RIBER Patent applications |
Patent application number | Title | Published |
20130247651 | VALVE-CELL VACUUM DEPOSITION APPARATUS INCLUDING A LEAK DETECTION DEVICE AND METHOD FOR DETECTING A LEAK IN A VACUUM DEPOSITION APPARATUS - The leak detection device is adapted to test the tightness of an inner tank ( | 09-26-2013 |
20120295014 | INJECTOR FOR A VACUUM VAPOUR DEPOSITION SYSTEM - An injector for a vacuum vapour deposition system, includes an injection duct suitable for receiving vaporized materials from a vacuum evaporation source and a diffuser having a plurality of nozzles for diffusing the vaporized materials into a vacuum deposition chamber, each nozzle including a channel suitable for connecting the injection duct to the deposition chamber. The diffuser has a spatially varying nozzle distribution. A process for calibrating an injector and a process for manufacturing a diffuser for an injector are also described. | 11-22-2012 |
20120160171 | INJECTOR FOR A VACUUM EVAPORATION SOURCE - An injector for a vacuum evaporation source includes an injection duct ( | 06-28-2012 |
20120097328 | APPARATUS FOR FABRICATING SEMICONDUCTOR WAFERS AND APPARATUS FOR THE DEPOSITION OF MATERIALS BY EVAPORATION USING A MOLECULAR BEAM - Described is equipment for depositing materials by evaporation using a molecular beam and equipment for fabricating semiconductor wafers, including a central conveyor module having a plurality of lateral ports capable of functioning under vacuum pressure conditions above 10 | 04-26-2012 |
20120097105 | MOLECULAR BEAM EPITAXY APPARATUS FOR PRODUCING WAFERS OF SEMICONDUCTOR MATERIAL - A molecular beam epitaxy apparatus for producing wafers of semiconductor material includes a growth chamber surrounding a process area, a main cryogenic panel having a lateral part covering the inner surface of the lateral wall of the growth chamber, a sample holder, at least one effusion cell able to evaporate a material, a gas injector to inject a gaseous precursor into the growth chamber, a pumping element connected to the growth chamber to provide high vacuum capability. The apparatus includes an insulation enclosure covering at least the inner surfaces of the growth chamber walls, the insulation enclosure including cold parts having a temperature T | 04-26-2012 |
20120097102 | APPARATUS FOR DEPOSITING A THIN FILM OF MATERIAL ON A SUBSTRATE AND REGENERATION PROCESS FOR SUCH AN APPARATUS - Disclosed is an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus includes a chamber, a cryogenic panel disposed inside the chamber, a sample holder able to support a substrate, a gas injector able to inject a gaseous precursor into the chamber, a first trap connected to the vacuum chamber and able to trap a part of the gaseous precursor released by the cryogenic panel, the first trap having a fixed pumping capacity S | 04-26-2012 |