Phyzchemix Corporation

Patent application number	Title	Published
Phyzchemix Corporation Patent applications
20100062602	Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment - To provide an etching method employing a novel CVD system and an etching apparatus applicable to the method.	03-11-2010
20090095425	APPARATUS FOR THE FORMATION OF A METAL FILM - An apparatus for forming a metal film, including a reaction vessel for housing a substrate, a precursor feeding device for bubbling a carrier gas through a liquid organometallic complex, vaporizing the organometallic complex, producing a precursor from the vaporized organometallic complex, and feeding the precursor into the reaction vessel, a rotating magnetic field generator for creating a rotating magnetic field in a space above the substrate, and a second plasma generator for generating a plasma from a reducing gas fed into the reaction vessel.	04-16-2009