| SHIN-ETSU CHEMICAL CO., LTD. Patent applications |
| Patent application number | Title | Published |
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| 20120136086 | SILICONE-MODIFIED ADAMANTANE DERIVATIVE, PHOTO-RADICALLY CURABLE RESIN COMPOSITION, AND METHOD FOR PREPARING PHOTO-RADICALLY CURABLE RESIN COMPOSITION - There is disclosed a silicone-modified adamantane derivative represented by the following general formula (1), | 05-31-2012 |
| 20120135349 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure. | 05-31-2012 |
| 20120132130 | METHOD OF PRODUCING SiC SINGLE CRYSTAL - A method of producing a SiC single crystal includes: disposing a SiC seed crystal at a bottom part inside a graphite crucible; causing a solution containing Si, C and R (R is at least one selected from the rare earth elements inclusive of Sc and Y) or X (X is at least one selected from the group consisting of Al, Ge, Sn, and transition metals exclusive of Sc and Y) to be present in the crucible; supercooling the solution so as to cause the SiC single crystal to grow on the seed crystal; and adding powdery or granular Si and/or SiC raw material to the solution from above the graphite crucible while keeping the growth of the SiC single crystal. | 05-31-2012 |
| 20120129106 | POSITIVE LIFT-OFF RESIST COMPOSITION AND PATTERNING PROCESS - A positive lift-off resist composition is provided comprising (A) an alkali-soluble novolac resin, (B) a quinonediazidosulfonate photosensitive agent, (C) an alkali-soluble cellulose resin, and (D) an aromatic hydroxy compound having a formula weight of 180-800. The composition has shelf stability, high sensitivity, and a film retention after development of at least 95% and is used to form a lift-off resist pattern of fully undercut profile. | 05-24-2012 |
| 20120129082 | METHOD OF ADHERING LITHOGRAPHIC PELLICLE AND ADHERING APPARATUS THEREFOR - A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame | 05-24-2012 |
| 20120129048 | BINDER FOR LITHIUM SECONDARY BATTERY, NEGATIVE ELECTRODE FOR LITHIUM SECONDARY BATTERY, LITHIUM SECONDARY BATTERY, BINDER PRECURSOR SOLUTION FOR LITHIUM SECONDARY BATTERY, AND METHOD FOR MANUFACTURING NEGATIVE ELECTRODE FOR LITHIUM SECONDARY BATTERY - Provided is a binder capable of realizing a lithium secondary battery that includes a negative electrode including a negative-electrode active material layer containing at least one of silicon and a silicon alloy as a negative-electrode active material and also containing a binder and has an excellent charge-discharge cycle characteristic. The binder for the lithium secondary battery contains a polyimide resin that is formed by imidizing either a tetracarboxylic acid or a tetracarboxylic anhydride and a diamine, the polyimide resin having a hydrolyzable silyl group. | 05-24-2012 |
| 20120126362 | SOS SUBSTRATE HAVING LOW DEFECT DENSITY IN THE VICINITY OF INTERFACE - A bonded SOS substrate having a semiconductor film on or above a surface of a sapphire substrate is obtained by a method with the steps of implanting ions from a surface of a semiconductor substrate to form an ion-implanted layer; activating at least a surface from which the ions have been implanted; bonding the surface of the semiconductor substrate and the surface of the sapphire substrate at a temperature of 50° C. to 350° C.; heating the bonded substrates at a maximum temperature from 200° C. to 350° C. to form a bonded body; and irradiating visible light from a sapphire substrate side or a semiconductor substrate side to the ion-implanted layer of the semiconductor substrate for embrittling an interface of the ion-implanted layer, while keeping the bonded body at a temperature higher than the temperature at which the surfaces of the semiconductor substrate and the sapphire substrate were bonded. | 05-24-2012 |
| 20120123049 | THERMOSETTING FLUOROPOLYETHER ADHESIVE COMPOSITION AND ADHESION METHOD - A thermosetting fluoropolyether adhesive composition is provided. This composition cures at lower than 100° C., and the cured product exhibits good adhesion to various substrates and excellent adhesion durability at a temperature of up to 150° C. A method for adhering the composition to the substrate is also provided. The composition comprises (A) a straight chain polyfluoro compound, (B) a fluorine-containing organohydrogenpolysiloxane containing at least 2 SiH groups and not containing other functional group, (C) a platinum group metal catalyst, (D) a fluorine-containing organohydrogenpolysiloxane containing a fluorine-containing organic group, SiH group, epoxy group and/or tri(organoxy)silyl group, and an aryl group, (E) a polyhydric allyl ester compound, (F) an organosilicon compound having epoxy group and an organoxy group, and not containing SiH group, and (G) an organosilicon compound having SiH group and an aryl group, and not containing epoxy group or a tri(organoxy)silyl group, or a fluorine-containing organic group. | 05-17-2012 |
| 20120122024 | Pellicle for lithography - There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform. | 05-17-2012 |
| 20120121493 | METHOD FOR PURIFYING CHLOROSILANES - The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R′ (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: R | 05-17-2012 |
| 20120119336 | METHOD FOR MANUFACTURING BONDED WAFER - A method for manufacturing a bonded wafer having a semiconductor film on a handle substrate involving the steps of: implanting ions into a semiconductor substrate to form an ion-implanted layer; subjecting the surface of at least one of the semiconductor substrate and the handle substrate to a surface activation treatment; bonding the surface of the semiconductor substrate to the surface of the handle substrate at a temperature from 50° C. to 350° C.; heating the bonded substrates at a maximum temperature from 200° C. to 350° C. to obtain a bonded body; and transferring a semiconductor film to the handle substrate by subjecting the bonded body to a temperature 30° C. to 100° C. higher than the bonding temperature, and irradiating the bonded body with visible light from a handle or semiconductor substrate side toward the ion-implanted layer of the semiconductor substrate to embrittle the interface of the ion-implanted layer. | 05-17-2012 |
| 20120119323 | SOS SUBSTRATE HAVING LOW SURFACE DEFECT DENSITY - A method of making bonded SOS substrate with a semiconductor film on or above a sapphire substrate by implanting ions from a surface of the semiconductor substrate to form an ion-implanted layer; activating at least a surface of one of the sapphire substrate and the semiconductor substrate from which the ions have been implanted; bonding the surface of the semiconductor substrate and the surface of the sapphire substrate at a temperature of from 50° C. to 350° C.; heating the bonded substrates at a maximum temperature of from 200° C. to 350° C.; and irradiating visible light from a sapphire substrate side or a semiconductor substrate side to the ion-implanted layer of the semiconductor substrate to make the interface of the ion-implanted layer brittle at a temperature of the bonded body higher than the temperature at which the surfaces were bonded, to transfer the semiconductor film to the sapphire substrate. | 05-17-2012 |
| 20120119137 | THERMALLY CONDUCTIVE SILICONE GREASE COMPOSITION - A thermally conductive silicone grease composition comprising:
| 05-17-2012 |
| 20120118354 | METHOD FOR MANUFACTURING SINGLE CRYSTAL SILICON SOLAR CELL AND SINGLE CRYSTAL SILICON SOLAR CELL - A single crystal silicon solar cell including a stack having at least a light-reflecting film, a single crystal silicon layer, a transparent adhesive layer, and a transparent insulator substrate; a plurality of areas of a first conductivity type and a plurality of areas of a second conductivity type formed in a surface of the silicon layer near the light-reflecting film; a plurality of pn junctions formed in a plane direction of the silicon layer; a plurality of first individual electrodes, each being formed on each one of the plurality of areas of the first conductivity type, and a plurality of second individual electrodes, each being formed on each one of the plurality of areas of the second conductivity type; and a first collector electrode for connecting the plurality of first individual electrodes and a second collector electrode for connecting the plurality of second individual electrodes. | 05-17-2012 |
| 20120108762 | ADHESIVE COMPOSITION, ADHESIVE SHEET, SEMICONDUCTOR APPARATUS PROTECTION MATERIAL, AND SEMICONDUCTOR APPARATUS - A semiconductor apparatus adhesive composition having excellent adhesion properties when pressure-bonded and has excellent connection reliability and insulation reliability when hardened and an adhesive sheet using this adhesive composition. An adhesive composition including: (A) a silicone resin constituted of a repeating unit represented by the following general formula (1); (B) a thermosetting resin; and (C) a compound having a flux activity, | 05-03-2012 |
| 20120108071 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, namely, an underlayer film having optimum n-value and k-value, excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same. | 05-03-2012 |
| 20120108043 | PATTERN FORMING PROCESS - A resist pattern is formed by coating a first positive resist composition comprising a polymer comprising 20-100 mol % of aromatic group-containing recurring units and adapted to turn alkali soluble under the action of an acid onto a substrate to form a first resist film, coating a second positive resist composition comprising a C | 05-03-2012 |
| 20120107679 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention is a non-aqueous electrolyte secondary battery including at least a positive electrode, a negative electrode and a non-aqueous electrolyte, the positive and negative electrodes being capable of occluding and emitting lithium ions, wherein the negative electrode is composed of particles each having a structure that silicon nanoparticles are dispersed to silicon oxide, each of the particles is coated with a carbon coating, and the non-aqueous electrolyte includes lithium oxalatoborate in the range of 5 to 10 mass %, as the electrolyte. As a result, there is provided a non-aqueous electrolyte secondary battery having high capacity, superior first charge and discharge efficiency, superior cycle performance, and high safety, while a manufacturing method and structure thereof are not complex. | 05-03-2012 |
| 20120107613 | Corrosion-resistant article coated with aluminum nitride - A corrosion-resistant article is proposed which is coated with an aluminum nitride wherein the aluminum nitride grains contain oxygen by 0.1 mass % or greater but not greater than 20 mass % so that the thermal expansion coefficient of the coating layer is made even with that of the base body; the relative density of the coating layer is preferably 50% or higher but lower than 98%. It is preferred that the coating layer is first made by chemical vapor deposition and then subjected to an oxidizing atmosphere of a temperature of 700 degrees centigrade or higher but 1150 degrees centigrade or lower; or it is preferable that after the chemical vapor deposition step the coating layer is exposed to the natural atmosphere to adsorb hydrate and then subjected to a heat treatment in an inert atmosphere of a temperature of 900 degrees centigrade but 1300 degrees centigrade or lower. | 05-03-2012 |
| 20120107548 | Pellicle frame and a pellicle - A new kind of pellicle frame is proposed which is made up of a core body and a clad body; the core body consists of a composite of carbon fiber plus resin, and it is preferred that the carbon fiber exists in the form of a laminated body of carbon fiber sheets in which the resin is impregnated; and the clad body is the outer layer sealing the core body such that no carbon is exposed through the clad body. | 05-03-2012 |
| 20120105184 | ANISOTROPIC RARE EARTH SINTERED MAGNET AND MAKING METHOD - An anisotropic rare earth sintered magnet has a tetragonal R | 05-03-2012 |
| 20120103386 | SOLAR BATTERY MODULE - Disclosed is a solar battery module in which there are alternately provided: a first solar battery cell equipped with a first conductive substrate having a photoreceptor face and non-photoreceptor face, and electrodes having mutually different polarity respectively formed on the photoreceptor face and non-photoreceptor face; and a second solar battery cell equipped with a second conductive substrate having a photoreceptor face and non-photoreceptor face, and electrodes having mutually different polarity respectively formed on the photoreceptor face and non-photoreceptor face. | 05-03-2012 |
| 20120100698 | METHOD FOR FORMING AN ALUMINUM NITRIDE THIN FILM - The method is adapted for forming an aluminum nitride thin film having a high density and a high resistance to thermal shock by a chemical vapor deposition process and includes steps of mixing a gas containing aluminum atoms (Al) and a gas containing nitrogen atoms (N) with a gas containing oxygen atoms (O) and feeding the mixture to a member to be covered by an aluminum nitride thin film. | 04-26-2012 |
