| 20100227456 | METHOD OF GROWING SEMICONDUCTOR MICRO-CRYSTALLINE ISLANDS ON AN AMORPHOUS SUBSTARATE - A method for growing islands of semiconductor monocrystals from a solution on an amorphous substrate includes the procedures of depositing a semiconductor-metal mixture layer, applying lithography and etching for forming at least one platform, heating the at least one platform, and saturating the semiconductor-metal solution until a monocrystal of the semiconductor component is formed. The procedure of depositing a semiconductor-metal mixture layer, includes a semiconductor component and at least one other metal component, is performed on top of the amorphous substrate. The procedure of applying lithography and etching to the semiconductor-metal mixture layer and a portion of the amorphous substrate is performed for forming at least one platform, the at least one platform having a top view shape corresponding to crystal growth direction and habit respective of the semiconductor component. The procedure of heating the at least one platform is performed until the semiconductor-metal mixture layer of the at least one platform is melted and becomes a semiconductor-metal solution. The procedure of saturating the semiconductor-metal solution is performed until a monocrystal of the semiconductor component is formed from the solution on each of the at least one platform. | 09-09-2010 |
