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NOMURA MICRO SCIENCE CO., LTD.
Atsugi-shi, JP
| NOMURA MICRO SCIENCE CO., LTD. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110259818 | FILTER MEDIA FOR LIQUID PURIFICATION TO REMOVE TRACE METALS - Filter media for liquid purification, which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali, acid solution or ultra-pure water used for silicon wafers of semiconductors. Removal of metals from various kind of liquid such as inorganic chemicals, organic solvent, or industrial waste water are also the subject of the present invention. | 10-27-2011 |