| 20120100467 | SPUTTERING TARGET MATERIAL, SILICON-CONTAINING FILM FORMING METHOD, AND PHOTOMASK BLANK - Provided is a silicon target material in which particles are not easily generated during a sputtering process and to form a low-defect (high quality) silicon-containing film. A silicon target material having a specific resistance of 20 Ω·cm or more at room temperature is used for forming a silicon-containing film. The silicon target material may be polycrystalline or noncrystalline. However, when the silicon target material is single-crystalline, a more stable discharge state can be obtained. Also, a single-crystal silicon in which crystals are grown by an FZ method is a preferable material as a highly-pure silicon target material because its content of oxygen is low. Further, a target material having n-type conductivity and containing donor impurities is preferable to obtain stable discharge characteristics. Only a single or a plurality of silicon target materials according to the present invention may be used for sputtering film formation of the silicon-containing film. | 04-26-2012 |
| 20120095135 | THERMOPLASTIC ELASTOMER AND MOLDED PRODUCT PRODUCED FROM THE SAME - A flexible, abrasion-resistant, dry to the touch thermoplastic elastomer made of a hydrogenated block copolymer having a weight-average molecular weight of 80,000 to 1,000,000, an olefin-based crystalline resin, a hydrocarbon-based softening agent for rubbers and an acryl-modified organopolysiloxane. At least the block copolymer and the organopolysiloxane are dynamically heat-treated in the presence of an organic peroxide. | 04-19-2012 |
| 20120093746 | AMINO ACID-MODIFIED ORGANOPOLYSILOXANE, MAKING METHOD, AND COSMETICS - An amino acid-modified organopolysiloxane can be prepared under mild reaction conditions by reacting an amino-modified organopolysiloxane with an amino acid or amino acid derivative ester in the presence of an organometallic catalyst. The amino acid-modified organopolysiloxane having a hydrophilic group is useful in cosmetics, powder surface treatment, fiber or fabric treatment, coating, and resin modification. | 04-19-2012 |
| 20120088034 | WAFER - A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system. | 04-12-2012 |
| 20120085964 | MOISTURE-THICKENING HEAT-CONDUCTIVE SILICONE GREASE COMPOSITION - A heat-conductive silicone grease composition is obtained by combining (A) a hydroxyl-endcapped organopolysiloxane, (B) a specific organopolysiloxane, (C) a silane compound having at least three hydrolyzable radicals and/or a hydrolyzate thereof, (D) a thickening catalyst, and (E) a heat-conductive filler. The composition is storable at RT, has a low initial viscosity enough to coat, and after coating, thickens with moisture at RT so that it becomes anti-sagging, remains re-workable, and has durable heat resistance. | 04-12-2012 |
| 20120077041 | FLUOROOXYALKYLENE GROUP-CONTAINING POLYMER COMPOSITION, A SURFACE TREATMENT AGENT COMPRISING THE SAME AND AN ARTICLE TREATED WITH THE AGENT - A fluorooxyalkylene group-containing polymer composition including a liner fluorooxyalkylene group-containing polymer represented by the formula (1) which has a hydrolysable group at a terminal and is hereinafter called “one-terminal modified polymer”, and a liner fluorooxyalkylene group-containing polymer represented by the following formula (2) which has hydrolysable groups at the both terminals and is hereinafter called “both-terminal modified polymer”, wherein an amount of the both-terminal modified polymer is 0.1 mole % or more and less than 10 mole %, relative to a total mole of the one-terminal modified polymer and the both-terminal modified polymer. | 03-29-2012 |
| 20120073333 | APPARATUS FOR FABRICATING POROUS GLASS PREFORM - The present invention provides an apparatus for fabricating porous glass preforms, in which any damages of a reaction vessel due to the increase in thermal load to the reaction vessel can be controlled without enlarging the reaction vessel. A wall of the reaction vessel includes a plurality of rectangular inner wall metal plates that defines at least apart of inner side walls of the reaction vessel, adjacent inner wall metal plates of a plurality of inner wall metal plates of which being weld bonded at their edges, and a plurality of metal frame members having higher stiffness than that of the inner wall metal plates and being arranged along each edge region of the opposite surface of the inner side walls of each of the plurality of inner wall metal plates and fixed to the edge region by a tightening or welding means. | 03-29-2012 |
| 20120073332 | QUARTZ GLASS BURNER - The present invention provides a quartz glass burner that can enhance the heating power of flame working without unnecessarily increasing the flow of combustion gas and improve the deposition efficiency on depositing glass particles onto a porous glass preform. The quartz glass burner has a large diameter outer tube, and a plurality of small diameter inner tubes enclosed in the outer tube, and a tip of the outer tube has a port defining member defining the outer shape of a combustion gas ejecting port that ejects combustion gas, and the port defining member protrudes from the inner circumference of the outer tube towards the center axis so as to block the outermost area including areas between the outer circumferences of a plurality of inner tubes forming the inner tube row and the inner circumference of the outer tube of the combustion gas flow path. | 03-29-2012 |
| 20120065390 | Method for Producing Low-Substituted Hydroxypropylcellulose - Provided is a method for producing low-substituted hydroxypropylcellulose in which depolymerization capable of achieving a target viscosity in a short time is carried out safely after an etherification reaction step. More specifically, provided is a method for producing low-substituted hydroxypropylcellulose having a degree of hydroxypropoxy substitution of from 9.5 to 16.0% by weight, comprising at least a step of reacting alkali cellulose with an etherifying agent and a step of carrying out depolymerization after the reaction. | 03-15-2012 |
| 20120064725 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS - A naphthalene derivative having formula (1) is provided wherein An and Art denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative is spin coated to form a resist bottom layer having improved properties. A pattern forming process in which a resist bottom layer formed by spin coating is combined with an inorganic hard mask formed by CVD is available. | 03-15-2012 |
| 20120060560 | APPARATUS FOR FABRICATING A GLASS ROD AND METHOD OF SAME - The present invention provides an apparatus and a method for fabricating a glass rod capable of suppressing a diameter fluctuation of a drawn glass rod even in a case of a relatively large diameter reduction ratio between a glass preform and a glass rod, such as 60 to 95%. The diameter (D) of the glass preform for determining the ratio from a measured diameter data is acquired, the measured diameter data is obtained by measuring a diameter of the glass preform before being drawn along a longitudinal direction of the preform, and the feed speed (V1) is determined so that the feed speed (V1) varies depending on a fluctuation of the measured diameter data in the longitudinal direction. | 03-15-2012 |
| 20120059080 | COATING COMPOSITION - A coating composition is provided comprising (A) a co-hydrolytic condensate of a UV-absorbing alkoxysilane, a UV-curable alkoxysilane, and a tetraalkoxysilane, (B) a polyfunctional poly(meth)acrylate, and (C) a photobleachable photopolymerization initiator. Upon exposure to UV, the composition cures briefly at low temperature to form a cured film having durability, adhesion and transparency. | 03-08-2012 |
| 20120058622 | METHOD FOR PRODUCING BONDED WAFER - When a thermal expansion coefficient of a handle substrate is higher than that of a donor substrate, delamination is provided without causing a crack in the substrates. A method for producing a bonded wafer, with at least the steps of: implanting ions into a donor substrate ( | 03-08-2012 |
| 20120058428 | PATTERNING PROCESS AND RESIST COMPOSITION - A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator having both a 9-fluorenylmethyloxycarbonyl-substituted amino group and a carboxyl group onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising an alcohol and an optional ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern. | 03-08-2012 |
| 20120058419 | TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD - A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip. | 03-08-2012 |
| 20120058347 | PLASTIC ARTICLE FOR AUTOMOTIVE GLAZING - A plastic article is provided wherein a plastic substrate is coated with multiple resin layers including a primer layer comprising a polymer having a UV-absorptive functional group incorporated therein and a weather resistant hardcoat layer comprising a reaction product of alkoxysilyl-containing benzophenone and/or a hydrolyzate thereof. | 03-08-2012 |
| 20120057834 | Optical Fiber, Optical Fiber Preform and Method of Fabricating Same - An optical fiber capable of suppressing an increase of a transmission loss after exposure of the optical fiber to hydrogen or deuterium is provided. The optical fiber has a core region, an inner cladding region surrounding the core region, a trench region surrounding the inner cladding region, an outer cladding region surrounding the trench region, and a refractive index varying region arranged between the inner cladding region and the trench region, the refractive index varying region having a refractive index gradually increasing from the trench region to the inner cladding region. | 03-08-2012 |
| 20120055199 | METHOD OF MANUFACTURING OPTICAL FIBER PREFORM - Provided is a method of manufacturing an optical fiber preform, comprising obtaining a base material ingot by sintering a porous glass base material at a high temperature to change the porous glass base material into glass while retaining an unsintered portion at one end thereof that is not completely changed to glass; and while relatively moving a heating means in a longitudinal direction of the base material ingot, applying a tensile force to a heated portion and beginning to extend the unsintered portion from one side to decrease a diameter of and extend the base material ingot. | 03-08-2012 |
| 20120055198 | APPARATUS FOR FABRICATING A GLASS ROD AND METHOD OF SAME - The present invention provides a apparatus and a method for fabricating a glass rod capable of suppressing a diameter fluctuation of a drawn glass rod even in case of a relatively large diameter reduction ratio between a glass preform and a glass rod, such as 60 to 95%. A feed speed V | 03-08-2012 |
| 20120045900 | COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND FULLERENE DERIVATIVE - The invention provides a composition for a resist underlayer film, the composition for a resist underlayer film to form a resist underlayer film of a multilayer resist film used in lithography, wherein the composition comprises at least (A) a fullerene derivative that is a reaction product of a substance having a fullerene skeleton with a 1,3-diene compound derivative having an electron-withdrawing group and (B) an organic solvent. There can be a composition for a resist underlayer film for a multilayer resist film used in lithography, the composition giving a resist underlayer film having excellent high dry etching resistance, capable of suppressing wiggling during substrate etching with high effectiveness, and capable of avoiding a poisoning problem in upperlayer patterning that uses a chemical amplification resist; a process for forming a resist underlayer film; a patterning process; and a fullerene derivative. | 02-23-2012 |
| 20120045714 | PELLICLE FOR LITHOGRAPHY AND MANUFACTURING METHOD THEREOF - A pellicle for lithography according to the present invention comprises a pellicle film ( | 02-23-2012 |
| 20120045635 | SOLVENTLESS ADDITION-CURABLE PRESSURE SENSITIVE SILICONE ADHESIVE COMPOSITION AND ADHESIVE ARTICLE - A solventless addition-curable pressure sensitive silicone adhesive composition is provided. The composition comprises (A) an alkenyl group-containing polydiorganosiloxane; (B) a condensation product of (a) a polydiorganosiloxane having hydroxyl group or an alkoxy group on opposite ends of the molecular chain and (b) a polyorganosiloxane containing R | 02-23-2012 |
| 20120040931 | NOVEL ORGANOPOLYSILOXANE AND COSMETIC CONTAINING THE SAME - There is disclosed an organopolysiloxane represented by the following general formula (1). | 02-16-2012 |
| 20120029193 | POLYMERIZABLE MONOMERS - A monomer of formula (1) is provided wherein R | 02-02-2012 |
| 20120029158 | METHOD FOR PREPARING CYCLIC OLEFIN ADDITION POLYMER OF HIGH GAS PERMEABILITY - A method for preparing a cyclic olefin addition polymer of high gas permeability, which method including subjecting a specific type of cyclic olefin-functional siloxane and a mixture thereof with a specific type of cyclic olefin compound to addition polymerization in the presence of a multi-component catalyst containing (A) a zero-valent palladium compound, (B) an ionic boron compound, and (C) a phosphine compound having a substituent group selected from an alkyl group having 3 to 6 carbon atoms, a cycloalkyl group and an aryl group, to obtain a cyclic olefin addition polymer of high gas permeability wherein a ratio of the structural units derived from the cyclic olefin-functional siloxane is at 10 to 100 mole % of the addition polymer and a number average molecular weight (Mn) ranges from 100,000 to 2,000,000. | 02-02-2012 |
| 20120028190 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS - A polymer is provided comprising recurring units having a N,N′-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically amplified negative resist composition is formulated using the polymer and processed by lithography, a fine resist pattern can be formed with the advantages of improved LER and high resolution. | 02-02-2012 |
