEVEL AND A VIA LEVEL AND CORRESPONDING INTEGRATED CIRCUIT - A process for producing an upper metallization level and a via level connecting this upper metallization level to a lower metallization level includes: producing an insulating region on the lower metallization level; producing a hard mask on the insulating region ( | 01-26-2012 |
20120018619 | Method of Resetting a Photosite, and Corresponding Photosite - A method of resetting a photosite is disclosed. Photogenerated charges accumulated in the photosite are reset by recombining the photogenerated charges with charges of opposite polarity. | 01-26-2012 |
20120017962 | PROCESS FOR GENERATING ELECTRICAL ENERGY IN A SEMICONDUCTOR DEVICE AND THE CORRESPONDING DEVICE - Electrical energy is generated in a device that includes an integrated circuit which produces thermal flux when operated. A substrate supports the integrated circuit. A structure is formed in the substrate, that structure having a semiconductor p-n junction thermally coupled to the integrated circuit. Responsive to the thermal flux produced by the integrated circuit, the structure generates electrical energy. The generated electrical energy may be stored for use by the integrated circuit. | 01-26-2012 |
20120007243 | METHOD OF MAKING CONNECTIONS IN A BACK-LIT CIRCUIT - A method for forming, on a surface of a thinned-down semiconductor substrate, a contact connected to a metal track of an interconnect stack formed on the opposite surface of the thinned-down substrate, including the steps of: forming, on the side of a first surface of a substrate, an insulating region penetrating into the substrate and coated with a conductive region and with an insulating layer crossed by conductive vias, the vias connecting a metal track of the interconnect stack to the conductive region; gluing the external surface of the interconnect stack on a support and thinning down the substrate; etching the external surface of the thinned-down substrate and stopping on the insulating region; etching the insulating region and stopping on the conductive region; and filling the etched opening with a metal. | 01-12-2012 |
20110316055 | SUBSTRATE PROVIDED WITH A SEMI-CONDUCTING AREA ASSOCIATED WITH TWO COUNTER-ELECTRODES AND DEVICE COMPRISING ONE SUCH SUBSTRATE - A support substrate comprises first and second counter-electrodes arranged in the same plane at the level of a surface of the support substrate. An electrically insulating area separates the first and second counter-electrodes. A semi-conducting area with first and second portions is separated from the support substrate by an electrically insulating material. The electrically insulating material is different from the material forming the support substrate. The first portion of the semi-conducting area is facing the first counter-electrode. The second portion of the semi-conducting area is facing the second counter-electrode. | 12-29-2011 |
20110298019 | COMPACT FIELD EFFECT TRANSISTOR WITH COUNTER-ELECTRODE AND FABRICATION METHOD - An etching mask, comprising the delineation pattern of the gate electrode, of a source contact, a drain contact and a counter-electrode contact, is formed on a substrate of semi-conductor on insulator type. The substrate is covered by a layer of dielectric material and a gate material. The counter-electrode contact is located in the pattern of the gate electrode. The gate material is etched to define the gate electrode, the source contact and drain contacts and the counter-electrode contact. A part of the support substrate is released through the pattern of the counter-electrode contact area. An electrically conductive material is deposited on the free part of the support substrate to form the counter-electrode contact. | 12-08-2011 |
20110298010 | Cell Library, Integrated Circuit, and Methods of Making Same - A cell library intended to be used to form an integrated circuit, this library defining a first cell including a first MOS transistor of minimum dimensions, and a second cell including a second MOS transistor of lower leakage current, wherein the second cell takes up the same surface area as the first cell, and the second MOS transistor has a gate of same length as the gate of the first MOS transistor across at least a first width in its central portion, and of greater length across at least a second width on either side of the central portion. | 12-08-2011 |
20110291199 | SRAM MEMORY CELL WITH FOUR TRANSISTORS PROVIDED WITH A COUNTER-ELECTRODE - The memory cell is of SRAM type with four transistors provided with a counter-electrode. It comprises a first area made from semiconductor material with a first transfer transistor and a first driver transistor connected in series, their common terminal defining a first electric node. A second transfer transistor and a second driver transistor are connected in series on a second area made from semiconductor material and their common terminal defines a second electric node. The support substrate comprises first and second counter-electrodes. The first and second counter-electrodes are located respectively facing the first and second semiconductor material areas. The first transfer transistor and second driver transistor are on a first side of a plane passing through the first and second electric nodes whereas the first driver transistor and second transfer transistor are on the other side of the plane. | 12-01-2011 |
