Sputtering Components, Inc. Patent applications |
Patent application number | Title | Published |
20150120001 | DECENTRALIZED PROCESS CONTROLLER - A decentralized process controller comprises at least two programmable interface modules in operative communication with each other. Each of the interface modules includes a processor and is configurable for connection to separate field devices comprising at least one sensor device and at least one actuator device. The at least two programmable interface modules are configurable as a stand-alone process control loop when one of the interface modules is connected to the sensor device, and the other of the interface modules is connected to the actuator device. | 04-30-2015 |
20140246312 | SPUTTERING APPARATUS - A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery. | 09-04-2014 |
20140246310 | SPUTTERING APPARATUS - A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly. | 09-04-2014 |
20140184073 | PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE - One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed. | 07-03-2014 |
20140061029 | SPUTTERING APPARATUS - One embodiment is directed to a magnetron assembly comprising a plurality of magnets, and a yoke configured to hold the plurality of magnets in at least four straight, parallel, independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion, wherein the outer portion substantially surrounds the perimeter of the inner portion. The end portions of the linear array comprise a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections of the outer portion. The magnets in each turnaround section are arranged to form at least two or more different curves in the magnetic field that are offset from each along the target rotation axis. | 03-06-2014 |
20130032476 | ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEM - A magnetron sputtering device includes a cathode source assembly, and a target assembly removably coupled to the cathode source assembly. The cathode source assembly comprises a rotatable drive shaft, and a water feed tube located in the drive shaft and coupled to a tube support. The target assembly comprises a rotary cathode including a rotatable target cylinder, the rotary cathode removably mounted to the drive shaft. A magnet bar inside of the target cylinder is coupled to an end portion of the feed tube. A sweeping mechanism coupled to the magnet bar includes a control motor. An indexing pulley is coupled to the control motor, and a magnet bar pulley is coupled to the indexing pulley. The magnet bar pulley is affixed to the tube support such that any motion of the magnet bar pulley is translated to the magnet bar through the tube support and the feed tube. | 02-07-2013 |
20120175251 | SPUTTERING APPARATUS - In one embodiment, a magnetron assembly comprises a plurality of magnets and a yoke configured to hold the plurality of magnets in at least four independent linear arrays. The plurality of magnets is arranged in the yoke so as to form a pattern comprising an outer portion and an inner portion. The outer portion substantially surrounds the perimeter of the inner portion. The magnets used to form the outer portion have a first polarity and the magnets used to form the inner portion having a second polarity. The outer portion of the pattern comprises a pair of elongated sections that are substantially parallel to one another. The outer portion of the pattern comprises a pair of turnaround sections, wherein each turnaround section substantially spans respective ends of the pair of elongated sections and wherein each turnaround section comprises a plurality of magnets having the first polarity. Other embodiments are described. | 07-12-2012 |
20110155568 | INDEXING MAGNET ASSEMBLY FOR ROTARY SPUTTERING CATHODE - A magnet assembly for a rotary cathode having a rotatable target cylinder is provided. The magnet assembly comprises a coolant tube configured to be positioned within the target cylinder, and a magnet bar configured to be positioned within the target cylinder and extending substantially parallel to the coolant tube. The magnet bar moves laterally with respect to the target cylinder in a synchronous manner with rotation of the target cylinder. | 06-30-2011 |
20110024987 | MECHANICAL SEAL ASSEMBLY FOR A ROTATABLE SHAFT - A mechanical seal assembly for a rotatable shaft is disclosed. In one embodiment, the mechanical seal assembly comprises a first sealing element configured to surround a rotatable shaft, the first sealing element including an annular plate, and a plurality of annular rings that protrude from the annular plate in a direction substantially parallel to the rotatable shaft. The annular rings are concentric with the rotatable shaft. A second sealing element is configured to surround the rotatable shaft, with the second sealing element including one or more springs that provide a biasing force against the first sealing element such that substantially constant contact is maintained between the annular rings and a sealing surface. One or more lubricant cavities are defined between the annular rings and the sealing surface. | 02-03-2011 |
20100243428 | ROTARY CATHODE FOR MAGNETRON SPUTTERING APPARATUS - A rotary cathode for a magnetron sputtering apparatus is disclosed. The rotary cathode comprises a rotatable target cylinder, and a non-rotatable interior structure in the target cylinder. The interior structure has an outer surface and an inner passageway. An outer passageway is defined between an inner surface of the target cylinder and the outer surface of the interior structure. An end cap is affixed at a distal end of the target cylinder. A rotating aperture is adjacent to an inner surface of the target cylinder at the distal end thereof, with the rotating aperture configured to direct a fluid toward the inner surface at the distal end. A fluid pathway is at least partially defined by the end cap, with the pathway providing fluid communication between the outer passageway and the inner passageway through the rotating aperture. | 09-30-2010 |