| 20120021341 | SUBSTRATE TO BE PROCESSED HAVING LAMINATED THEREON RESIST FILM FOR ELECTRON BEAM AND ORGANIC CONDUCTIVE FILM, METHOD FOR MANUFACTURING THE SAME, AND RESIST PATTERNING PROCESS - There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed having a conductive inorganic thin film as its surface layer, wherein a surface to be processed of the substrate to be processed has an area of direct contact between the organic conductive film and the conductive inorganic thin film in part thereof. There can be a substrate to be processed capable of forming a resist pattern stably and accurately with efficient removal of electricity even when an electron beam with high current density is irradiated. | 01-26-2012 |
| 20120016081 | CURABLE PERFLUOROPOLYETHER GEL COMPOSITION AND GEL PRODUCT PRODUCED BY USING CURED PERFLUOROPOLYETHER GEL COMPOSITION - A curable perfluoropolyether gel composition is provided. The composition comprises (A) a straight chain fluorine-containing polymer represented by the following formula (1): | 01-19-2012 |
| 20120012153 | CONNECTION SHEET FOR SOLAR BATTERY CELL ELECTRODE, PROCESS FOR MANUFACTURING SOLAR CELL MODULE, AND SOLAR CELL MODULE - Disclosed is a connection sheet for a solar battery cell electrode, which is a polymer sheet for use in the connection between an electrode for extracting an electric power from a solar battery cell and a wiring member through an electrically conductive adhesive material by heating and pressurizing, and which is intercalated between a heating/pressurizing member and the wiring member upon use. | 01-19-2012 |
| 20120009529 | PATTERNING PROCESS - A pattern is formed by applying a resist composition comprising a (meth)acrylate copolymer comprising both recurring units having an acid labile group-substituted carboxyl group and recurring units having a lactone ring, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with a developer. The developer comprises at least 40 wt % of an organic solvent selected from methyl benzoate, ethyl benzoate, phenyl acetate, benzyl acetate, methyl phenylacetate, benzyl formate, phenylethyl formate, methyl 3-phenylpropionate, benzyl propionate, ethyl phenylacetate, and 2-phenylethyl acetate. | 01-12-2012 |
| 20120009527 | PATTERNING PROCESS - A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group and recurring units having an acid labile group-substituted carboxyl group, an acid generator, and an organic solvent onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, PEB, and developing the exposed film two times with an organic solvent and an alkaline aqueous solution. Due to the two developments, one line is divided into two lines, achieving a resolution doubling the mask pattern. | 01-12-2012 |
| 20120007119 | LIGHT-EMITTING SEMICONDUCTOR DEVICE, MOUNTED SUBSTRATE, AND FABRICATION METHOD THEREOF - A light-emitting semiconductor device includes a lead frame having lead electrodes, a reflector arranged with the lead frame, and a light-emitting semiconductor chip accommodated in the reflector and having electrodes connected to the lead electrodes by a flip-chip bonding method, wherein: a gap between the lead frame and the light-emitting semiconductor chip is filled with a cured underfill material, and a cured silicon oxide film of 0.05 to 10 μm thickness is formed covering surfaces of the light-emitting semiconductor chip and reflector. | 01-12-2012 |
| 20120006229 | AQUEOUS SOLUTION OF PIPERAZINYL-CONTAINING SILANOL COMPOUND AND MAKING METHOD - An aqueous solution contains a piperazinyl-containing silanol compound having formula (1) wherein R | 01-12-2012 |
| 20120004459 | SYNTHESIS OF RARE EARTH METAL EXTRACTANT - A rare earth metal extractant in the form of a dialkyl diglycol amic acid is synthesized by reacting diglycolic anhydride with a dialkylamine in an aprotic polar solvent, with a molar ratio of dialkylamine to diglycolic anhydride being at least 1.0, and removing the aprotic polar solvent. | 01-05-2012 |
| 20120004458 | SYNTHESIS OF RARE EARTH METAL EXTRACTANT - A rare earth metal extractant in the form of a dialkyl diglycol amic acid is synthesized by reacting diglycolic anhydride with a dialkylamine in a synthesis medium. A molar ratio (B/A) of dialkylamine (B) to diglycolic anhydride (A) is at least 1.0. A non-polar or low-polar solvent in which the dialkyl diglycol amic acid is dissolvable is used as the synthesis medium. | 01-05-2012 |
| 20110319581 | POLYETHER-MODIFIED POLYSILOXANE CONTAINING A PERFLUOROPOLYETHER GROUP AND ITS PRODUCTION METHOD - A polyether-modified polysiloxane containing a perfluoropolyether group and its production method are provided. The polysiloxane has both the properties of a perfluoropolyether and the properties of a polyether-modified silicone, and it also has high affinity for organic solvents as well as coating compositions, cosmetics, and various coating materials. The polysiloxane is represented by the following general formula (1): | 12-29-2011 |
| 20110318996 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining. | 12-29-2011 |
| 20110318995 | METHOD FOR MANUFACTURING ELECTRONIC GRADE SYNTHETIC QUARTZ GLASS SUBSTRATE - An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures. | 12-29-2011 |
| 20110315074 | SINGLE-CRYSTAL DIAMOND GROWTH BASE MATERIAL AND METHOD FOR MANUFACTURING SINGLE-CRYSTAL DIAMOND SUBSTRATE - An object is to provide a single-crystal diamond growth base material and a method for manufacturing a single-crystal diamond substrate that enable growing single-crystal diamond having a large area and excellent crystallinity and inexpensively manufacturing a high-quality single-crystal diamond substrate. | 12-29-2011 |
| 20110312255 | METHOD FOR MULTIPLE CUTOFF MACHINING OF RARE EARTH MAGNET - A rare earth magnet block is cutoff machined into pieces by rotating a plurality of cutoff abrasive blades. Improvements are made by starting the machining operation from the upper surface of the magnet block downward, interrupting the machining operation, turning the magnet block upside down, placing the magnet block such that the cutoff grooves formed before and after the upside-down turning may be aligned with each other, and restarting the machining operation from the upper surface of the upside-down magnet block downward until the cutoff grooves formed before and after the upside-down turning merge with each other. | 12-22-2011 |
| 20110311920 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS - A naphthalene derivative having formula (1) is provided wherein cyclic structures Ar1 and Ar2 denote a benzene or naphthalene ring, X is a single bond or C | 12-22-2011 |
| 20110311788 | SILPHENYLENE-CONTAINING PHOTOCURABLE COMPOSITION, PATTERN FORMATION METHOD USING SAME, AND OPTICAL SEMICONDUCTOR ELEMENT OBTAINED USING THE METHOD - Provided is a silphenylene-containing photocurable composition including: (A) a specific silphenylene having both terminals modified with alicyclic epoxy groups, and (C) a photoacid generator that generates acid upon irradiation with light having a wavelength of 240 to 500 nm. Also provided is a pattern formation method including: (i) forming a film of the photocurable composition on a substrate, (ii) exposing the film through a photomask with light having a wavelength of 240 to 500 nm, and if necessary, performing heating following the exposure, and (iii) developing the film in a developing liquid, and if necessary, performing post-curing at a temperature within a range from 120 to 300° C. following the developing. Further provided is an optical semiconductor element obtained by performing pattern formation using the method. The composition is capable of very fine pattern formation across a broad range of wavelengths, and following pattern formation, yields a film that exhibits a high degree of transparency and superior light resistance. The composition may also include: (B) a specific epoxy group-containing organosilicon compound. | 12-22-2011 |
| 20110311712 | CAPSULE COMPRISING LOW-SUBSTITUTED CELLULOSE ETHER AND METHOD FOR PREPARING THE SAME - A capsule with good disintegration properties that can quickly display its content's efficacy as well as a method for preparing the same are provided. More specifically, provided is a capsule comprising a shell comprising low-substituted cellulose ether. Also, provided is a method for preparing a hard capsule comprising the low-substituted cellulose ether comprising a step of covering a pin for forming the hard capsule with the low-substituted cellulose ether by immersing the pin in an alkaline solution of the low-substituted cellulose ether; a step of forming the low-substituted cellulose on a surface of the pin into a gel by further immersing the covered pin in an aqueous acid solution; a step of washing by immersing the pin whose surface has been covered with the gel in water; and a step of drying. | 12-22-2011 |
| 20110306746 | CURABLE SILICONE GEL COMPOSITION - A curable silicone gel composition that is of low viscosity, exhibits good fluidity, and generates a silicone gel that exhibits good resistance to external stress and thermal stress. The composition includes (A) a specific organopolysiloxane having at least two alkenyl groups within each molecule, (B) an organohydrogenpolysiloxane having a specific branched main chain structure, containing at least three SiH groups within each molecule, and also containing at least one branch-forming unit within each molecule, and (C) a platinum-based catalyst, wherein the cured product has a penetration value of 10 to 200, and loss coefficient values at 25° C. for shear frequency values of 1 Hz and 10 Hz of 0.1 to 1.0 and 0.3 to 1.5 respectively. | 12-15-2011 |
| 20110305979 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - The invention provides a resist top coat composition wherein the composition contains polymer (P1-1) with a weight-average molecular weight of 1,000 to 500,000, having at least repeating units represented by the following general formulae (1a), (1b-1), and (1c). There can be a resist top coat composition having excellent water repellent and water sliding properties with fewer development defects and with a good resist pattern profile after development, and a patterning process using this composition. | 12-15-2011 |
| 20110305005 | PHOSPHOR PARTICLES, LIGHT-EMITTING DIODE, AND ILLUMINATING DEVICE AND LIQUID CRYSTAL PANEL BACKLIGHT DEVICE USING THEM - Phosphor particles of generally spherical shape have an average particle diameter of 5-50 μm and an average roundness of up to 0.3. The phosphor includes a garnet phase having formula: (A | 12-15-2011 |
| 20110301278 | CROSSLINKABLE RUBBER COMPOSITION - A crosslinkable rubber composition includes, as essential components:
| 12-08-2011 |
| 20110297300 | TEMPORARY ADHESIVE COMPOSITION, AND METHOD OF PRODUCING THIN WAFER - A temporary adhesive for which temporary adhesion is simple and subsequent detachment is also simple, meaning productivity can be improved. Also, a method of producing a thin wafer that uses the temporary adhesive. The temporary adhesive composition comprises:
| 12-08-2011 |
| 20110297209 | SILICONE RESIN COMPOSITION FOR SOLAR CELL MODULE, AND SOLAR CELL MODULE - The invention provides a silicone resin composition for solar cell modules including (A) an organopolysiloxane in a liquid state with a viscosity at 25° C. of 10,000 mPa·s or more or in a solid state, which is represented by the following formula (1): | 12-08-2011 |
| 20110294941 | VINYL CHLORIDE-BASED RESIN COMPOSITION, METHOD OF PRODUCING VINYL CHLORIDE-BASED POLYMER COMPOSITION, AND VINYL CHLORIDE-BASED POLYMER COMPOSITION OBTAINED THEREBY - Provided is a vinyl chloride-based resin composition including a vinyl chloride-based resin and a titanium dioxide having an average particle diameter of 5 to 50 nm, in an amount of 1,000 ppm to 10,000 ppm, by mass, relative to the mass of the vinyl chloride-based resin. By adding a titanium dioxide having an average particle diameter of 5 to 50 nm to a vinyl chloride-based resin in an amount described above, a vinyl chloride-based resin composition of excellent thermal stability can be obtained. In the vinyl chloride-based resin composition, the crystalline form of the titanium dioxide is preferably anatase, rutile, or a combination thereof. Also provided is a method of producing a vinyl chloride-based polymer composition that includes subjecting a vinyl chloride monomer, or a mixture of a vinyl chloride monomer and a monomer that is copolymerizable therewith, to suspension polymerization within an aqueous medium, and also includes adding a titanium dioxide having an average particle diameter of 5 to 50 nm to the raw material prior to commencement of the polymerization, to the reaction mixture during the polymerization, to the reaction product following completion of the polymerization, or to a combination of two or more of the raw material, the reaction mixture and the reaction product. The vinyl chloride-based polymer composition obtained using this method exhibits excellent thermal stability. | 12-01-2011 |
| 20110294070 | MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS - A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance. | 12-01-2011 |
| 20110294047 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS - A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity. | 12-01-2011 |
