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Samsung C & T Corporation

Samsung C & T Corporation Patent applications
Patent application numberTitlePublished
20100130118INTERIOR ZONE PRESSURIZATION METHOD AND SYSTEM TO REDUCE THE STACK EFFECT PROBLEMS - A method and system for minimizing an incomplete closing phenomenon between an elevator hole and an interior section and a stack effect problem such as strong wind generated when opening an elevator door, which are inevitably generated at upper floors of high-rise office buildings, are provided. The method includes determining a degree of pressurization of the interior section in accordance with target pressure resistance and reduction in passing wind when opening the elevator door, and calculating a supply air volume required for the pressurization and an exhaust air volume from an elevator shaft based on the determined degree of the pressurization.05-27-2010