PLEX LLC Patent applications |
Patent application number | Title | Published |
20160007433 | EXTREME ULTRAVIOLET SOURCE WITH MAGNETIC CUSP PLASMA CONTROL - A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps. | 01-07-2016 |
20130153568 | INDUCTION HEATED BUFFER GAS HEAT PIPE FOR USE IN AN EXTREME ULTRAVIOLET SOURCE - The succesful use of lithium vapor in an extreme ultraviolet (EUV) light source depends upon an intense localized heat source at the center of conical structures that evaporate, condense and re-supply liquid lithium. Induction heating of a hollow structure with toroidal topology via an internal helical field coil, can supply intense heat at its innermost radius. The resulting slim radio frequency heated structure has high optical transmission from a central EUV producing plasma to collection mirrors outside of the structure, improving EUV source efficiency and reliability. | 06-20-2013 |
20120146510 | PULSED DISCHARGE EXTREME ULTRAVIOLET SOURCE WITH MAGNETIC SHIELD - A magnetically shielded, efficient plasma generation configuration for a pulsed discharge extreme ultraviolet (EUV) light source comprises two opposed convex electrodes mounted with axes parallel to a static magnetic field. A limiter aperture disposed between the electrodes, in conjunction with the field lines, defines a hollow plasma cylinder connecting the electrodes. A high pulsed voltage and current compresses the plasma cylinder and its interior magnetic field onto the electrode surfaces to create a magnetic insulating layer at the same time as propelling the working gas from each side toward the space between the electrode tips. The plasma then collapses radially in a three-dimensional compression to form a dense plasma on the axis of the device with radiation of extreme ultraviolet light. | 06-14-2012 |
20110089834 | Z-PINCH PLASMA GENERATOR AND PLASMA TARGET - A configuration of two opposed electrodes with conical depressions and symmetry around an axis along which there is an applied steady magnetic field, is supplied with a pulsed voltage and current to create an azimuthally very uniform pre-ionization cylinder of a working gas as a precursor to stable and accurate compression of the working gas into a Z-pinch plasma photon source or plasma target for laser-pumped photon sources. A further compound hollow electrode configuration permits the generation of a cool, dense, core plasma surrounded and compressed by a hot liner plasma. Modulation of the radial density profile within this core can provide optical guiding for a laser-pumped recombination laser. | 04-21-2011 |
20090212241 | LASER HEATED DISCHARGE PLASMA EUV SOURCE - A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size. | 08-27-2009 |