| 20110293951 | AQUEOUS SILOXANE COATING COMPOSITION, MAKING METHOD, SURFACE TREATING AGENT, SURFACE TREATED STEEL, AND COATED STEEL - A cohydrolyzate and/or (partial) cohydrolytic condensate obtained from hydrolysis of (i) an epoxy-containing silane coupling agent, (ii) an organosilicon compound having at least two hydrolyzable silyl groups, and (iv) another hydrolyzable silyl group-containing organosilicon compound in the presence of (iii) an aqueous silica sol is dissolved and/or dispersed in water to form an aqueous siloxane coating composition having an alcohol content of up to 5% by weight. The composition is stable during storage at room temperature and able to form a cured coat which exerts satisfactory water resistance and corrosion control. | 12-01-2011 |
| 20110291050 | LONG-LASTING PHOSPHOR CERAMICS AND MANUFACTURINGMETHOD THEREOF - Provided is a method for manufacturing MAl | 12-01-2011 |
| 20110290321 | Method for producing single crystal silicon solar cell and single crystal silicon solar cell - A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof; closely contacting the single crystal silicon substrate and a transparent insulator substrate with each other via a transparent electroconductive adhesive while using the ion implanting surface as a bonding surface; curing and maturing the transparent electroconductive adhesive into a transparent electroconductive film; applying an impact to the ion implanted layer to mechanically delaminate the single crystal silicon substrate to leave a single crystal silicon layer; and forming a p-n junction in the single crystal silicon layer. | 12-01-2011 |
| 20110290320 | Method for producing single crystal silicon solar cell and single crystal silicon solar cell - A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof to form an ion implanted layer in the single crystal silicon substrate; forming a transparent electroconductive film on a surface of a transparent insulator substrate; conducting a surface activating treatment for the ion implanting surface of the single crystal silicon substrate and/or a surface of the transparent electroconductive film on the transparent insulator substrate; bonding the ion implanting surface of the single crystal silicon substrate and the surface of the transparent electroconductive film on the transparent insulator substrate to each other; applying an impact to the ion implanted layer; and forming a p-n junction in the single crystal silicon layer. | 12-01-2011 |
| 20110287317 | METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, NEGATIVE ELECTRODE ACTIVE MATERIAL FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, NEGATIVE ELECTRODE MATERIAL FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, NEGATIVE ELECTRODE FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention is a method for manufacturing a negative electrode active material for a non-aqueous electrolyte secondary battery comprising at least depositing silicon on a substrate by vapor deposition by using a metallic silicon as a raw material, the substrate having a temperature controlled to 300° C. to 800° C. under reduced pressure, and pulverizing and classifying the deposited silicon. As a result, there is provided a method for manufacturing a negative electrode active material composed of silicon particles that is an active material useful as a negative electrode of a non-aqueous electrolyte secondary battery in which high initial efficiency and high battery capacity of silicon are kept, cycle performance is superior, and an amount of a change in volume decreases at the time of charge and discharge. | 11-24-2011 |
| 20110281986 | WATER-SOLUBLE FLUID FOR USE IN MACHINING OF RARE EARTH MAGNET - A polymeric flocculant is added to an aqueous solution comprising an organic acid and a basic compound to form a water-soluble fluid suitable for use in machining of rare earth magnet. | 11-17-2011 |
| 20110280503 | Method for hermetically closing an air-tight bag for pellicle - There is provided a method for air-tightly enclosing a pellicle case in a filmy bag which protects the pellicle case against dust without the use of a plurality of bags or without modifying the filmy bag except for folding it like origami and eventually consolidating with an adhesive material: in short the opening of the bag is folded a number of times compactly. | 11-17-2011 |
| 20110279205 | R-T-B RARE EARTH SINTERED MAGNET - A rare earth sintered magnet consists essentially of 26-36 wt % R, 0.5-1.5 wt % B, 0.1-2.0 wt % Ni, 0.1-3.0 wt % Si, 0.05-1.0 wt % Cu, 0.05-4.0 wt % M, and the balance of T and incidental impurities wherein R is a rare earth element, T is Fe or Fe and Co, M is selected from Ga, Zr, Nb, Hf, Ta, W, Mo, Al, V, Cr, Ti, Ag, Mn, Ge, Sn, Bi, Pb, and Zn. Simultaneous addition of Ni, Si, and Cu ensures magnetic properties and corrosion resistance. | 11-17-2011 |
| 20110275768 | NOVEL SILPHENYLENE SKELETON-CONTAINING SILICONE TYPE POLYMER AND METHOD FOR MANUFACTURING THE SAME - There is disclosed a silphenylene skeleton-containing silicone type polymer comprising a repeating unit represented by the following general formula (1) and having a weight average molecular weight of 5,000 to 40,000. There can be a novel silphenylene skeleton-containing silicone type polymer which enables to satisfy both chemical resistance and adhesiveness to a substrate and can be used as a material for a thermosetting resin for forming coatings for protecting substrates, circuits, and interconnections; and a method for manufacturing the same. | 11-10-2011 |
| 20110275012 | Pellicle - There is provided a pellicle in which the agglutinant, that is, the mask-bonding adhesive, is designed to have a light transmission of no greater than 70 percents; preferably the agglutinant is black in color. | 11-10-2011 |
| 20110272725 | WAVELENGTH CONVERTING MEMBER, LIGHT-EMITTING DEVICE, AND METHOD FOR MANUFACTURING WAVELENGTH CONVERTING MEMBER - A polycrystalline sintered ceramic including (A) a garnet phase and (B) a perovskite, monoclinic or silicate phase wherein fine grains of phase (B) are included and dispersed in phase (A) is used as a wavelength converting member. Since the light transmitting through the wavelength converting member is scattered at the interface between the garnet phase and the perovskite, monoclinic or silicate phase, a light emitting device including the wavelength converting member produces light of more uniform color with a minimized loss thereof. | 11-10-2011 |
| 20110259056 | Burner For Manufacturing Porous Glass Preform - The present invention provides a burner for manufacturing a porous glass preform, which is provided with a combustible gas injection port involving a plurality of small-diameter supporting gas injection ports such that the injection ports of the same row have the equal focal distance, the small-diameter supporting gas injection ports being arranged on the outside of a glass source gas injection port in the center so as to be in a row or in a plurality of rows and concentric with the glass source gas injection port, wherein the small-diameter supporting gas injection ports are bent toward the burner center axis at predetermined positions from the tip ends of the small-diameter supporting gas injection ports so that the focal points of the small-diameter supporting gas injection ports of the same row agree with each other, and the bend angle of the small-diameter supporting gas injection port row closest to the glass source gas injection port in the center of the small-diameter supporting gas injection port rows arranged in the plurality of rows is at most 5 degrees with respect to the burner center axis. | 10-27-2011 |
| 20110259055 | BURNER FOR PRODUCING POROUS GLASS PREFORM - A multi-nozzle type burner is used for producing a porous glass preform, the burner having small variations in deposition efficiency with the burner tip being not burned even when axial shift occurs at the concentric multi-tube part of the burner. The present invention provides a burner for producing a porous glass preform with a concentric multi-tube structure, comprising a glass material gas jet port in a center, a plurality of gas jet ports concentrically disposed outside the glass material gas jet port, and small-diameter gas jet ports which are disposed in a line or a plurality of lines concentrically to the glass material gas jet port so as to be enclosed in one of the gas jet ports other than the gas jet ports in the center and at an outermost side, the small-diameter gas jet ports in the same line having an identical focal length. In the present invention, the gas jet ports disposed outside the gas jet port enclosing the small-diameter gas jet ports are each reduced in diameter in a direction toward a burner tip, and satisfy a relationship of L | 10-27-2011 |
| 20110256412 | Aluminum nitride film and a substance coated with same - There are provided an aluminum nitride film and a substance, coated with such a film; the film is new in that it has a brightness or lightness L* of 60 or lower; preferably the film has a transmittance of 15% or lower for a visible and near infrared radiation having a wave length of 0.35-2.5 micrometers, the combined concentration of metallic elements as impurities but for Al is 50 ppm or smaller, and the film is heat-treated at a temperature of 1050 degrees centigrade or higher but lower than 1400 degrees centigrade, and the film is a product of CVD method; the substance coated with the film is preferably a ceramic material such as a nitride, an oxide, and a carbide or a metal having a low thermal expansion coefficient such as tungsten, molybdenum and tantalum. | 10-20-2011 |
| 20110251311 | ADDITION CURABLE SELF-ADHESIVE SILICONE RUBBER COMPOSITION - An addition curable self-adhesive silicone rubber composition comprising (A) an organopolysiloxane containing at least two alkenyl groups, (B) an organohydrogenpolysiloxane containing at least three SiH groups, (C) an aromatic ring-free organohydrogenpolysiloxane containing at least two SiH groups, and (F) an addition reaction catalyst, with a SiH/alkenyl molar ratio ranging from 0.8 to 5.0, is briefly moldable and cures to various metals and organic resins. | 10-13-2011 |
| 20110245525 | NORBORNANE SKELETON STRUCTURE-CONTAINING ORGANOSILICON COMPOUND AND METHOD OF PRODUCING SAME - Disclosed are a radiation-polymerizable functional group-containing organosilicon compound, including (A) a norbornane skeleton structure, (B) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (C) a radiation-polymerizable functional group bonded to the norbornane skeleton structure, either directly or via a carbon atom, a hetero atom, or a combination thereof, and a method of producing the radiation-polymerizable functional group-containing organosilicon compound. Also disclosed are a haloalkyl group-containing organosilicon compound, including (D) a norbornane skeleton structure, (E) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (F) a haloalkyl group, which is bonded directly to the norbornane skeleton structure and either contains or does not contain a hetero atom, and a method of producing the haloalkyl group-containing organosilicon compound. These organosilicon compounds are useful as silane coupling agents having superior heat resistance stability. | 10-06-2011 |
| 20110245062 | EXTRUSION MOLDING COMPOSITION AND METHOD FOR PRODUCING EXTRUSION MOLDED PART - An extrusion molding composition comprises a cellulose or cellulose derivative, an ionic liquid, and a ceramic material. The composition can be extrusion molded into a ceramic part at a high molding speed and without drying cracks. | 10-06-2011 |
| 20110244655 | METHOD FOR FABRICATING SOI SUBSTRATE - There is provided a method for manufacturing an SOI substrate capable of effectively and efficiently embrittling an interface of an ion-implanted layer without causing the separation of a bonded surface | 10-06-2011 |
| 20110244654 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A nitride-based semiconductor crystal and a second substrate are bonded together. In this state, impact is applied externally to separate the low-dislocation density region of the nitride-based semiconductor crystal along the hydrogen ion-implanted layer, thereby transferring (peeling off) the surface layer part of the low-dislocation density region onto the second substrate. At this time, the lower layer part of the low-dislocation density region stays on the first substrate without being transferred onto the second substrate. The second substrate onto which the surface layer part of the low-dislocation density region has been transferred is defined as a semiconductor substrate available by the manufacturing method of the present invention, and the first substrate on which the lower layer part of the low-dislocation density region stays is reused as a substrate for epitaxial growth. | 10-06-2011 |
| 20110244334 | NEGATIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY WITH NON-AQUEOUS ELECTROLYTE, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY WITH NON-AQUEOUS ELECTROLYTE, AND LITHIUM ION SECONDARY BATTERY - The present invention is a negative electrode material for a secondary battery with a non-aqueous electrolyte comprising at least a silicon-silicon oxide composite and a carbon coating formed on a surface of the silicon-silicon oxide composite, wherein at least the silicon-silicon oxide composite is doped with lithium, and a ratio I(SiC)/I(Si) of a peak intensity I(SiC) attributable to SiC of 2θ=35.8±0.2° to a peak intensity I(Si) attributable to Si of 2θ=28.4±0.2° satisfies a relation of I(SiC)/I(Si)≦0.03, when x-ray diffraction using Cu—Kα ray. As a result, there is provided a negative electrode material for a secondary battery with a non-aqueous electrolyte that is superior in first efficiency and cycle durability to a conventional negative electrode material. | 10-06-2011 |
