Panasonic Coporation Patent applications |
Patent application number | Title | Published |
20140204897 | BASE STATION DEVICE, TERMINAL DEVICE, RESOURCE ALLOCATION METHOD AND RESPONSE SIGNAL TRANSMISSION METHOD - A base station apparatus is disclosed in which control section ( | 07-24-2014 |
20130026211 | BONDING TOOL, APPARATUS FOR MOUNTING ELECTRONIC COMPONENT, AND METHOD FOR MANUFACTURING BONDING TOOL - In some cases, it is difficult to carry out ultrasonic joining of high quality with a conventional bonding tool. A bonding tool includes: a horn that transmits an ultrasonic vibration; an ultrasonic vibrator that is provided at one end of the horn, and generates the ultrasonic vibration; and an electronic component holding part that holds an electronic component, wherein the electronic component holding part has a male fitting part in a shape of a tapering-off, and an electronic component holding face that holds the electronic component on an opposite side to the male fitting part, a female fitting part in a shape according to a shape of the male fitting part is formed in a predetermined face of the horn, and the male fitting part is fitted into the female fitting part via an adhesion layer. | 01-31-2013 |
20110116658 | FINE NATURAL FIBER AND SPEAKER DIAPHRAGM COATED WITH FINE NATURAL FIBER - Natural fiber is beaten with a biaxial kneading machine. The beaten natural fiber is processed finely with a bead mill so as to allow the processed natural fiber to have a BET specific surface area not smaller than 1 m | 05-19-2011 |
20100265477 | SEMICONDUCTOR MANUFACTURING APPARATUS AND PATTERN FORMATION METHOD - In a pattern formation method employing immersion lithography, after a resist film is formed on a wafer, pattern exposure is performed by selectively irradiating the resist film with exposing light with a liquid including an unsaturated aliphatic acid, such as sunflower oil or olive oil including oleic acid, provided on the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern made of the resist film. | 10-21-2010 |