| 20090288689 | ULTRASONIC CLEANING SYSTEM FOR REMOVING HIGH DOSE ION IMPLANTED PHOTORESIST IN SUPERCRITICAL CARBON DIOXIDE - Disclosed is an ultrasonic cleaning system for removing a high dose ion-implanted photoresist in supercritical carbon dioxide. Specifically, the ultrasonic cleaning system includes one or more ultrasonic horns mounted inside a high pressure reactor to be operated in supercritical carbon dioxide and having a cross-section enabling uniform processing of an overall surface of a wafer, so that ultrasonic waves can be superposed in the high pressure reactor and uniformly distributed over the surface of a support provided as a cleaning target in a cleaning bath, thereby minimizing damage to a fine pattern on the surface of the support while effectively removing a high dose ion-implanted photoresist. | 11-26-2009 |
