SEMCO ENGINEERING SA
SEMCO ENGINEERING SA Patent applications | ||
Patent application number | Title | Published |
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20120083105 | METHOD FOR BORON DOPING SILICON WAFERS - A process for P-type boron doping of silicon wafers placed on a support in the chamber of a furnace of whose one end includes a wall in which element for introducing reactive gases and a carrier gas carrying a boron precursor in gaseous form are located, whereby the process includes the following stages: a) reacting in the chamber, the reactive gases with boron trichloride BCl | 04-05-2012 |