20110272801 | SEMICONDUCTOR DEVICE WITH CONNECTION PADS PROVIDED WITH INSERTS - A semiconductor device includes an integrated circuit and external electrical connection pads. Each pad includes cavities that are at least partially filled with a material different from the material forming the pads, so as to form inserts. | 11-10-2011 |
20110237068 | METHOD FOR FORMING ELECTRIC VIAS - A method for forming through vias connecting the front surface to the rear surface of a semiconductor substrate, including the steps of: forming openings in the substrate, thermally oxidizing walls of the openings, filling the openings with a sacrificial material, forming electronic components in the substrate, etching the sacrificial material, filling the openings with a metal, and etching the rear surface of the substrate all the way to the bottom of the openings. | 09-29-2011 |
20110225457 | System for Testing a Multitasking Computation Architecture Based on Communication Data between Processors and Corresponding Test Method - System for testing a multitasking computation architecture, comprising a set of processors linked by data communication channels, comprising a generating stage for generating sequences of test instructions based on characteristics of said processors comprising programming rules for the computation processors, characterized in that it comprises a control stage for the stage for generating sequences based on data representative of the data communication channels. | 09-15-2011 |
20110183709 | IMAGE SENSOR PHOTODIODE - An image sensor including a plurality of pixels each including a charge collection region including an N-type region bounded by P-type regions and having an overlying P-type layer; and an insulated gate electrode positioned over the P-type layer and arranged to receive a gate voltage for conveying charges stored in the charge collection region through the P-type layer. | 07-28-2011 |
20110180689 | COMPACT IMAGE SENSOR ARRANGEMENT - An image sensor having a number of pixel zones delimited by isolation trenches, each pixel zone including a photodiode; a transfer gate associated with each of the pixel zones and arranged to transfer charge from the photodiode to a sensing node; and a read circuit for reading a voltage at one of the sensing nodes, the read circuitry including a number of transistors of which at least one is positioned at least partially over a pixel zone of the pixel zones. | 07-28-2011 |
20110147881 | HYBRID SUBSTRATE WITH IMPROVED ISOLATION AND SIMPLIFIED METHOD FOR PRODUCING A HYBRID SUBSTRATE - A hybrid substrate comprises first and second active areas made from semiconductor materials laterally offset from one another and separated by an isolation area. The main surfaces of the isolation area and of the first active area form a plane. The hybrid substrate is obtained from a source substrate successively comprising layers made from a first and second semiconductor materials separated by an isolation layer. A single etching mask is used to pattern the isolation area, first active area and second active area. The main surface of the first active area is released thereby forming voids in the source substrate. The etching mask is eliminated above the first active area. A first isolation material is deposited, planarized and etched until the main surface of the first active area is released. | 06-23-2011 |
20110140231 | INTEGRATED MICROELECTRONIC DEVICE WITH THROUGH-VIAS - An integrated microelectronic device is formed from a substrate having a first side and a second side and including a doped active zone ( | 06-16-2011 |
20110121391 | METHOD FOR MANUFACTURING A SUSPENDED MEMBRANE AND DUAL-GATE MOS TRANSISTOR - A method for manufacturing a suspended membrane in a single-crystal semiconductor substrate, including the steps of: forming in the substrate an insulating ring delimiting an active area, removing material from the active area, successively forming in the active area a first and a second layers, the second layer being a single-crystal semiconductor layer, etching a portion of the internal periphery of said ring down to a depth greater than the thickness of the second layer, removing the first layer so that the second layer formed a suspended membrane anchored in the insulating ring. | 05-26-2011 |
20110115237 | THERMOELECTRIC GENERATOR - A thermoelectric generator including a membrane maintained by lateral ends and capable of taking a first shape when its temperature reaches a first threshold and a second shape when its temperature reaches a second threshold greater than the first threshold; at least one electrically conductive element attached to with the membrane and connecting the lateral ends of the membrane; and circuitry capable of generating, at the level of the membrane, a magnetic field orthogonal to the membrane displacement direction, the lateral ends of the membrane being connected to output terminals of the generator. | 05-19-2011 |
