RENA GMBH Patent applications |
Patent application number | Title | Published |
20130032030 | EXHAUST AIR SYSTEM AND METHOD THEREFOR - An apparatus for the removal of gaseous reaction products ( | 02-07-2013 |
20120292522 | METHOD FOR DETERMINING THE CONCENTRATION OF NITRIC ACID - The present invention relates to the field of wet chemical treatment of silicon substrates. The invention particularly relates to a method for the determination of the concentration of nitric acid in aqueous process solutions as being used for the treatment of substrates such as those made from silicon. The method is based on the determination of nitrate by means of UV spectroscopy/photometry with the aid of eliminating agents which effectively remove disturbing absorptions caused by other substances. Therein, the concentration of nitrate corresponds to that of nitric acid. | 11-22-2012 |
20120248068 | Process Module for the Inline-Treatment of Substrates - The present invention relates to an apparatus and a method for the fluidic inline-treatment of flat substrates with at least one process module. In particular, the invention relates to such a treatment during the gentle and controlled transport of the substrates, wherein the treatment can also just relate to the transport of the substrates. | 10-04-2012 |
20120208370 | METHOD FOR ETCHING OF SILICON SURFACES - The invention relates to a method for etching of silicon surfaces with the following steps: | 08-16-2012 |
20120132188 | HOLDING/CLEANING DEVICE AND METHOD FOR THE ZONAL CLEANING OF SAWED WAFERS - A device for holding a substrate block to be sawed and for flushing the intermediate spaces formed by sawing the substrate block. It comprises two regions arranged parallel to the device longitudinal axis and above one another, the upper region being configured as an adapter region by means of which the device can be connected to a machine instrument, and the lower region being formed as a holding region which comprises a circumferentially closed or closable channel system which can be supplied with flushing liquid by means of closable supply openings and the bottom of which is opened in a slot-like fashion during the sawing of the substrate block so as to provide passage openings for the flushing liquid. A method for flushing intermediate spaces formed by sawing a substrate block using the above device. | 05-31-2012 |
20120076633 | APPARATUS AND METHOD FOR THE SEPARATING AND TRANSPORTING OF SUBSTRATES - The invention relates to a separating, deflecting and transporting of a disc like substrate ( | 03-29-2012 |
20120061245 | METHOD AND DEVICE FOR THE ELECTROLYTIC TREATMENT OF HIGH-RESISTANCE LAYERS - A method and a device for electroplating and electrolytically etching plate-shaped or strip-shaped material in continuous installations or bath installations having rotating transport and contact structures along the conveyor belt. The current is fed to the material in the center, i.e. in the useful zone, thereby obtaining a layer thickness distribution which is at least as good as when the current is supplied from both edges. The invention further allows material of any formats of width and different contours to be electrolytically treated in any order. | 03-15-2012 |
20110305252 | METHOD AND APPARATUS FOR THE ADJUSTMENT OF A LASER HEAD - The invention relates to a method for the adjustment of the beam axis of a laser head and an apparatus for this purpose. The method includes the steps of introducing the laser head ( | 12-15-2011 |
20110097160 | METHOD AND APPARATUS FOR THE TRANSPORTING OF OBJECTS - The present invention relates to methods and apparatuses for the transporting of substantially flat, freely movable objects, wherein at least the holding and guiding takes place by use of a streaming liquid. | 04-28-2011 |
20110045673 | METHOD FOR MANUFACTURING A SILICON SURFACE WITH PYRAMIDAL TEXTURE - The invention relates to a method for manufacturing a silicon surface with a pyramidal structure, in which a silicon wafer containing the silicon surface is dipped into an etching solution. To produce a pyramidal structure that is as homogeneous as possible, according to the invention it is proposed that the silicon surface be treated with ozone prior to coming into contact with the etching solution. | 02-24-2011 |