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OSAKA INDUSTRIAL PROMOTION ORGANIZATION

Osaka-shi, Osaka, JP

OSAKA INDUSTRIAL PROMOTION ORGANIZATION Patent applications
Patent application numberTitlePublished
20100059717GaN CRYSTAL PRODUCING METHOD, GaN CRYSTAL, GaN CRYSTAL SUBSTRATE, SEMICONDUCTOR DEVICE AND GaN CRYSTAL PRODUCING APPARATUS - A method for producing a GaN crystal capable of achieving at least one of the prevention of nucleation and the growth of a high-quality non-polar surface is provided. The production method of the present invention is a method for producing a GaN crystal in a melt containing at least an alkali metal and gallium, including an adjustment step of adjusting the carbon content of the melt, and a reaction step of causing the gallium and nitrogen to react with each other. According to the production method of the present invention, nucleation can be prevented, and as shown in FIG. 03-11-2010
20100019677PLASMA PRODUCING APPARATUS AND METHOD OF PLASMA PRODUCTION - For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 01-28-2010

Patent applications by OSAKA INDUSTRIAL PROMOTION ORGANIZATION