| Shipley Company, L.L.C. Patent applications |
| Patent application number | Title | Published |
|---|
| 20090220888 | Dyed photoresists and methods and articles of manufacture comprising same - The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation. | 09-03-2009 |
| 20080285601 | External cavity semiconductor laser and method for fabrication thereof - The present invention concerns a design for an external cavity single mode laser wherein a short optical path length for the optical cavity (e.g., ˜3 to 25 mm) provides sufficient spacing of the longitudinal modes allowing a single wavelength selective element, such as a microfabricated etalon, to provide a single mode of operation, and optionally a selectable mode of operation. | 11-20-2008 |
| 20080248426 | Antihalation compositions - Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder. | 10-09-2008 |