20110111448 | DEVICE COMPRISING A FIELD OF TIPS USED IN BIOTECHNOLOGY APPLICATIONS - A method for manufacturing a device including a field of micrometric tips, including forming a polycrystalline layer on a support; performing an anisotropic plasma etching of all or part of the polycrystalline layer by using a gas mixture including chlorine and helium, whereby tips are formed at the surface of the polycrystalline layer. | 05-12-2011 |
20110108939 | METHOD FOR FORMING A BACK-SIDE ILLUMINATED IMAGE SENSOR - A method for manufacturing a back-side illuminated image sensor, including the steps of: forming, inside and on top of an SOI-type silicon layer, components for trapping and transferring photogenerated carriers and isolation regions; forming a stack of interconnection levels on the silicon layer and attaching, on the interconnect stack, a semiconductor handle; removing the semiconductor support; forming, in the insulating layer and the silicon layer, trenches reaching the isolation regions; depositing a doped amorphous silicon layer, more heavily doped than the silicon layer, at least on the walls and the bottom of the trenches and having the amorphous silicon layer crystallize; and filling the trenches with a reflective material. | 05-12-2011 |
20110108892 | DETECTOR OF BIOLOGICAL OR CHEMICAL MATERIAL AND CORRESPONDING ARRAY OF DETECTORS - A detector of biological or chemical material, including a MOS transistor having its channel region inserted between upper and lower insulated gates, the upper insulated gate including a detection layer capable of generating a charge at the interface of the upper insulated gate and of its gate insulator, the thickness of the upper gate insulator being smaller than the thickness of the lower gate insulator. | 05-12-2011 |
20110108801 | SINGLE-CRYSTAL SEMICONDUCTOR LAYER WITH HETEROATOMIC MACRO-NETWORK - A single-crystal layer of a first semiconductor material including single-crystal nanostructures of a second semiconductor material, the nanostructures being distributed in a regular crystallographic network with a centered tetragonal prism. | 05-12-2011 |
20110096208 | IMAGE SENSOR WITH VERTICAL TRANSFER GATE - An image sensor including a first pixel positioned between second and third pixels, each of the first, second and third pixels comprising a photodiode region surrounded by an isolation trench; a first charge transfer gate comprising a first column electrode surrounded by an insulating layer and positioned in an opening of the isolation trench between the first and second pixels, the first column electrode being configured to receive a first transfer voltage signal; and a second charge transfer gate including a second column electrode surrounded by an insulating layer and positioned in an opening of the isolation trench between the first and third pixels, the second column electrode being configured to receive a second transfer voltage signal. | 04-28-2011 |
20110095655 | THERMOELECTRIC GENERATOR - A thermoelectric generator including, between first and second walls delimiting a tightly closed space, a layer of a piezoelectric material connected to output terminals; a plurality of openings crossing the piezoelectric layer and emerging into first and second cavities close to the first and second walls; and in the tight space, drops of a liquid, the first wall being capable of being in contact with a hot source having a temperature greater than the evaporation temperature of the liquid and the second wall being capable of being in contact with a cold source having a temperature smaller than the evaporation temperature of the liquid. | 04-28-2011 |
20110095646 | DEVICE FOR CONVERTING THERMAL POWER INTO ELECTRICITY - A device for converting thermal power into electric power including a plurality of bimetallic strips disposed between a rigid support and a plate of a resilient plastic material; and on the side of the plate of a resilient plastic material opposite to the strips, a layer of a piezoelectric material connected to output terminals, wherein the rigid support is capable of being in contact with a hot source, and the plate of a resilient plastic material is capable of transmitting to the piezoelectric layer the mechanical stress due to the deformations of the bimetallic strips. | 04-28-2011 |
20110095375 | MIM TRANSISTOR - The invention concerns a conducting layer having a thickness of between 1 and 5 atoms, an insulated gate being formed over a part of the conducting layer. | 04-28-2011 |
20110080686 | MIM CAPACITOR - A method of forming a metal-insulator-metal capacitor having top and bottom plates separated by a dielectric layer, one of the top and bottom plates having at least one protrusion extending into a corresponding cavity in the other of the top and bottom plates, the method including the steps of growing one or more nanofibers on a base surface. | 04-07-2011 |