| 20110244333 | NEGATIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY WITH NON-AQUEOUS ELECTROLYTE, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE MATERIAL FOR SECONDARY BATTERY WITH NON-AQUEOUS ELECTROLYTE, AND LITHIUM ION SECONDARY BATTERY - The present invention is a method for manufacturing a negative electrode material for a secondary battery with a non-aqueous electrolyte comprising at least: coating a surface of powder with carbon at a coating amount of 1 to 40 mass % with respect to an amount of the powder by heat CVD treatment under an organic gas and/or vapor atmosphere at a temperature between 800° C. and 1300° C., the powder being composed of at least one of silicon oxide represented by a general formula of SiO | 10-06-2011 |
| 20110237732 | FLUORINE-CONTAINING CURABLE COMPOSITION AND RUBBER ARTICLE - A fluorine-containing curable composition which is less viscous, and which can produce a cured article having excellent heat resistance, chemical resistance, solvent resistance, and mechanical strength is provided. The fluorine-containing curable composition comprises (a) 100 parts by weight of a straight chain fluorine-containing polymer having at least two alkenyl groups per molecule represented by the following formula (1): | 09-29-2011 |
| 20110236831 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal. | 09-29-2011 |
| 20110236826 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND - A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation to define exposed and unexposed regions, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. | 09-29-2011 |
| 20110236807 | Pellicle for lithography - There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by virtue of a unique structure of the mask-boding agglutinant layer, that is, the agglutinant layer is formed of two or more juxtaposed endless belts of which the inner-most belt that faces the pellicle hollow is made of a substance which is non-agglutinant while at least one of the other belts is agglutinant; when the outer-most belt is also made of a non-agglutinant substance, the outgas is completely prevented from escapting from the pellicle. | 09-29-2011 |
| 20110232846 | MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA - Disclosed is a magnetic field generator for magnetron plasma. The magnetic field generator is provided with a plurality of magnetic segments, and generates a predetermined multi-pole magnetic field around the periphery of a workpiece substrate within a process chamber. The strength of the multi-pole magnetic field is controlled so that the state of the multi-pole magnetic field is matched different plasma processes. Further, the pattern of the multi-pole magnetic field can be changed so as to match different sizes of the substrate. | 09-29-2011 |
| 20110223420 | ADHESIVE COMPOSITION AND SHEET FOR FORMING SEMICONDUCTOR WAFER-PROTECTIVE FILM - There is disclosed an adhesive composition containing: (A) 100 parts by mass of a phenoxy resin; (B) 5 to 200 parts by mass of an epoxy resin; (C) 1 to 20 parts by mass of an alkoxysilane-partial hydrolytic condensate which is a partial hydrolytic condensate of alkoxysilane including one kind or two or more kinds of alkoxysilane represented by the following general formulae (1) and (2), wherein the weight average molecular weight is 300 or more and 30,000 or less and an amount of residual alkoxy is 2 wt % or more and 50 wt % or less; (D) a curing catalyst for an epoxy resin; (E) an inorganic filler; and (F) a polar solvent having a boiling point of 80° C. to 180° C. and a surface tension of 20 to 30 dyne/cm at 25° C. There can be a sheet for forming a semiconductor wafer-protective film and an adhesive composition capable of forming a protective film excellent in evenness, cutting characteristics and adhesiveness. | 09-15-2011 |
| 20110223414 | POLYCARBONATE RESIN LAMINATE - A polycarbonate resin laminate which has excellent scratch resistance and UV shielding property as well as high weatherability and durability sufficient for enduring long term open air exposure without detracting from excellent the transparency is provided. This polycarbonate resin laminate comprises a substrate (1) comprising a polycarbonate resin layer (1-i) and a thermoplastic (meth)acrylic resin layer having a UV absorbing group immobilized thereto (1-ii) on at least one surface of the polycarbonate resin (1-i); and a cured film (2) of a scratch resistant coating composition containing UV absorbing inorganic oxide fine particles and/or an organic UV absorber on the layer of the thermoplastic (meth)acrylic resin having a UV absorbing group immobilized thereto (1-ii). The laminate has a haze of up to 2%. | 09-15-2011 |
| 20110215602 | PELLICLE HANDLING TOOL - This invention discloses a handling tool for handling a pellicle which is used in the lithography carried out in a manufacturing process of semiconductor devices. The said tool comprises a handle, a main shaft connected with a fore-end of the handle to form a T-shaped part, two parallel arms protruding forward from the both ends of the said main shaft orthogonally to form a U-shaped part, and four pellicle frame holders of which two are each provided on the inward side surface of each arm respectively. Furthermore the said arms are designed in a manner such that they are both capable of moving towards and away from each other so as to be able to adjust the arm-to-arm distance, and the said holders are provided so that they can grasp the frame's side surfaces at the four corners of the pellicle frame when the said arms are closed. | 09-08-2011 |
| 20110212391 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER. | 09-01-2011 |
| 20110212390 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning. | 09-01-2011 |
| 20110210810 | ND BASED SINTERED MAGNET AND ITS PREPARATION - The invention provides a sintered Nd base magnet which is free of a decline of remanence, has a high coercive force, especially at the edges thereof, is unsusceptible to demagnetization even at high temperature, and is suited for use in permanent magnet rotary machines. | 09-01-2011 |
| 20110207030 | PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING PELLICLE FILM - Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pellicle | 08-25-2011 |
| 20110203318 | BURNER AND METHOD FOR THE MANUFACTURE OF SYNTHETIC QUARTZ GLASS - A method for manufacturing quartz glass using a main burner having a multi-tube assembly having a center tube, a first enclosure tube surrounding the center tube, a second enclosure tube surrounding the first enclosure tube, a tubular shell surrounding the multi-tube assembly, and a plurality of nozzles disposed within the tubular shell, a double-tube assembly surrounding at least a forward opening of the main burner includes feeding silica-forming compound to the center tube, a combustion-supporting gas to the first enclosure tube and the nozzles, a combustible gas to the second enclosure tube and the tubular shell, and a combustion-supporting gas to the double-tube assembly, forming oxyhydrogen flame for hydrolyzing or decomposing the silica-forming compound to form silica, depositing the silica on the target, and melting and vitrifying the deposited silica into quartz glass. | 08-25-2011 |
| 20110195362 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE - There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative. | 08-11-2011 |
| 20110195351 | Pellicle for lithography - There is provided a pellicle in which the mask-bonding adhesive is formed to have a corner-rounded cross section in a shape akin to a trapezoid whose upper parallel side represents the face of the mask-bonding adhesive layer by which the adhesive layer is attached to the pellicle frame, and whose lower parallel side is not shorter than the upper parallel side, and the base angles of the trapezoid are 90 degrees or smaller but not smaller than 75 degrees, when the lower parallel side is assumed to be the base of the trapezoid. | 08-11-2011 |
| 20110195350 | Pellicle for lithography - There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which can be 15 micrometers to 10 micrometers or even smaller. | 08-11-2011 |
| 20110189607 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R | 08-04-2011 |
| 20110189594 | PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME - A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides | 08-04-2011 |
| 20110181950 | OPTICAL ISOLATOR - An optical isolator including a Faraday rotator that has a high Faraday effect and a high transmission factor in a wavelength used is provided. An optical isolator comprises at least: a Faraday rotator; a polarizer arranged on a light incidence side of the Faraday rotator; and an analyzer arranged on a light exit side of the Faraday rotator, wherein the Faraday rotator consists of an oxide that contains an ytterbium oxide (Yb | 07-28-2011 |
| 20110178263 | ADDITION-CURE FLUOROPOLYETHER ADHESIVE COMPOSITION - A fluoropolyether adhesive composition comprising (A) a linear polyfluoro compound having at least two alkenyl groups and a perfluoropolyether structure in its main chain, (B) a fluorinated organohydrogensiloxane containing at least two SiH groups, but not alkoxy and epoxy groups, (C) a platinum group metal-based catalyst, (D) an organosilicon compound having at least one silicon-bonded alkoxy group, and (E) a hydrolytic catalyst can be cured to metal and plastic substrates through addition reaction. | 07-21-2011 |
| 20110177464 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized. | 07-21-2011 |
| 20110177462 | PATTERNING PROCESS - A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control. | 07-21-2011 |
| 20110177459 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS - There is disclosed a resist underlayer film-forming composition comprising, at least: a resin (A) obtained by condensing a compound represented by the following general formula (1) with a compound represented by the following general formula (2) by the aid of an acid catalyst; a compound (B) represented by the general formula (1); a fullerene compound (C); and an organic solvent. There can be a resist underlayer film composition in a multi-layer resist film to be used in lithography, which underlayer film is excellent in property for filling up a height difference of a substrate, possesses a solvent resistance, and is not only capable of preventing occurrence of twisting during etching of a substrate, but also capable of providing an excellently decreased pattern roughness; a process for forming a resist underlayer film by using the composition; and a patterning process. | 07-21-2011 |
| 20110172079 | WATER-SOLUBLE BINDER AND CERAMIC MOLDING COMPOSITION - A water-soluble binder comprising a water-soluble hydroxypropyl methyl cellulose having a methoxyl substitution of 28-30 wt % and a hydroxypropyl substitution of 5-7 wt % has a syneresis value of at least 30 wt % and a clay heat gel strength of at least 0.5 kgf. A ceramic molding composition comprising a ceramic material and the water-soluble binder has improved shape retention upon drying and is effectively molded into a ceramic part. | 07-14-2011 |
| 20110171579 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - A negative resist composition comprises a base polymer comprising recurring units having an alkylthio group and having a Mw of 1000-2500, an acid generator, and a basic component, typically an amine compound containing a carboxyl group, but not active hydrogen. A 45-nm line-and-space pattern with a low value of LER can be formed. | 07-14-2011 |
| 20110165822 | RARE EARTH MAGNET HOLDING JIG, CUTTING MACHINE, AND CUTTING METHOD - A magnet holding jig comprises a platform and first and second holders disposed on opposite sides of the platform. The platform is provided with channels, the holders are comb-shaped to define digits and slits, the channels and the slits being aligned to define guide paths for permitting entry of a cutting tool therein, and the holders are also configured as digitate hooks. The holder hooks are in contact with a rare earth magnet block resting on the platform. The holders are pushed inward at their lower portions so as to bring each hook digit of the second holder in pressure abutment with the magnet block at a higher level than each hook digit of the first holder for thereby holding the magnet block in place on the platform. | 07-07-2011 |
| 20110162504 | RARE EARTH MAGNET HOLDING JIG AND CUTTING MACHINE - A magnet holding jig comprises a platform and first and second holders disposed on opposite sides of the platform. The platform is provided with channels, the holders are comb-shaped to define digits and slits, the channels and the slits being aligned to define guide paths for permitting entry of a cutting tool therein, and the holders are also configured as digitate hooks. The holder hooks are in contact with a rare earth magnet block resting on the platform. The holders are pushed inward at their lower portions so as to elastically deform the digitate hook and move it backward and to bring the hook digits in pressure abutment with the magnet block, thereby holding the magnet block in place on the platform. | 07-07-2011 |
