| PHOTRONICS, INC. Patent applications |
| Patent application number | Title | Published |
|---|
| 20080261127 | PHOTOMASK WITH DETECTOR FOR OPTIMIZING AN INTEGRATED CIRCUIT PRODUCTION PROCESS AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT USING THE SAME - A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate source images; one or more polarizing elements each corresponding to one of the one or more duplicate source images; and one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source. | 10-23-2008 |
| 20080261126 | SECURE PHOTOMASK WITH BLOCKING APERTURE - A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask. | 10-23-2008 |
| 20080258754 | SECURITY ELEMENT FOR AN INTEGRATED CIRCUIT, INTEGRATED CIRCUIT INCLUDING THE SAME, AND METHOD FOR SECURING AN INTEGRATED CIRCUIT - An integrated circuit including a substrate; a circuit pattern formed over the substrate; and one or more fences formed around edges of the circuit pattern, each of the one or more fences having a determined electrical resistance which is used to detect the addition of malicious circuitry. Each fence has a determined electrical resistance which is used to monitor the validity of the fence. | 10-23-2008 |