20110080233 | METHOD FOR MANUFACTURING BAW RESONATORS ON A SEMICONDUCTOR WAFER - A method for manufacturing a wafer on which are formed resonators, each resonator including, above a semiconductor substrate, a stack of layers including, in the following order from the substrate surface: a Bragg mirror; a compensation layer made of a material having a temperature coefficient of the acoustic velocity of a sign opposite to that of all the other stack layers; and a piezoelectric resonator, the method including the successive steps of: a) depositing the compensation layer; and b) decreasing thickness inequalities of the compensation layer due to the deposition method, so that this layer has a same thickness to within better than 2%, and preferably to within better than 1%, at the level of each resonator. | 04-07-2011 |
20110079920 | ELECTRICAL CONNECTION VIA FOR THE SUBSTRATE OF A SEMICONDUCTOR DEVICE - An electrical connection via is formed through a substrate to make an electrical connection from one face of the substrate to the other. The via includes a ring made of an electrically conductive material. The ring is formed in a hole in the substrate so as to at least partly form the via. | 04-07-2011 |
20110079919 | ELECTRICAL CONNECTION VIA FOR THE SUBSTRATE OF A SEMICONDUCTOR DEVICE - An electrical connection via passing through a substrate for a semiconductor device is made of at least one conducting ring formed in an annular hole passing through the substrate. | 04-07-2011 |
20110068381 | IMAGE SENSOR PIXEL CIRCUIT - A pixel circuit of an image sensor includes a sense node for storing a charge transferred from one or more photodiodes, a source follower transistor having its gate coupled to the sense node and its source node coupled to an output line of the pixel circuit via a read transistor, wherein a body contact of the source follower transistor is connected to the output line. | 03-24-2011 |
20110057264 | METHOD FOR PROTECTING THE GATE OF A TRANSISTOR AND CORRESPONDING INTEGRATED CIRCUIT - A gate of a transistor in an integrated circuit is protected against the production of an interconnection terminal for a source/drain region. The transistor includes a substrate, at least one active zone formed in the substrate, at least one insulating zone formed in the substrate and a gate, the gate being formed above an active zone. A dielectric layer is formed on the transistor, the dielectric layer covering the gate. The dielectric layer is then etched while leaving it remaining at least on the gate so that the gate is electrically insulated from other elements formed above the dielectric layer. This etching is preferably carried out using a mask which was used for fabricating the gate and a mask which was used for fabricating the insulating zone. | 03-10-2011 |
20110034329 | METHOD FOR FORMING POROUS MATERIAL IN MICROCAVITY OR MICROPASSAGE BY MECHANICOCHEMICAL POLISHING - A surface of a substrate comprising microcavities leading out of the substrate is placed in contact with an aqueous solution comprising a plurality of suspended particles and a fabric. Perpendicular pressure is applied the expanse of the substrate between the fabric and the surface of the substrate, and relative movement of the fabric and the surface is applied to the expanse of the substrate. At least one particle is thus fed into each microcavity, therein forming a porous material that is a catalyst material for nanothread or nanotube growth. | 02-10-2011 |
20110006430 | COPPER DIFFUSION BARRIER - The invention concerns a method of forming a copper portion surrounded by an insulating material in an integrated circuit structure, the insulating material being a first oxide, the method having steps including forming a composite material over a region of the insulating material where the copper portion is to be formed, the composite material having first and second materials, annealing such that the second material reacts with the insulating material to form a second oxide that provides a diffusion barrier to copper; and depositing a copper layer over the composite material by electrochemical deposition to form the copper portion. | 01-13-2011 |
20100327327 | PHOTOSENSITIVE CHARGE-COUPLED DEVICE COMPRISING VERTICAL ELECTRODES - A charge transfer device formed in a semiconductor substrate and including an array of electrodes forming rows and columns, wherein: the electrodes extend, in rows, in successive grooves with insulated walls, disposed in the substrate thickness and parallel to the charge transfer direction. | 12-30-2010 |
20100327326 | TWO-PHASE CHARGE-COUPLED DEVICE - A charge-coupled unit formed in a semiconductor substrate and including an array of identical electrodes forming rows and columns, wherein: each electrode extends in a cavity with insulated walls formed of a groove, oriented along a row, dug into the substrate thickness, and including, at one of its ends, a protrusion extending towards at least one adjacent row. | 12-30-2010 |
20100327325 | MULTIDIRECTIONAL TWO-PHASE CHARGE-COUPLED DEVICE - A charge transfer device formed in a semiconductor substrate and including an array of electrodes distributed in rows and columns, wherein: each electrode is formed in a cavity with insulated walls formed of a groove which generally extends in the row direction, having a first end closer to an upper row and a second end closer to a lower row; and the electrodes of two adjacent rows are symmetrical with respect to a plane orthogonal to the sensor and comprising the direction of a row. | 12-30-2010 |