| 20110162413 | METHOD OF MANUFACTURING OPTICAL FIBER BASE MATERIAL - Provided is a method of manufacturing an optical fiber base material having at least four layer including a core, a first cladding, a second cladding containing fluorine, and a third cladding. The manufacturing method comprises preparing a starting base material that includes the core and the first cladding; forming a porous intermediate glass base material by supplying glass raw material and oxygen to a high-frequency induction thermal plasma torch to synthesize glass fine particles that are then deposited on a surface of the starting base material; forming an intermediate glass base material that includes the core, the first cladding, and the second cladding containing fluorine, by heating and vitrifying the porous intermediate glass base material in an atmosphere containing fluorine; and providing the third cladding on the outer surface of the intermediate glass base material. | 07-07-2011 |
| 20110160481 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS - Sulfonate salts have the formula: HOCH | 06-30-2011 |
| 20110160464 | SURFACE TREATMENT METHOD FOR SOLID MATERIAL - A solid material is subjected to surface treatment by chemically bonding onto a surface of the solid material a stabilized monofunctional silanol represented by R | 06-30-2011 |
| 20110159785 | PREPARATION OF SYNTHETIC QUARTZ GLASS SUBSTRATES - A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness. | 06-30-2011 |
| 20110159413 | TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD - A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member. | 06-30-2011 |
| 20110159303 | SINTERED SILICON OXIDE FOR FILM VAPOR DEPOSITION, ITS PRODUCTION METHOD, AND METHOD FOR PRODUCING SILICON OXIDE VAPOR DEPOSITION FILM - A sintered silicon oxide for film vapor deposition having a density of 1.0 to 2.0 g/cm | 06-30-2011 |
| 20110150691 | PREPARATION OF RARE EARTH PERMANENT MAGNET MATERIAL - A method for preparing a rare earth permanent magnet material comprises the steps of: disposing a powder comprising one or more members selected from an oxide of R | 06-23-2011 |
| 20110143266 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same. | 06-16-2011 |
| 20110136321 | METHOD FOR MANUFACTURING LAMINATION TYPE SEMICONDUCTOR INTEGRATED DEVICE - Provided is a method for manufacturing a lamination type semiconductor integrated device that can simultaneously attain grinding force resistance during back side grinding of a semiconductor wafer, heat resistance during anisotropic dry etching and the like, chemical resistance during plating and etching, smooth debonding of a support substrate for processing at the end, and low adherend staining; the method comprises at least a step of back side grinding of a first semiconductor wafer having a device formed on its surface and a step of laminating by electrical bonding the first semiconductor wafer with a second semiconductor wafer having a device formed on its surface, wherein, at the time of back side grinding of the first semiconductor wafer, back of the first semiconductor wafer is ground after surface of formed device on the first semiconductor wafer is bonded to a support substrate for processing by using a pressure-sensitive silicone adhesive. | 06-09-2011 |
| 20110133111 | OXIDE AND MAGNETO-OPTICAL DEVICE - An oxide is provided that contains the oxide represented by Formula (I) as the main component thereof, that has a Verdet constant at a wavelength of 1.06 μm of at least 0.18 min/(Oe·cm), and that has a transmittance at a wavelength of 1.06 μm and for an optical length of 3 mm of at least 70%, | 06-09-2011 |
| 20110132258 | Pellicle for lithography and a method for making the same - There is provided a pellicle in which the frame is chamfered along all of its horizontal edges (as viewed when the pellicle frame is laid flat), and in particular those edges of the frame where the membrane-bonding frame face meets the external side walls of the frame are chamfered to the extent of C:0.01 mm-C:0.12 mm; in relation to this chamfer, a method is also provided wherein, after attaching a preformed pellicle membrane to the membrane-bonding frame face, the excessive part of the preformed membrane which extends beyond outer edges of the frame face is cut off in a manner wherein a blade of a knife is caused to scour the chamfer over the membrane in a manner such that the knife blade is kept in such an angle that the blade gets in a face-to-face contact with the chamfer face or that the blade touches only that edge of the frame where the chamfer face meets the first frame face while the knife blade is moved along the chamfered edge of the frame. | 06-09-2011 |
| 20110132039 | GLASS PREFORM DRAWING APPARATUS - A glass preform drawing apparatus feeds a glass preform into a heating furnace at a predetermined feeding speed and produces a glass rod having a uniform diameter. Specifically, the drawing apparatus for producing a glass rod having a desired outer diameter by heating and drawing a glass preform is characterized in that, at a normal operating temperature T (K) of the heating furnace, the top chamber is transparent at a wavelength of λ (μm) expressed by the following formula 1: | 06-09-2011 |
| 20110129777 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS - A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound of thiomorpholine dioxide structure has many advantages including a high contrast of alkaline dissolution rate before and after exposure, a good pattern profile after exposure, minimized roughness, and a wide focus margin. The resist composition which may be positive or negative is useful for the fabrication of VLSI and photomasks. | 06-02-2011 |
| 20110129767 | PELLICLE FOR LITHOGRAPHY - A pellicle | 06-02-2011 |
| 20110129766 | LITHOGRAPHIC PELLICLE - A lithographic pellicle comprises a pellicle film ( | 06-02-2011 |
| 20110129765 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS - There is disclosed a negative resist composition wherein a base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000, and the compound containing a nitrogen atom as a basic component contains one or more kinds of amine compounds having a carboxyl group and not having a hydrogen atom covalently bonded to a base-center nitrogen atom. There can be a negative resist composition in which a bridge hardly occurs, substrate dependence is low and a pattern with a high sensitivity and a high resolution can be formed, and a patterning process using the same. | 06-02-2011 |
| 20110123935 | METHOD FOR PRODUCING HOLLOW STRUCTURE - Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed. | 05-26-2011 |
| 20110117482 | PELLICLE FOR LITHOGRAPHY - A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in going toward the inside of the pellicle frame. There is also provided a process for producing the pellicle for lithography, the process comprising a step of forming the pellicle for lithography and a step of spray-coating a pressure-sensitive adhesive composition from inside the pellicle frame. | 05-19-2011 |
| 20110117481 | PELLICLE FOR LITHOGRAPHY - A pellicle for lithography is provided that includes a pellicle frame provided with an atmospheric pressure adjustment hole that extends through from an outer peripheral face to an inner peripheral face, a ratio S/L of a cross-sectional area S (mm | 05-19-2011 |
| 20110117480 | TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD - A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided. | 05-19-2011 |
| 20110117146 | COSMETIC - Provided is a cosmetic including silicone microparticles, in which the silicone microparticles include 100 parts by mass of silicone elastomer spherical microparticles having a volume average particle diameter within a range from 0.1 to 100 μm, and 0.5 to 25 parts by mass of a polyorganosilsesquioxane that coats the surface of the silicone elastomer spherical microparticles, and the silicone elastomer is capable of absorbing not less than 200 parts by mass of a polymethylsiloxane having a viscosity at 25° C. of not more than 10 mm | 05-19-2011 |
| 20110117145 | COSMETIC - Provided is a cosmetic including silicone microparticles, in which the silicone microparticles include 100 parts by mass of silicone elastomer spherical microparticles having a volume average particle diameter within a range from 0.1 to 100 μm, and 0.5 to 25 parts by mass of a polyorganosilsesquioxane that coats a surface of the silicone elastomer spherical microparticles, and the silicone elastomer is capable of absorbing not less than 30 parts by mass of at least one oily substance selected from the group consisting of sebum, hydrocarbon oils and ester oils per 100 parts by mass of the silicone elastomer. Even if containing an unctuous agent, the cosmetic exhibits favorable feelings upon use, with no spreading difficulties, stickiness, greasiness, oily film feeling, or the like, and is also capable of suppressing problems caused by sebum, namely, changes in the makeup cosmetic properties of the cosmetic, changes in the color of the cosmetic, increased shine, and the like. | 05-19-2011 |
| 20110111575 | METHOD FOR MANUFACTURING SOI SUBSTRATE - A heating plate having a smooth surface is placed on a hot plate which constitutes a heating section, and the smooth surface of the heating plate is closely adhered on the rear surface of a single-crystal Si substrate bonded to a transparent insulating substrate. The temperature of the heating plate is kept at 200° C. or higher but not higher than 350° C. When the rear surface of the single-crystal Si substrate bonded to the insulating substrate is closely adhered on the heating plate, the single-crystal Si substrate is heated by thermal conduction, and a temperature difference is generated between the single-crystal Si substrate and the transparent insulating substrate. A large stress is generated between the both substrates due to rapid expansion of the single-crystal Si substrate, thus separation takes place at a hydrogen ion-implanted interface. | 05-12-2011 |
| 20110111574 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A nitride-based semiconductor crystal and a second substrate are bonded together. In this state, impact is applied externally to separate the low-dislocation density region of the nitride-based semiconductor crystal along the hydrogen ion-implanted layer, thereby transferring (peeling off) the surface layer part of the low-dislocation density region onto the second substrate. At this time, the lower layer part of the low-dislocation density region stays on the first substrate without being transferred onto the second substrate. The second substrate onto which the surface layer part of the low-dislocation density region has been transferred is defined as a semiconductor substrate available by the manufacturing method of the present invention, and the first substrate on which the lower layer part of the low-dislocation density region stays is reused as a substrate for epitaxial growth. | 05-12-2011 |
| 20110111217 | SILICONE BASE PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND FILM - A pressure-sensitive adhesive film comprising an adhesive layer on a substrate is provided. The layer is made of a silicone composition comprising (A) a diorganopolysiloxane having at least two alkenyl and phenyl groups, (B) an organopolysiloxane comprising R | 05-12-2011 |
| 20110107797 | OPTICAL FIBER PREFORM MANUFACTURING METHOD AND OPTICAL FIBER PREFORM MANUFACTURING DEVICE - An optical fiber base material manufacturing method includes: supplying oxygen, hydrogen, and silicide to a core deposition burner; depositing silicon dioxide; adjusting a drawing up speed so that a deposition tip position remains at the same position in accordance with growth of a porous base material; calculating an average of the drawing up speed at each preset time interval; calculating a difference of the calculated average from a preset value of the drawing up speed; correcting a flow rate of silicon tetrachloride when the supplied hydrogen is hydrogen produced or stored at normal temperature, and correcting a flow rate of hydrogen when the supplied hydrogen is hydrogen obtained by vaporizing liquid hydrogen, where when correcting the flow rate of hydrogen, a flow rate of hydrogen supplied to a cladding deposition burner is also corrected in a ratio of before and after the correction of the flow rate of the hydrogen. | 05-12-2011 |
| 20110104871 | METHOD FOR MANUFACTURING BONDED SUBSTRATE - Provided is a method for manufacturing a bonded wafer with a good thin film over the entire substrate surface, especially in the vicinity of the lamination terminal point. The method for manufacturing a bonded wafer comprises at least the following steps of: forming an ion-implanted region by implanting a hydrogen ion or a rare gas ion, or the both types of ions from a surface of a first substrate which is a semiconductor substrate; subjecting at least one of an ion-implanted surface of the first substrate and a surface of a second substrate to be attached to a surface activation treatment; laminating the ion-implanted surface of the first substrate and the surface of the second substrate in an atmosphere with a humidity of 30% or less and/or a moisture content of 6 g/m | 05-05-2011 |
