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NXP B.V. (Dutch Corporation)

Ag Eindhoven, NL

NXP B.V. (Dutch Corporation) Patent applications
Patent application numberTitlePublished
20110080686MIM CAPACITOR - A method of forming a metal-insulator-metal capacitor having top and bottom plates separated by a dielectric layer, one of the top and bottom plates having at least one protrusion extending into a corresponding cavity in the other of the top and bottom plates, the method including the steps of growing one or more nanofibers on a base surface.04-07-2011
20100102402METHOD OF FABRICATING A TRANSISTOR WITH SEMICONDUCTOR GATE COMBINED LOCALLY WITH A METAL - A method of forming a field effect transistor comprising a gate formed on an insulating layer, the gate having, in a zone in contact with the insulating layer, a semiconducting central zone and lateral zones in the length of the gate, the method comprising forming a gate comprising a portion of insulating layer, a portion of semiconducting layer formed over the insulating layer, and a portion of mask layer formed over the semiconducting layer; performing an etching of the portion of the mask layer such that only a portion in the centre of the gate remains; and reacting the semiconducting gate with a metal deposited over the gate.04-29-2010