20100320567 | INTEGRATED CIRCUIT COMPRISING A CAPACITOR WITH METAL ELECTRODES AND PROCESS FOR FABRCATING SUCH A CAPACITOR - An integrated circuit (IC) includes at least one capacitor with metal electrodes. At least one of the electrodes ( | 12-23-2010 |
20100314668 | DEVICE WITH INTEGRATED CIRCUIT AND ENCAPSULATED N/MEMS AND METHOD FOR PRODUCTION - A method for producing a device including at least one integrated circuit and at least one N/MEMS. The method produces the N/MEMS in at least one upper layer arranged at least above a first section of a substrate, produces the integrated circuit in a second section of the substrate and/or in a semiconductor layer arranged at least above the second section of the substrate, and further produces a cover encapsulating the N/MEMS from at least one layer used for production of a gate in the integrated circuit and/or for producing at least one electrical contact of the integrated circuit. | 12-16-2010 |
20100308411 | METHOD FOR FORMING AN INTEGRATED CIRCUIT LEVEL BY SEQUENTIAL TRIDIMENSIONAL INTEGRATION - A method for forming a level of a tridimensional structure on a first support in which components are formed, including the steps of forming, on a second semiconductor support, a single-crystal semiconductor substrate with an interposed thermal oxide layer; placing the free surface of the single-crystal semiconductor substrate on the upper surface of the first support; eliminating the second semiconductor support; and thinning down the thermal oxide layer down to a thickness capable of forming a gate insulator. | 12-09-2010 |
20100297799 | IMAGE CAPTURE UNIT - An image capture unit and its manufacturing method. The image capture unit includes a thinned-down integrated circuit chip having an image sensor on its upper surface side. A wall extends above a peripheral upper surface ring-shaped area, and a lens rests on the high portion of the wall. | 11-25-2010 |
20100295416 | MICRORESONATOR - A microresonator comprising a single-crystal silicon resonant element and at least one activation electrode placed close to the resonant element, in which the resonant element is placed in an opening of a semiconductor layer covering a substrate, the activation electrode being formed in the semiconductor layer and being level at the opening. | 11-25-2010 |
20100289107 | PHOTODIODE WITH INTERFACIAL CHARGE CONTROL BY IMPLANTATION AND ASSOCIATED PROCESS - A photodiode includes a first doped layer and a second doped layer adjacent to the first doped layer and sharing a common face. A deep isolation trench is provided adjacent the photodiode having a face contiguous with the first doped layer and the second doped layer. A free face of the second doped layer is in contact with a conducting layer. A protective layer capable of generating a layer of negative charge is provided at the interface between, on one side, the first doped layer and the second doped layer and, on the other side, the deep isolation trench. | 11-18-2010 |
20100289106 | PHOTODIODE WITH INTERFACIAL CHARGE CONTROL AND ASSOCIATED PROCESS - A photodiode includes a first doped layer and a second doped layer that share a common face. A deep isolation trench has a face contiguous with the first and second doped layers. A conducting layer is in contact with a free face of the second doped layer. A protective layer is provided at an interface with the first doped layer and second doped layer. This protective layer is capable of generating a layer of negative charge at the interface. The protective layer may further be positioned within the second doped layer to form an intermediate protective structure. | 11-18-2010 |
20100276693 | FINFET FIELD EFFECT TRANSISTOR INSULATED FROM THE SUBSTRATE - A finFET field effect transistor is produced by the formation of an electrical junction between the thin fin portion of semiconductor material which forms the channel of the transistor and the circuit substrate. Doping particles are implanted in the substrate through a mask which is then subsequently used to form the thin fin portion of the channel. The channel of the finFET transistor is thus electrically insulated from the circuit substrate in the same manner as in MOS integrated circuits realized from bulk silicon substrates. | 11-04-2010 |
20100230755 | PROCESS FOR PRODUCING AN MOS TRANSISTOR AND CORRESPONDING INTEGRATED CIRCUIT - A silicon substrate (SOI) is placed on a buried oxide layer (BOX). An MOS transistor is produced in an active zone of the substrate which is defined by an isolating region. A gate region and source and drain regions, which between them define a channel, are produced so that the gate region extends above the channel. The isolating region is produced by localized formation of a zone of material that can be selectively etched with respect to silicon. That material is selectively etched, and a dielectric material is deposited in the etched feature. The etching is carried out after the gate region has been produced. An upper surface of the substrate and an upper surface of the isolating region are flush with each other so as to define a planar surface on which the transistor gate region is formed. | 09-16-2010 |
