SENSARRAY CORPORATION
SENSARRAY CORPORATION Patent applications | ||
Patent application number | Title | Published |
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20080228419 | PROCESS CONDITION SENSING WAFER AND DATA ANALYSIS SYSTEM - A measuring device incorporating a substrate with sensors that measure the processing conditions that a wafer may undergo during manufacturing. The substrate can be inserted into a processing chamber by a robot head and the measuring device can transmit the conditions in real time or store the conditions for subsequent analysis. Sensitive electronic components of the device can be distanced or isolated from the most deleterious processing conditions in order increase the accuracy, operating range, and reliability of the device. | 09-18-2008 |
20080228306 | DATA COLLECTION AND ANALYSIS SYSTEM - A sensor network collects time-series data from a process tool and supplies the data to an analysis system where pattern analysis techniques are used to identify structures and to monitor subsequent data based on analysis instructions or a composite model. Time-series data from multiple process runs are used to form a composite model of a data structure including variation. Comparison with the composite model gives an indication of tool health. A sensor network may have distributed memory for easy configuration. | 09-18-2008 |