| SIGMA LABORATORIES OF ARIZONA, LLC Patent applications |
| Patent application number | Title | Published |
|---|
| 20120003449 | NANO-STRUCTURED DIELECTRIC COMPOSITE - A multilayer dielectric structure is formed by vacuum depositing two-dimensional matrices of nanoparticles embedded in polymer dielectric layers that are thicker than the effective diameter of the nanoparticles, so as to produce a void-free, structured, three-dimensional lattice of nanoparticles in a polymeric dielectric material. As a result of the continuous, repeated, and controlled deposition process, each two-dimensional matrix of nanoparticles consists of a layer of uniformly distributed particles embedded in polymer and separated from adjacent matrix layers by continuous polymer dielectric layers, thus forming a precise three-dimensional nanoparticle matrix defined by the size and density of the nanoparticles in each matrix layer and by the thickness of the polymer layers between them. The resulting structured nanodielectric exhibits very high values of dielectric constant as well as high dielectric strength. | 01-05-2012 |
| 20110262699 | LOW-EMISSIVITY STRUCTURES - A multilayer radiant-barrier structure is formed on one or both sides of a substrate that can be attached to an insulating layer to produce a reflective insulating material. The metallized layer is protected from environmental degradation without interfering with flammability properties that are critical for radiant and reflective insulation materials used in housing applications. The metal layer is modified to insulate enclosures without blocking cellular communications and the protective functional layer in modified to minimize emissivity, create a hydrophobic and/or oleophobic surface, and/or prevent mold, fungi and bacteria growth. Solutions are provided to solve occupational-hazard problems associated with the use of these materials in enclosures that include power wires. | 10-27-2011 |
| 20100062176 | Boundary layer disruptive preconditioning in atmospheric-plasma process - The boundary layer of a substrate is exposed to a low-energy inert-gas atmospheric plasma that disrupts the layer's bonds, thereby permitting the removal of most oxygen from the surface of the substrate. The substrate is then passed through an exhaust section to remove the disrupted boundary layer prior to conventional plasma treatment. The subsequent plasma treatment is carried out in conventional manner in a substantially oxygen-free environment. As a result of the invention, the high surface-energy levels provided by plasma treatment are more lasting and plasma applications requiring a substantially oxygen-free environment are more efficient. | 03-11-2010 |
| 20090041936 | COMPOSITE REFLECTIVE BARRIER - A coated, low-emissivity aluminum film is manufactured entirely in vacuum by depositing an aluminum layer over a substrate and then immediately coating the metal layer with a very thin protective polymeric layer. The thickness of this coating is selected to minimize absorption in the 3-15 micron wavelength. In vacuum, the metal layer is coated substantially in the absence of moisture, thereby preventing the formation of hydrated oxides that promote corrosion. The aluminum layer is preferably also passivated by in-line exposure to a plasma gas containing an oxygen-bearing component. A leveling polymeric layer may also be deposited between relatively rough substrates and the aluminum layer in order to improve the reflectivity of the resulting structures. | 02-12-2009 |