20100204944 | CLOCK CIRCUITS AND COUNTING VALUES IN INTEGRATED CIRCUITS - A clock circuit for an integrated circuit having at least one MOS transistor. The clock circuit includes a first circuit for inducing a degradation of the transistor as a function of time and means for measuring a parameter of the transistor that reflects a lowering of the performance of the transistor resulting from the degradation. This also includes a method of generating a counting value of clock circuit by inducing continuous degradation of an MOS transistor. The method could include measuring a parameter of transistor, reflecting a lowering of performance of transistor resulting from said degradation. The method could also include measuring the temperature and calculating the counting value of the clock from the value of said parameter, from the measured temperature and from a law of variation of the parameter as a function of time and temperature. | 08-12-2010 |
20100193845 | BACKSIDE ILLUMINATION SEMICONDUCTOR IMAGE SENSOR - A backside illumination semiconductor image sensor, wherein each photodetection cell includes a semiconductor body of a first conductivity type of a first doping level delimited by an insulation wall, electron-hole pairs being capable in said body after a backside illumination; on the front surface side of said body, a ring-shaped well of the second conductivity type, this well delimiting a substantially central region having its upper portion of the first conductivity type of a second doping level greater than the first doping level; and means for controlling the transfer of charge carriers from said body to said upper portion. | 08-05-2010 |
20100124100 | DEVICE FOR CONTROLLING THE ACTIVITY OF MODULES OF AN ARRAY OF MEMORY MODULES - A memory device includes an array of memory modules, a global controller, and a local controller for each memory module in the array of memory modules being configured to deliver to the global controller an activity signal reflecting an activity of the respective memory module. The memory device includes a circuit configured to implement a NAND logic function based upon the activity signals and to output a control signal to the global controller based upon the NAND logic function. | 05-20-2010 |
20100102402 | METHOD OF FABRICATING A TRANSISTOR WITH SEMICONDUCTOR GATE COMBINED LOCALLY WITH A METAL - A method of forming a field effect transistor comprising a gate formed on an insulating layer, the gate having, in a zone in contact with the insulating layer, a semiconducting central zone and lateral zones in the length of the gate, the method comprising forming a gate comprising a portion of insulating layer, a portion of semiconducting layer formed over the insulating layer, and a portion of mask layer formed over the semiconducting layer; performing an etching of the portion of the mask layer such that only a portion in the centre of the gate remains; and reacting the semiconducting gate with a metal deposited over the gate. | 04-29-2010 |
20100061139 | RANDOM ACCESS MEMORY CIRCUIT - A random access memory circuit includes a plurality of pixels, each having a light sensitive area and a light blocking layer arranged over at least each of the light sensitive areas. In an alternative embodiment, the circuit includes a plurality of memory elements for storing data. Each memory element may comprise a bit node formed between a photodiode, having a light arranged over the photodiode, and a switching element, where data may be stored. The circuit may also include a plurality of reading and writing circuits for reading and writing data to and from the memory cells. | 03-11-2010 |
20100060386 | BULK ACOUSTIC WAVE RESONATOR WITH ADJUSTABLE RESONANCE FREQUENCY AND USE OF SUCH A RESONATOR IN THE FIELD OF TELEPHONY - A bulk acoustic wave resonator has an adjustable resonance frequency. A piezoelectric element is provided having first and second electrodes. A switching element is provided in the form of a MEMS structure which is deformable between a first and second position. The switching element forms an additional electrode that is selectively disposed on top of, and in contact with, one of the first and second electrodes. This causes a total thickness of the electrode of the resonator to be changed resulting in a modification of the resonance frequency of the resonator. | 03-11-2010 |
20100044886 | SEMICONDUCTOR DEVICE HAVING PAIRS OF PADS - An integrated-circuit semiconductor device includes external electrical connection pads on one face and electrical connection vias under said pads. The electrical connection vias are arranged with a defined pitch in a defined direction. Each via is respectively associated with one of a plurality of adjacent zones of the face. These zones extend perpendicularly to the pitch direction. The electrical connection pads are grouped in adjacent pairs. An insulation space is located between the pads of each pair of electrical connection pads. In a direction perpendicular to the pitch direction, the pads in the pair are spaced apart. The pads of each pair of electrical connection pads extend over a pair of adjacent zones and are associated with two adjacent vias. | 02-25-2010 |
