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REALIZE ADVANCED TECHNOLOGY LIMITED
| REALIZE ADVANCED TECHNOLOGY LIMITED Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090084409 | Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned - [Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark. | 04-02-2009 |