| Shanghai Micro Electronics Equipment Co., Ltd. Patent applications |
| Patent application number | Title | Published |
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| 20100177294 | METHOD FOR IN-SITU ABERRATION MEASUREMENT OF OPTICAL IMAGING SYSTEM IN LITHOGRAPHIC TOOLS - The present invention has disclosed a method for in-situ aberration measurement in an optical imaging system of lithographic tools, which comprises the steps of: imaging the reticle pattern by the beams transmitting through the reticle via the optical imaging system; using particular tools to measure plural groups of linewidths by modifying the intensity distribution at the exit pupil plane of the optical imaging system; calculating the asymmetry and ununiformity of the linewidths and calculating the aberrations of the optical imaging system. The present method for aberration measurement can simplify the process of measurement; increase the measurement accuracy of the parameters of image quality; and reduce the time of measurement. | 07-15-2010 |
| 20090273765 | IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE - The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer stage for supporting the wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under the projection objective lens. The immersion maintenance system includes a horizontal guideway, a flat board connected with the horizontal guideway through the cantilever, and plural drivers for driving the flat board to move. When the wafer is unloading and the wafer stage is moving out of the exposure area under the projection objective lens, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the wafer stage to above the flat board. When the wafer is loaded and the wafer stage is moving into the exposure area, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the flat board to above the wafer stage. The system of the present invention eliminates the removing and establishing processes of the flow field when the wafer stage leaves and enters the exposal position, thus saving much time and improving the throughput of the lithography machine. | 11-05-2009 |
| 20090219503 | PRECISE POSITIONING SYSTEM FOR DUAL STAGE SWITCHING EXPOSURE - The present invention discloses a precise positioning system for dual stage switching exposure, which comprises at least a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units comprises at least a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation of the system both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other. The advantage of the present invention is that the switching paths of the wafer stages are short; the guide bars are equally forced; the size of the wafer stages are hardly restricted, thereby greatly improving the switching speed, operation accuracy and flexibility of the system. Besides, the present invention does not need to adopt additional collision-preventing apparatus, thus simplifying the system, reducing the cost, and effectively increasing the reliability. | 09-03-2009 |
| 20090185290 | LARGE-FIELD UNIT-MAGNIFICATION PROJECTION OPTICAL SYSTEM - The present invention discloses a large-field unit-magnification projection optical system. The optical system includes an optical axis, a spherical concave reflection mirror; a lens group with positive refracting power arranged adjacent the mirror with an air space therebetween. The lens group includes a first plano-convex lens, a negative meniscus lens adjacent the plano-convex lens, a positive lens adjacent the negative meniscus lens, a negative double-convex lens spaced apart far from the positive lens, and a second plano-convex lens. The optical system further includes a pair of prisms each having respective first and second surface. The second surfaces are arranged adjacent the flat surface of the plano-convex lens element on opposite sides of the optical axis and the first surfaces are arranged adjacent object planes and image planes, respectively. Each lens in the lens group and the pair of prisms provide chromatic aberration correction in a spectral region that contains at least g, h and i-line wavelengths. In this projection optical system, the object plane is parallel to the image plane. | 07-23-2009 |