20100041189 | SELECTIVE REMOVAL OF A SILICON OXIDE LAYER - A method of fabricating a device, including the steps of forming a first silicon oxide layer within a first region of the device and a second silicon oxide layer within a second region of the device, implanting doping ions of a first type into the first region, implanting doping ions of a second type into the second region, and etching the first and second regions for a determined duration such that the first silicon oxide layer is removed and at least a part of the second silicon oxide layer remains. | 02-18-2010 |
20100039874 | MEMORY WITH SHARED READ/WRITE CIRCUIT - A memory includes memory cells arranged as a matrix of rows and columns between word lines and bit lines, and a set of differential read/write amplifiers for reading and writing of the memory cells and for communicating with local bit lines common to at least some of the memory cells. A read/write circuit is common to the set of differential read/write amplifiers, and a set of selection gateways selectively transfer data between the common read/write circuit and a selected differential read/write amplifier. | 02-18-2010 |
20100038797 | CONTROLLING LATERAL DISTRIBUTION OF AIR GAPS IN INTERCONNECTS - Properties of a hard mask liner are used against the diffusion of a removal agent to prevent air cavity formation in specific areas of an interconnect stack. According to one embodiment, there is provided a method in which there is defined a portion on a surface of an IC interconnect stack as being specific to air cavity introduction, with the defined portion being smaller than the surface of the substrate. At least one metal track is produced within the interconnect stack, and there is deposited at least one interconnect layer having a sacrificial material and a permeable material within the interconnect stack. There is defined at least one trench area surrounding the defined portion and forming at least one trench, and a hard mask layer is deposited to coat the trench. At least one air cavity is formed below the defined portion of the surface by using a removal agent for removing the sacrificial material to which the permanent material is resistant. | 02-18-2010 |
20100035414 | METHOD FOR PREPARING A GERMANIUM LAYER FROM A SILICON-GERMANIUM-ON-ISOLATOR SUBSTRATE - A method for making a germanium-on-insulator layer from an SGOI substrate, including: a) depositing on the substrate a layer of a metallic element M capable of selectively forming a silicide, the layer being in contact with a silicon-germanium alloy layer; and b) a reaction between the alloy layer and the layer of a metallic element M, by which a stack of M silicide-germanium-insulator layers is obtained. Such a method may, for example, find application to production of electronic devices such as MOSFET transistors. | 02-11-2010 |
20100032734 | MINIATURE IMAGE SENSOR - An image sensor including at least one photodiode and at least one transistor formed in and on a silicon substrate, the assembly of the photodiode and of the transistor being surrounded with a heavily-doped insulating wall, wherein the silicon substrate has a crystal orientation (110). | 02-11-2010 |
20100025773 | PROCESS FOR PRODUCING A CONTACT PAD ON A REGION OF AN INTEGRATED CIRCUIT, IN PARTICULAR ON THE ELECTRODES OF A TRANSISTOR - A region is locally modified so as to create a zone that extends as far as at least part of the surface of the region and is formed from a material that can be removed selectively with respect to the material of the region. The region is then covered with an insulating material. An orifice is formed in the insulating material emerging at the surface of the zone. The selectively removable material is removed from the zone through the orifice so as to form a cavity in place of the zone. The cavity and the orifice are then filled with at least one electrically conducting material so as to form a contact pad. | 02-04-2010 |
20100002358 | HIGH-STABILITY THIN-FILM CAPACITOR AND METHOD FOR MAKING THE SAME - The dielectric of a capacitor is formed by superposition of at least two thin layers made from the same metal oxide, respectively in crystalline and amorphous form and respectively presenting quadratic voltage coefficients of capacitance of opposite signs. The respective thicknesses d | 01-07-2010 |
20090309232 | METHOD OF MAKING CONNECTIONS IN A BACK-LIT CIRCUIT - A method for forming, on a surface of a thinned-down semiconductor substrate, a contact connected to a metal track of an interconnect stack formed on the opposite surface of the thinned-down substrate, including the steps of: forming, on the side of a first surface of a substrate, an insulating region penetrating into the substrate and coated with a conductive region and with an insulating layer crossed by conductive vias, the vias connecting a metal track of the interconnect stack to the conductive region; gluing the external surface of the interconnect stack on a support and thinning down the substrate; etching the external surface of the thinned-down substrate and stopping on the insulating region; etching the insulating region and stopping on the conductive region; and filling the etched opening with a metal. | 12-17-2009 |
