| RAVE LLC Patent applications |
| Patent application number | Title | Published |
|---|
| 20110303062 | Method for Fabricating High Aspect Ratio Nanostructures - A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area. | 12-15-2011 |
| 20090317730 | SYSTEM AND A METHOD FOR IMPROVED CROSSHATCH NANOMACHINING OF SMALL HIGH ASPECT THREE DIMENSIONAL STRUCTURES BY CREATING ALTERNATING SUPERFICIAL SURFACE CHANNELS - This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material. Therefore, embodiments of the present invention minimizes tip deflection errors allowing allow high aspect Nano-bits to reliably and accurately nanomachine small high aspect three dimensional structures to repair and rejuvenate photomasks | 12-24-2009 |
| 20090114850 | APPARATUS AND METHOD FOR MODIFYING AN OBJECT - A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material. | 05-07-2009 |