| 20110097627 | NEGATIVE ELECTRODE MATERIAL FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERIES, MANUFACTURING METHOD THEREFOR, AND LITHIUM-ION SECONDARY BATTERIES - The present invention is a negative electrode material for non-aqueous electrolyte secondary batteries, comprising at least: particles wherein silicon nanoparticles are dispersed in silicon oxide (silicon oxide particles); and a metal oxide coating formed on a surface of the silicon oxide particles. As a result, there is provided a negative electrode material for non-aqueous electrolyte secondary batteries that enables the production of a negative electrode suitable for lithium-ion secondary batteries and the like that provides improved safety and cycle performance over conventional negative electrode materials. | 04-28-2011 |
| 20110091812 | PATTERNING PROCESS AND RESIST COMPOSITION - The process forms a pattern by applying a resist composition onto a substrate to form a resist film, baking, exposure, post-exposure baking, and development. The resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent. A total amount of amino groups from the quencher and PBG is greater than an amount of acid from PAG. An unexposed region and an over-exposed region are not dissolved in developer whereas only an intermediate exposure dose region is dissolved in developer. Resolution is doubled by splitting a single line into two through single exposure and development. | 04-21-2011 |
| 20110090032 | RARE EARTH PERMANENT MAGNET AND ITS PREPARATION - A rare earth permanent magnet is prepared by disposing a powdered metal alloy containing at least 70 vol % of an intermetallic compound phase on a sintered body of R—Fe—B system, and heating the sintered body having the powder disposed on its surface below the sintering temperature of the sintered body in vacuum or in an inert gas for diffusion treatment. The advantages include efficient productivity, excellent magnetic performance, a minimal or zero amount of Tb or Dy used, an increased coercive force, and a minimized decline of remanence. | 04-21-2011 |
| 20110086223 | FLUID AND METHOD FOR CLEANING ANTIFOULING COATING, ANTIFOULING COATING REPAIR METHOD, AND UNDERWATER STRUCTURE - A cleaning fluid comprising at least two components selected from organic acids, organic acid salts, electrolytes, alcohols, and water is safe. When the existing antifouling coating is to be overcoated or repaired, the surface of the existing coating is cleaned with the cleaning fluid so that a repair coating composition may strongly bond to the existing coating. | 04-14-2011 |
| 20110084285 | BASE MATERIAL FOR GROWING SINGLE CRYSTAL DIAMOND AND METHOD FOR PRODUCING SINGLE CRYSTAL DIAMOND SUBSTRATE - The present invention is a base material for growing a single crystal diamond comprising: at least a single crystal SiC substrate; and an iridium film or a rhodium film heteroepitaxially grown on a side of the single crystal SiC substrate where the single crystal diamond is to be grown. As a result, there is provided a base material for growing a single crystal diamond and a method for producing a single crystal diamond substrate which can grow the single crystal diamond having a large area and good crystallinity and produce a high quality single crystal diamond substrate at low cost. | 04-14-2011 |
| 20110081604 | Pellicle for lithography and a method for making the same - There is provided a method for manufacturing a pellicle in which the pellicle frame is prepared by being heated at a predetermined temperature while constricting the frame to some extent of flatness to achieve a desired flatness and future stability against heat. | 04-07-2011 |
| 20110081603 | PELLICLE - A pellicle for lithography is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame, and a pressure-sensitive adhesion layer provided on the other end face, the pressure-sensitive adhesion layer being formed from a gel composition. | 04-07-2011 |
| 20110081531 | BASE MATERIAL FOR GROWING SINGLE CRYSTAL DIAMOND AND METHOD FOR PRODUCING SINGLE CRYSTAL DIAMOND SUBSTRATE - The present invention is a base material for growing a single crystal diamond comprising a single crystal silicon substrate, a MgO film heteroepitaxially grown on a side of the single crystal silicon substrate where the single crystal diamond is to be grown, and an iridium film or a rhodium film heteroepitaxially grown on the MgO film. As a result, there is provided a base material for growing a single crystal diamond and a method for producing a single crystal diamond substrate which can grow the single crystal diamond having a large area and good crystallinity and produce a high quality single crystal diamond substrate at low cost. | 04-07-2011 |
| 20110080066 | ROTOR FOR PERMANENT MAGNET ROTARY MACHINE - A permanent magnet rotary machine comprises a rotor comprising a rotor core and a plurality of permanent magnet segments embedded in the rotor core and a stator having a plurality of coils and disposed to define a gap with the rotor, or a permanent magnet rotary machine comprises a rotor comprising a rotor core and a plurality of permanent magnet segments mounted on the surface of the rotor core and a stator having a plurality of coils and disposed to define a gap with the rotor. In the rotor, each permanent magnet segment is an assembly of divided permanent magnet pieces, the coercive force near the surface of the magnet piece is higher than that in the interior of the magnet piece, and the assembly allows for electrical conduction between the magnet pieces. | 04-07-2011 |
| 20110080065 | ROTOR FOR AXIAL GAP-TYPE PERMANENT MAGNETIC ROTATING MACHINE - An axial gap-type permanent magnetic rotating machine comprises a rotor comprising a rotating shaft having an axis of rotation, a rotor yoke of disc shape radially extending from the shaft, and a plurality of permanent magnet segments circumferentially arranged on a surface of the rotor yoke such that each permanent magnet segment may have a magnetization direction parallel to the axis of rotation, and a stator having a plurality of circumferentially arranged coils and disposed to define an axial gap with the rotor. In the rotor, each permanent magnet segment is an assembly of two or more divided permanent magnet pieces, and the coercive force near the surface of the magnet piece is higher than that in the interior of the magnet piece. | 04-07-2011 |
| 20110079325 | METHOD FOR ASSEMBLING ROTOR FOR USE IN IPM ROTARY MACHINE - An interior permanent magnet (IPM) rotary machine comprises a rotor comprising a rotor yoke having bores and a plurality of permanent magnet segments disposed in the bores of the rotor yoke, each permanent magnet segment consisting of a plurality of magnet pieces. The rotor is assembled by inserting the plurality of unbound magnet pieces in each bore for stacking the magnet pieces, and fixedly securing the stacked magnet pieces in the bore. | 04-07-2011 |
| 20110077391 | HYDROXYALKYL METHYLCELLULOSE HAVING SOLUBILITY AND THERMOREVERSIBLE GELATION PROPERTIES IMPROVED - Provided is hydroxyalkyl methylcellulose which can be dissolved at room temperature of 20 to 30° C. and has high thermoreversible gel strength during thermoreversible gelation. More specifically, provided is water-soluble hydroxyalkyl methylcellulose having a molar substitution of hydroxyalkoxyl groups of 0.05 to 0.1 and a substitution degree of methoxyl groups of 1.6 to 1.9, wherein the hydroxyalkoxyl groups are classified into substituted hydroxyalkoxyl groups having hydroxyl groups of hydroxyalkoxyl groups substituted further with methoxyl groups and unsubstituted hydroxyalkoxyl groups having hydroxyl groups of hydroxyalkoxyl groups not further substituted; and a ratio (A/B) of a molar fraction (A) of the substituted hydroxyalkoxyl groups to a molar fraction (B) of unsubstituted hydroxyalkoxyl groups is 0.4 or greater. | 03-31-2011 |
| 20110076465 | EPOXY-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTIVE FILM - A photo-curable resin composition comprising an epoxy-containing silphenylene or silicone polymer with a Mw of 3,000-500,000 forms a coating which is useful as a protective film for electric/electronic parts. | 03-31-2011 |
| 20110070523 | SOLID POLYMER ELECTROLYTE MEMBRANE, METHOD FOR PRODUCING THE SAME, MEMBRANE-ELECTRODE ASSEMBLY FOR FUEL CELL, AND FUEL CELL - Disclosed is a solid polymer electrolyte membrane obtained by graft-polymerizing one or more kinds of radically polymerizable monomers to a resin membrane which is irradiated with radiation. This solid polymer electrolyte membrane is characterized in that at least one kind of the radically polymerizable monomers is a monofunctional monomer having one alkenyl group and a plurality of aromatic rings. By using a monofunctional monomer having one alkenyl group and a plurality of aromatic rings as at least one kind of the radically polymerizable monomers for radiation graft polymerization, there can be obtained a solid polymer electrolyte membrane having good oxidation resistance. When this solid polymer electrolyte membrane is used as an electrolyte membrane of a fuel cell, the fuel cell can have a long life since a grafted polymer chain is hardly decomposed. | 03-24-2011 |
| 20110069392 | LIGHT DIFFUSING SILICONE RUBBER COMPOSITION AND MOLDED PART - A light diffusing silicone rubber composition is provided comprising a silicone rubber compound having an overall transmittance of at least 70% when measured in a cured sheet of 2 mm thick, and a light diffusing agent added and dispersed in the silicone rubber compound. The light diffusing agent is in the form of poly(meth)acrylate resin, polystyrene resin or (meth)acrylate-styrene copolymer microparticulates having an average particle size of 0.3-100 μm. | 03-24-2011 |
| 20110068651 | ROTOR FOR PERMANENT MAGNET ROTATING MACHINE - In connection with a permanent magnet rotary machine comprising a rotor comprising a rotor core and a plurality of permanent magnet segments embedded in the rotor core and a stator comprising a stator core having a plurality of slots and windings therein, the rotor and the stator being disposed to define a gap therebetween, or a permanent magnet rotary machine comprising a rotor comprising a rotor core and a plurality of permanent magnet segments mounted on the surface of the rotor core and a stator comprising a stator core having a plurality of slots and windings therein, the rotor and the stator being disposed to define a gap therebetween, the rotor wherein each of the permanent magnet segments is an assembly of further divided permanent magnet pieces, and the coercive force near the surface of the magnet piece is higher than that in the interior of the magnet piece. | 03-24-2011 |
| 20110060109 | RT CURABLE FLUOROPOLYETHER BASE RUBBER COMPOSITION AND CURED PRODUCT - A fluoropolyether base rubber composition comprising (a) a linear fluoropolyether compound containing at least two ester groups in a molecule and a divalent perfluoroalkyl ether structure in its backbone, and having a Mn of 3,000-100,000, and (b) a siloxane polymer containing at least three amino groups in a molecule cures at room temperature into a product having heat resistance, low-temperature performance, chemical resistance, solvent resistance and oil resistance. | 03-10-2011 |
| 20110054133 | RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS - A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns. | 03-03-2011 |
| 20110046319 | ORGANOPOLYSILMETHYLENE AND A CURED PRODUCT THEREOF - The present invention provides an organopolysilmethylene
| 02-24-2011 |
| 20110046310 | ORGANOPOLYSILMETHYLENE AND A COMPOSITION COMPRISING THE SAME - The present invention provides an organopolysilmethylene represented by the following general formula (1): | 02-24-2011 |
| 20110045624 | PHOSPHORUS PASTE FOR DIFFUSION AND PROCESS FOR PRODUCING SOLAR BATTERY UTILIZING THE PHOSPHORUS PASTE - Disclosed is a phosphorus paste for diffusion that is used in continuous printing of a phosphorus paste for diffusion on a substrate by screen printing. The phosphorus paste for diffusion does not undergo a significant influence of ambient humidity on viscosity and has no possibility of thickening even after a large number of times of continuous printing. The phosphorus paste for diffusion is coated on a substrate by screen printing for diffusion layer formation on the substrate. The phosphorus paste for diffusion includes a doping agent containing phosphorus as a dopant for the diffusion layer, a thixotropic agent containing an organic binder and a solid matter, and an organic solvent. The doping agent is an organic phosphorus compound. | 02-24-2011 |
| 20110040063 | PREPARATION OF TRIORGANOSILOXY END-CAPPED ORGANOPOLYSILOXANE - A triorganosiloxy end-capped organopolysiloxane, i.e., organopolysiloxane having a backbone consisting essentially of repeating (3,3,3-trifluoropropyl)methylsiloxane units and end-capped with triorganosiloxy groups is prepared by copolymerizing tris(3,3,3-trifluoropropyl)trimethylcyclo-trisiloxane with a silanol end-capped organopolysiloxane in the presence of an alkyllithium or lithium silanolate catalyst to form a silanol end-capped copolymer, and adding a trialkylsilyl triflate or strong acid in excess relative to the catalyst and a hexaorganodisilazane for effecting end-capping and neutralization. | 02-17-2011 |
| 20110034620 | ABRASION RESISTANT SILICONE COATING COMPOSITION, COATED ARTICLE, AND MAKING METHOD - A silicone coating composition is provided comprising (A) a hydrolytic condensate obtained by (co)hydrolytic condensation of an alkoxysilane, (B) colloidal silica, (C) a urethane-modified vinyl polymer, (D) a curing catalyst, and (E) a solvent, the solid content of component (C) being 1 to 30% by weight based on the total solid content of components (A) and (B). The silicone coating composition can be coated and cured to an organic resin substrate without a need for primer, and the cured coating is abrasion resistant and transparent to visible light. | 02-10-2011 |
