| OERLIKON TRADING AG, TRUEBBACH Patent applications |
| Patent application number | Title | Published |
|---|
| 20120021137 | CUTTING TOOL - A method for manufacturing a cutting tool includes the steps of providing a body of cermet or cemented carbide, having a cutting edge with an edge radius R | 01-26-2012 |
| 20110272099 | PLASMA PROCESSING APPARATUS AND METHOD FOR THE PLASMA PROCESSING OF SUBSTRATES - A plasma processing apparatus ( | 11-10-2011 |
| 20110111193 | COATING SYSTEM, COATED WORKPIECE AND METHOD FOR MANUFACTURING THE SAME - The coating system comprises: at least one layer of type A, a layer of type A substantially consisting of (Al | 05-12-2011 |
| 20110063745 | COLOR WHEEL - The present invention relates to a color wheel which allows for an easy to perform balancing. The color wheel comprises a motor and a color rotor with a carrier. Filter segments are mounted to the carrier. In addition the color rotor comprises a body with a surface perpendicular to the rotational axis of the rotor. The surface comprises a two dimensional matrix of holes which can be filled with balancing masses. In order to balance the color rotor it is rotated. During rotation, the unbalance is detected. In addition the location where to put balancing mass is detected. At this location balancing mass, such as for example adhesive is filled into the respective hole. | 03-17-2011 |
| 20110049102 | PLASMA TREATMENT APPARATUS AND METHOD FOR PLASMA-ASSISTED TREATMENT OF SUBSTRATES - A remote plasma source comprises a first plate-like electrode ( | 03-03-2011 |
| 20110030760 | PHOTOVOLTAIC DEVICE AND METHOD OF MANUFACTURING A PHOTOVOLTAIC DEVICE - The photovoltaic device comprises a substrate, deposited on said substrate,
| 02-10-2011 |
| 20100326356 | PLASMA BOOSTER FOR PLASMA TREATMENT INSTALLATION - Vacuum treatment installation particularly for plasma coating workpieces, has an arrangement for boosting and/or igniting a glow discharge plasma for the treatment of workpieces, and at least one hollow body of electrically conductive material, the hollow body including a hollow space and at least one entrance opening through which charge carriers flow in order to make possible ignition and operation of a plasma or to boost an existing plasma. The hollow body is electrically connected to workpieces so that the hollow body is essentially at workpiece potential. The hollow space is formed such that when an electric signal is applied to the hollow body, at least in a certain pressure and voltage range, geometric conditions for the ignition of a discharge in the interior of the hollow body are satisfied, and the at least one hollow body is not a workpiece carrier. | 12-30-2010 |
| 20100263503 | WORKPIECE WITH HARD COATING - A workpiece has a body ( | 10-21-2010 |
| 20100139863 | VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES - A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated. | 06-10-2010 |
| 20100018464 | DLC COATING SYSTEM AND PROCESS AND APPARATUS FOR MAKING COATING SYSTEM - A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4 | 01-28-2010 |
| 20100012483 | MULTILAYER HARD COATING FOR TOOLS - A multilayer hard coating for tools for machining applications with a multilayer structure for improving the wear resistance of workpieces includes at least one (Al | 01-21-2010 |
| 20090269615 | METHOD FOR PRODUCING METAL OXIDE LAYERS OF PREDETERMINED STRUCTURE THROUGH ARC VAPORIZATION - The invention relates to a method for producing layers consisting of ternary and higher oxides of metallic and semi-metallic components, wherein the formation temperature of these oxides can be determined essentially through the composition of the binary (or higher) alloy targets (based on the phase diagram). | 10-29-2009 |
| 20090269600 | METHOD FOR PRODUCING METAL OXIDE LAYERS THROUGH ARC VAPORIZATION - The invention relates to a method for producing oxidic layers by means of PVD (physical vapor deposition), in particular by means of cathodic arc vaporization, wherein a powder-metallurgical target is vaporized and the powder-metallic target is formed of at least two metallic or semi-metallic components, the composition of the metallic or semi-metallic components resp. of the target being chosen in such a manner that during heating in the transition from the room temperature into the liquid phase no phase boundary of purely solid phases, based on the phase diagram of a molten mixture of the at least two metallic or semi-metallic components, is crossed. | 10-29-2009 |
| 20090260977 | METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE - Planetary carriers ( | 10-22-2009 |
| 20090205949 | MAGNETRON SPUTTERING SOURCE AND ARRANGEMENT WITH ADJUSTABLE SECONDARY MAGNET ARRANGEMENT - The magnetron sputtering source comprises a target mount for mounting a target arrangement comprising a sputtering target having a sputtering surface; a primary magnet arrangement for generating close to said sputtering surface a magnetron magnetic field describing one tunnel-like closed loop having an arc-shaped cross-section; a secondary magnet arrangement for generating close to said sputtering surface an auxiliary magnetic field having a substantially arc-shaped cross-section, said auxiliary magnetic field superposing with said magnetron magnetic field and being substantially inversely polarized with respect to said magnetron magnetic field; and an adjustment unit for adjusting said auxiliary magnetic field. The vacuum treatment apparatus comprises such a magnetron sputtering source. The method for manufacturing coated substrates by magnetron sputtering using a magnetron sputtering source comprises the steps of a) generating close to a sputtering surface of a target said magnetron magnetic field; b) generating close to said sputtering surface said auxiliary magnetic field; and c) adjusting said auxiliary magnetic field. In particular, said secondary magnet arrangement comprises several separately adjustable segments. Using the invention, it is possible to determine gauge functions for precisely achieving target thickness distributions. | 08-20-2009 |
| 20090191417 | PERMEATION BARRIER LAYER - The method for manufacturing a hydrogen permeation barrier comprises the steps of
| 07-30-2009 |
| 20090155494 | METHOD FOR MANUFACTURING FLAT SUBSTRATES - For avoiding the metallic inner surface of a PECVD reactor to influence thickness uniformity and quality uniformity of a μc-Si layer ( | 06-18-2009 |
| 20090155489 | VOLTAGE NON-UNIFORMITY COMPENSATION METHOD FOR HIGH FREQUENCY PLASMA REACTOR FOR THE TREATMENT OF RECTANGULAR LARGE AREA SUBSTRATES - A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated. | 06-18-2009 |
| 20090127673 | METHOD FOR PRODUCING SEMI-CONDUCTING DEVICES AND DEVICES OBTAINED WITH THIS METHOD - A semi-conducting device has at least one layer doped with a doping agent and a layer of another type deposited on the doped layer in a single reaction chamber. An operation for avoiding the contamination of the other layer by the doping agent separates the steps of depositing each of the layers. | 05-21-2009 |
| 20080311310 | DLC Coating System and Process and Apparatus for Making Coating System - A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4 | 12-18-2008 |
