| OLAMBDA, INC. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110268401 | Nonlinearity Compensation In A Fiber Optic Communications System - An optical communications link is described, comprising first and second fiber lines in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile (oppositely signed) and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. For other described embodiments, the first and second fiber lines are in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. | 11-03-2011 |
| 20110145769 | COMPUTATIONAL EFFICIENCY IN PHOTOLITHOGRAPHIC PROCESS SIMULATION - Photolithographic process simulation is described in which fast computation of resultant intensity for a large number of process variations and/or target depths (var,z | 06-16-2011 |
| 20110116800 | NONLINEARITY COMPENSATION IN A FIBER OPTIC COMMUNICATIONS SYSTEM - An optical communications link is described, comprising first and second fiber lines in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile (oppositely signed) and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. | 05-19-2011 |
| 20100275178 | COMPUTATIONAL EFFICIENCY IN PHOTOLITHOGRAPHIC PROCESS - Photolithographic process simulation is described in which fast computation of resultant intensity for a large number of process variations and/or target depths (var,z | 10-28-2010 |
