| OBDUCAT AB Patent applications |
| Patent application number | Title | Published |
|---|
| 20120297856 | METHOD AND PROCESS FOR METALLIC STAMP REPLICATION FOR LARGE AREA NANOPATTERNS - A method and process for obtaining a metal stamp from an intermediate polymer stamp comprising the steps of providing a first print layer on top of a first polymer layer, imprinting structures to obtain an intermediate stamp. A conductive layer is provided on top of the structures to obtain a seed layer if the imprinted polymer is a non-conductive, plating metal on top of the intermediate polymer stamp to obtain a metal stamp then separating the intermediate stamp from the metal stamp. This invention demonstrates stamp replication in high throughput and at low cost. | 11-29-2012 |
| 20100160478 | METHODS AND PROCESSES FOR MODIFYING POLYMER MATERIAL SURFACE INTERACTIONS - The invention to provide curable materials, comprising photo-reactive compounds, in particular, photoinitiators and polymerizable mono- or multifunctional monomers such as acrylates or epoxides. The material may also contain fluoro-surfactants completely or partly terminated by functional groups with the ability to bind covalently to said chemical composition under curing. The curable compositions are either purely acrylate based or a hybrid of different types of monomers such as acrylates, epoxides or vinyl ethers. The polymerizable monomers may cure with the use of different types of photoinitiator, such as free radical photoinitiators or cationic photoinitiators, ultimately forming a hybrid resist comprising interpenetrating networks of different types of monomers e.g. acrylates and epoxides. The acrylate/epoxide hybrid system has showed improved replication properties in terms of high nano-imprint lithography process fidelity, due to increased conversion of acrylates and low shrinkage. | 06-24-2010 |
| 20100155988 | PROCESS AND METHOD FOR MODIFYING POLYMER FILM SURFACE INTERACTION - The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process. | 06-24-2010 |
| 20090321990 | NANO IMPRINTING METHOD AND APPARATUS - The present invention relates to a nano imprint method and to a nano imprint apparatus comprising: a first imprint module, a second imprint module, a storage and a feeder module, wherein; the first imprint module is adapted to imprint a pattern into an intermediate polymer stamp from a template; a second imprint module is adapted to imprint a pattern into a substrate from the intermediate polymer stamp; robot feeder modules are adapted to move the template, intermediate polymer stamp and the substrate from and to storages. | 12-31-2009 |