| 20110034613 | TWO-PART ORGANOPOLYSILOXANE COMPOSITION - A two-part organopolysiloxane composition is provided. A first part comprises (A) an organopolysiloxane, (B) a ketene silyl acetal compound or 2-methyldialkoxysilylpropionic ester, (C) an organic compound or silane compound having at least one nitrogen atom, (D) a silane compound having at least two alkoxy groups, and (E) another ketene silyl acetal compound or 2-trialkoxysilylpropionic ester. A second part comprises (F) an organopolysiloxane, (G) an organotin catalyst, and (H) water. The first and second parts are mixed to form a sealing composition which is fast curable to the depth with alcohol removal. | 02-10-2011 |
| 20110033803 | PATTERNING PROCESS AND RESIST COMPOSITION - A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units, acid labile group-containing recurring units and carbamate-containing recurring units, and a photoacid generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for inactivation to acid, coating a second positive resist composition comprising a C | 02-10-2011 |
| 20110033799 | PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION - A pattern is formed by (1) coating a first positive resist composition onto a substrate, baking, patternwise exposing, PEB, and developing to form a first positive resist pattern including a large area feature, (2) applying a resist-modifying composition comprising a basic nitrogen-containing compound and heating to modify the first resist pattern, and (3) coating a second positive resist composition thereon, patternwise exposing, and developing to form a second resist pattern. The large area feature in the first resist pattern has a film retentivity of at least 50% after the second pattern formation. | 02-10-2011 |
| 20110027700 | PELLICLE - A pellicle for lithography is provided that include a pellicle frame, a pellicle film stretched over one end face of the pellicle frame, and a pressure-sensitive adhesive layer provided on the other end face, the pressure-sensitive adhesive layer having a bubble content of 10 to 90 volume %. | 02-03-2011 |
| 20110024675 | HEAT CONDUCTIVE CURED PRODUCT AND MAKING METHOD - A heat conductive cured product which can be handled even in a single layer or thin film form, can be readily attached to a heat-generating component or heat-dissipating member, and exhibits an appropriate tack and heat conductivity in a thin film form is provided as well as a method for preparing the same. A heat conductive cured product is prepared by applying a heat conductive composition as a thin film to a substrate which has been treated to have a silicone pressure-sensitive adhesive releasable surface, and curing the composition, the composition comprising as essential components, (a) an organopolysiloxane having alkenyl radicals, (b) a heat conductive filler, the filler containing at least 30 vol % of aluminum powder based on its total volume, (c) an organohydrogenpolysiloxane, (d) a platinum group metal catalyst, (e) a reaction regulator, and (f) a silicone resin. | 02-03-2011 |
| 20110016926 | METHOD OF MANUFACTURING OPTICAL FIBER PREFORM USING PLASMA TORCH - A method of manufacturing an optical fiber preform by depositing glass fine particles onto a surface of a glass rod while the glass rod is reciprocated relative to a plasma torch, including: moving the glass rod in a first direction relative to the plasma torch while the plasma torch is applied to the glass rod and supplied at least with a dopant material and a glass material to deposit the glass fine particles onto the surface of the glass rod, in such a manner that a plasma power is set higher during a first time interval starting from a beginning of the movement of the glass rod in the first direction than during a second time interval starting from an end of the first time interval; and moving the glass rod in a second direction relative to the plasma torch, where the second direction is opposite to the first direction. | 01-27-2011 |
| 20110014776 | METHOD FOR PRODUCING SOI SUBSTRATE - A method for easily manufacturing a transparent SOI substrate having: a main surface with a silicon film formed thereon; and a rough main surface located on a side opposite to a side where the silicon film is formed. A method for manufacturing transparent SOI substrate, having a silicon film formed on a first main surface of the transparent insulating substrate, while a second main surface of the transparent insulating substrate, an opposite to the first main surface, is roughened. The method includes at least the steps of: roughening the first main surface with an RMS surface roughness lower than 0.7 nm and the second main surface with an RMS surface roughness higher than the surface roughness of the first main surface to prepare the transparent insulating substrate; and forming the silicon film on the first main surface of the transparent insulating substrate. | 01-20-2011 |
| 20110014775 | METHOD FOR PRODUCING SILICON FILM TRANSFERRED INSULATOR WAFTER - [PROBLEM] Provided is a method for producing an SOI wafer which the method can prevent occurrence of thermal strain, detachment, crack and the like attributed to a difference in thermal expansion coefficients between the insulating substrate and the SOI layer and also improve the uniformity of film thickness of the SOI layer. | 01-20-2011 |
| 20110003251 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS - The present invention relates to a positive resist composition and to a pattern forming process using the same. The present invention provides: a positive resist composition having an enhanced etching resistance and an excellent resolution and being capable of providing an excellent pattern profile even at a substrate-side boundary face of resist, in photolithography for fine processing, and particularly in lithography adopting, as an exposure source, KrF laser, extreme ultraviolet rays, electron beam, X-rays, or the like; and a pattern forming process utilizing the positive resist composition. | 01-06-2011 |
| 20110001097 | SILICON COMPOSITE, MAKING METHOD, AND NON-AQUEOUS ELECTROLYTE SECONDARY CELL NEGATIVE ELECTRODE MATERIAL - A silicon composite comprises silicon particles whose surface is at least partially coated with a silicon carbide layer. It is prepared by subjecting a silicon powder to thermal CVD with an organic hydrocarbon gas and/or vapor at 900-1,400° C., and heating the powder for removing an excess free carbon layer from the surface through oxidative decomposition. | 01-06-2011 |
| 20110000586 | RARE EARTH MAGNET AND ITS PREPARATION - A rare earth magnet is prepared by disposing a R | 01-06-2011 |
| 20100330467 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and an area of no greater than 20 mm | 12-30-2010 |
| 20100330466 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section are parallel to each other and each of side edges of the basic quadrilateral has one quadrilateral recess. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face. | 12-30-2010 |
| 20100330132 | COMPOSITE PARTICLES, METHOD FOR PREPARING THE SAME AND COSMETIC COMPOSITION - Composite particles formed of core particles and a silicone elastomer adhered to surfaces of the core particles. | 12-30-2010 |
| 20100328641 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm | 12-30-2010 |
| 20100328635 | Pellicle - There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with:
| 12-30-2010 |
| 20100326121 | AIR-CONDITIONING SYSTEM - The present invention provides an air-conditioning system that supplies a gas to a space to be air-conditioned and/or discharges a gas from the space to be air-conditioned through a permeable membrane in order to provide an air-conditioning system that can sufficiently block suspended matter in the air such as SPM, and can sufficiently introduce outside air in which the permeable membrane is an asymmetric membrane formed of a polymeric material prepared by polymerizing a monomer composition containing a predetermined monomer. | 12-30-2010 |
| 20100323311 | BURNER FOR MANUFACTURING POROUS GLASS BASE MATERIAL - The present invention provides a burner for manufacturing a porous glass base material that has small-diameter gas discharge ports and that achieves uniform linear velocity at the gas discharge ports, a uniform reaction, and a stable flame, and improved deposition efficiency. In the burner for manufacturing a porous glass base material, inner diameters of the pipes forming the gas discharge ports positioned farther inward in a radial direction than the gas discharge ports in which the small-diameter gas discharge port nozzles are arranged contract beginning from a position farther on a burner source side than the prescribed length L position, the contraction being greater closer to a burner tip side, and inner diameters of the pipes forming the gas discharge port in which the small-diameter gas discharge port nozzles are arranged and the gas discharge ports that are positioned farther outward in the radial direction than this gas discharge port contract beginning from a position farther on a burner tip side than the prescribed length L position, the contraction being greater closer to a burner tip side. | 12-23-2010 |
| 20100323281 | Pellicle - There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the external opening of the ventilation hole for preventing entrance of a foreign substance, and at least one of two openings of the ventilation hole is chamfered to a degree selected from a group consisting of | 12-23-2010 |
| 20100323145 | ADDITION REACTION-CURABLE SILICONE PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE TAPE - Provided is an addition reaction-curable silicone pressure-sensitive adhesive composition, including: (A) a specific diorganopolysiloxane consisting of (A1) a linear diorganopolysiloxane having two or more alkenyl groups, and (A2) a linear diorganopolysiloxane having SiOH groups at the terminals and containing no alkenyl groups, (B) a specific organopolysiloxane containing M units, Q units and SiOH group-containing siloxane units, (C) an organohydrogenpolysiloxane containing three or more SiH groups, (D) an addition reaction retarder, (E) a platinum group metal-based catalyst, and (F) a specific organopolysiloxane containing T units and D units. A cured product layer formed from a cured product of this composition can be peeled from a release film with minimal peeling force, and exhibits excellent adhesion to silicone rubbers. The composition is ideal for use within a pressure-sensitive adhesive tape including a substrate and an aforementioned cured product layer laminated to at least one surface of the substrate. | 12-23-2010 |
| 20100319491 | METHOD FOR EXTRACTING AND SEPARATING RARE EARTH ELEMENTS - Solvent extraction from an aqueous phase containing first and second rare earth elements is carried out by contacting an organic phase containing a diglycolamic acid as an extractant and a hydrocarbon or a low-polar alcohol as a solvent, with the aqueous phase below pH 3 for extracting the first rare earth element into the organic phase, back-extracting from the organic phase with an aqueous acid solution for recovering the first rare earth element, and recovering the second rare earth element which has not been extracted into the organic phase and has remained in the aqueous phase. | 12-23-2010 |
| 20100317852 | AMINO-CONTAINING VINYLSILANE COMPOUNDS AND MAKING METHOD - Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers. | 12-16-2010 |
| 20100316871 | BONDED ARTICLE - In a bonded article comprising a pair of substrates joined with a silicone base adhesive, a thin layer comprising a room temperature curable organopolysiloxane composition in the cured state having a lower strength than the adhesive intervenes between the substrate and the adhesive. The article is ready for recycling even after exposure to elevated temperature. | 12-16-2010 |
| 20100311221 | Method for manufacturing semiconductor substrate - Hydrogen ions are implanted to a surface (main surface) of the single crystal Si substrate | 12-09-2010 |
| 20100305258 | ADDITION-CURABLE SILICONE EMULSION COMPOSITION - An addition-curable silicone emulsion that exhibits stable curability even with a small amount of platinum. The curable emulsion composition is composed of an emulsion A and an emulsion B described below which are mixed together at the time of use, wherein the ratio of [number-average particle size of dispersed particles in emulsion A]/[number-average particle size of dispersed particles in emulsion B] is within a range from 0.4 to 2.0. The emulsion A comprises a specific alkenyl group-containing organopolysiloxane, a specific organohydrogenpolysiloxane, a nonionic surfactant, a polyvinyl alcohol and water, wherein the number-average particle size of the dispersed particles is within a range from 300 to 1,000 nm. The emulsion B comprises a specific alkenyl group-containing organopolysiloxane, a platinum-based complex, a nonionic surfactant, a polyvinyl alcohol and water, wherein the number-average particle size of the dispersed particles is within a range from 300 to 1,000 nm. | 12-02-2010 |
| 20100304301 | Negative resist composition and patterning process using the same - There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2). | 12-02-2010 |
| 20100304297 | PATTERNING PROCESS AND RESIST COMPOSITION - A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising a C | 12-02-2010 |
