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SOURCE PHOTONICS, INC.

SOURCE PHOTONICS, INC. Patent applications
Patent application numberTitlePublished
20110193951VIRTUAL MASK SYSTEM AND METHOD FOR OPERATING THE SAME - A virtual mask system includes a stage configured to retain an object, an image-capturing device configured to capture the image of the field of view of the microscope, and a processing module configured to generate a virtual mask and superimpose the virtual mask with the image of the object. In one embodiment of the present invention, a method for operating a virtual mask system includes the steps of generating a virtual mask, placing a first object on a stage, capturing at least one image of the first object, and superimposing the virtual mask with the image of the first object by adjusting a position or an inclined angle of the stage or adjusting a capturing position of an image-capturing device by considering at least the virtual mask and the image of the first object.08-11-2011