# OLAMBDA, INC.

OLAMBDA, INC. Patent applications | ||

Patent application number | Title | Published |
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20120158384 | COMPUTER SIMULATION OF PHOTOLITHOGRAPHIC PROCESSING - Methods, systems, and related computer program products for photolithographic process simulation are disclosed. In one preferred embodiment, a resist processing system is simulated according to a Wiener nonlinear model thereof in which a plurality of precomputed optical intensity distributions corresponding to a respective plurality of distinct elevations in an optically exposed resist film are received, each optical intensity distribution is convolved with each of a plurality of predetermined Wiener kernels to generate a plurality of convolution results, and at least two of the convolution results are multiplied to produce at least one cross-product. A weighted summation of the plurality of convolution results and the at least one cross-product is computed using a respective plurality of predetermined Wiener coefficients to generate a Wiener output, and a resist processing system simulation result is generated based at least in part on the Wiener output. | 06-21-2012 |

20110268401 | Nonlinearity Compensation In A Fiber Optic Communications System - An optical communications link is described, comprising first and second fiber lines in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile (oppositely signed) and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. For other described embodiments, the first and second fiber lines are in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. | 11-03-2011 |

20110145769 | COMPUTATIONAL EFFICIENCY IN PHOTOLITHOGRAPHIC PROCESS SIMULATION - Photolithographic process simulation is described in which fast computation of resultant intensity for a large number of process variations and/or target depths (var,z | 06-16-2011 |

20110116800 | NONLINEARITY COMPENSATION IN A FIBER OPTIC COMMUNICATIONS SYSTEM - An optical communications link is described, comprising first and second fiber lines in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile (oppositely signed) and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line. | 05-19-2011 |

20100275178 | COMPUTATIONAL EFFICIENCY IN PHOTOLITHOGRAPHIC PROCESS - Photolithographic process simulation is described in which fast computation of resultant intensity for a large number of process variations and/or target depths (var,z | 10-28-2010 |