20090266973 | VERY SMALL IMAGE SENSOR - An image sensor formed in a semiconductor stack of a lower region of a first conductivity type and of an upper region of a second conductivity type, including: a photodiode formed of a first portion of the stack; a read area formed of a second portion of the stack; a trench with insulated walls filled with a conductive material, the trench surrounding the photodiode and the read area and being interrupted, all along its height, on a portion facing the photodiode and the read area; and first connection mechanism associated with the conductive material of the trench and capable of being connected to a reference bias voltage. | 10-29-2009 |
20090252871 | Method for producing a membrane comprising micropassages made from porous material by chemical mechanical polishing - A surface of a support comprising through micropassages is brought into contact with an aqueous solution comprising a plurality of particles in suspension and a pad. A pressure perpendicular to the plane of the support, between the pad and the surface of the support, and a relative movement of the pad and of the surface in a direction parallel to the plane of the support are applied. At least one particle is thus introduced in each microgap to form a porous material therein. | 10-08-2009 |
20090243101 | METHOD FOR FORMING INTERCONNECTION LEVELS OF AN INTEGRATED CIRCUIT - A method for forming interconnection levels of an integrated circuit, including the steps of: (a) forming an interconnection level comprising conductive tracks and vias separated by a porous dielectric material; (b) forming, on the interconnection level, a layer of a non-porous insulating material, said layer comprising openings above portions of porous dielectric material; (c) repeating steps (a) and (b) to obtain the adequate number of interconnection levels; and (d) annealing the structure. | 10-01-2009 |
20090212333 | METHOD OF MANUFACTURING A BURIED-GATE SEMICONDUCTOR DEVICE AND CORRESPONDING INTEGRATED CIRCUIT - A semiconductor device includes a semiconductor channel region and a gate region, wherein the gate region includes at least one buried part extending under the channel region. The buried part of the gate region is formed from a cavity under the channel region. The cavity is filled with a first material. An opening is made to access the first material. In one implementation, aluminum is deposited in the opening in contact with the first material. An anneal is performed to cause the aluminum to be substituted for the first material in the cavity. In another implementation, a second material different from the first material is deposited in the opening. An anneal is performed to cause an alloy of the first and second materials to be formed in the cavity. | 08-27-2009 |
20090212330 | METHOD OF FABRICATING A BURIED-GATE SEMICONDUCTOR DEVICE AND CORRESPONDING INTEGRATED CIRCUIT - A semiconductor device includes a semiconductive channel region and a gate region. The gate region has at least one buried part extending under the channel region. The buried part of the gate region is formed by forming a cavity under the channel region. That cavity is at least partial filled with silicon and a metal. An annealing step is performed so as to form a silicide of said metal in the cavity. The result is a totally silicided buried gate for the semiconductor device. | 08-27-2009 |
20090152998 | MICRORESONATOR - A microresonator comprising a single-crystal silicon resonant element and at least one activation electrode placed close to the resonant element, in which the resonant element is placed in an opening of a semiconductor layer covering a substrate, the activation electrode being formed in the semiconductor layer and being level at the opening. | 06-18-2009 |
20090134441 | INTEGRATED ELECTRONIC CIRCUIT INCORPORATING A CAPACITOR - A non-volatile memory element includes a transistor for selecting the element and a capacitor for recording a binary value by electrical breakdown of an insulating layer of the capacitor. A structure of the memory element is modified in order to allow a higher degree of integration of the element within an electronic circuit of the MOS type. In addition, the memory element is made more robust with respect to a high electrical voltage (VDD) used for recording the binary value. The transistor includes a drain in the substrate with electric field drift in a longitudinal direction extending towards the capacitor. The electric field drift region for the drain includes a first extension underneath the gate of the transistor opposite the source and a second extension underneath the insulating layer of the capacitor. Doping of the substrate for the electric field drift region is limited to a region substantially corresponding to a distance between the gate and an electrode of the capacitor. | 05-28-2009 |