| Nissan Chemical Industries, Ltd. Patent applications |
| Patent application number | Title | Published |
|---|
| 20120135206 | FLUORINE-CONTAINING HIGHLY BRANCHED POYMER AND RESIN COMPOSITION CONTAINING THE SAME - It is an object to provide a compound that can provide a molded article and a coating film excellent not only in solubility in an organic solvent, but also in miscibility with/dispersibility in a matrix resin, causing no aggregation in a matrix resin, excellent in surface modification property, and having high transparency. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof with a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof in the presence of a polymerization initiator C in a content of 5% by mol or more and 200% by mol or less, based on the total molar amount of the monomer A and the monomer B; and a resin composition comprising the polymer. | 05-31-2012 |
| 20120129102 | PHOTOSENSITIVE COMPOSITION INCLUDING PHOTOPOLYMERIZABLE POLYMER HAVING FLUORENE SKELETON - A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1): | 05-24-2012 |
| 20120128891 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT - There is provided a composition for curing a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation or both of them to form the resist underlayer film. A composition for forming a resist underlayer film used for nanoimprint in a pattern forming process using nanoimprint by performing heat-baking, light-irradiation, or both of them, the composition comprising a silicon atom-containing polymerizable compound (A), a polymerization initiator (B) and a solvent (C). The polymerizable compound (A) may contain silicon atoms in a content of 5 to 45% by mass. The polymerizable compound (A) may be a polymerizable compound having at least one cation polymerizable reactive group, a polymerizable compound having at least one radical polymerizable reactive group, or a combination of them, and the polymerization initiator (B) may be a photopolymerization initiator. | 05-24-2012 |
| 20120128640 | HETEROCYCLIC COMPOUNDS AND EXPANSION AGENTS FOR HEMATOPOIETIC STEM CELLS - An expansion agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy useful for treatment of various disorders is provided. | 05-24-2012 |
| 20120114879 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO ALIGNMENT PROPERTIES - A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, the composition comprising: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; a component (B) that is an acrylic polymer having at least one of a C | 05-10-2012 |
| 20120108759 | CAGE-SHAPED CYCLOPENTANOIC DIANHYDRIDE, METHOD FOR PRODUCTION THEREOF, AND POLYIMIDE - A cage 1,2,3,4-cyclopentanetetracarboxylic acid ( | 05-03-2012 |
| 20120108680 | LONG-CHAIN GLYCYL POLYOL TYPE GELATOR AND GEL - A gelator made of an aliphatic oxyglycyl polyol that is capable of forming a gel by a small amount of addition in a pH range from acidic to alkaline regions, and a gel having high environmental compatibility, biocompatibility and biodegradability. A gelator including an aliphatic oxyglycyl polyol of Formula (1) wherein R is a C | 05-03-2012 |
| 20120101236 | POLYIMIDE PRECURSOR COMPOSITION CONTAINING POLYAMIC ACID ALKYL ESTER - To provide a polyamic acid ester-containing polyimide precursor composition having a good storage stability, from which a polyimide film having a high imidization degree and excellent adhesion to an inorganic substrate can be obtained. | 04-26-2012 |
| 20120101126 | CRYSTALLINE FORMS OF PITAVASTATIN CALCIUM - The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous form. | 04-26-2012 |
| 20120095043 | TRIGLYCERIDE-LOWERING AGENT AND HYPERINSULINISM-AMELIORATING AGENT - The present invention is directed to a triglyceride-lowering agent, exhibiting excellent triglyceride-lowering effect and a hyperinsulinemia-ameliorating agent. | 04-19-2012 |
| 20120094232 | PRODUCTION METHOD OF POLYHYDROXYIMIDE - There is provided a simple production method of a polyhydroxyimide. A production method of a polyhydroxyimide, characterized by comprising adding to a polyhydroxyimide precursor containing a repeating structure of Formula (1): | 04-19-2012 |
| 20120088888 | POLYIMIDE PRECURSOR, POLYIMIDE, AND LIQUID CRYSTAL ALIGNING AGENT - To provide a novel polyimide precursor or polyimide which can provide a liquid crystal alignment film having a low volume resistivity, a liquid crystal aligning agent containing these polymers, a liquid crystal alignment film and a novel diamine which is useful as the starting material of these polymers. | 04-12-2012 |
| 20120082805 | COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO ALIGNMENT PROPERTIES - A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent. | 04-05-2012 |
| 20120077345 | CARBAZOLE NOVOLAK RESIN - There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula ( | 03-29-2012 |
| 20120070994 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask; and a forming method of a resist pattern using the underlayer film forming composition for lithography. A resist underlayer film forming composition for lithography comprising: as a silicon atom-containing compound, a hydrolyzable organosilane containing a sulfur atom-containing group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein in the whole silicon atom-containing compound, the ratio of a sulfur atom to a silicon atom is less than 5% by mole. The hydrolyzable organosilane is preferably a compound of Formula (1): [R | 03-22-2012 |
| 20120065320 | FLUORINE-CONTAINING 1,6-DIENE ETHER COMPOUND AND FLUORINE-CONTAINING POLYMER - A fluorine-containing polymer obtained using a 1,6-diene ether compound represented by formula [1] is a high-performance polymer exhibiting a low refractive index, high glass transition point, a high degree of transparency, and solubility in solvents. There are many potential uses, such as use as a coating material or bulk material. For example, said polymer could be effectively used in high-tech fields such as: optical materials such as low-reflection films and optical waveguide cladding; semiconductor materials such as pellicles and resists in semiconductor lithography; and protective film materials, insulating film materials, and water-repellent materials. | 03-15-2012 |
| 20120059169 | NOVEL CRYSTAL FORM OF TRICYCLIC BENZOPYRAN COMPOUND AND PRODUCTION METHOD THEREOF - Crystal forms of (3R,4S)-7-hydroxymethyl-2,2,9-trimethyl-4-(phenethylamino)-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol that are excellent as a drug, and production methods thereof. Production methods include crystallizing (3R,4S)-7-hydroxymethyl-2,2,9-trimethyl-4-(phenethylamino)-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol from an acetate ester solvent, an aliphatic hydrocarbon solvent, a nitrile solvent, an aromatic hydrocarbon solvent, a ketone solvent or an ether solvent, and crystal forms obtained according to the methods. | 03-08-2012 |
| 20120059136 | METHOD FOR PRODUCING HIGHLY BRANCHED POLYMER - A method for producing a highly branched polymer, with which a molecular weight can be controlled without using a polymerization inhibitor and a polymer having a controlled molecular weight can be produced safely even in a case of mass production in an industrial scale. A method for producing a highly branched polymer including polymerizing a monomer A having two or more radical polymerizable double bonds in a molecule, in the presence of a polymerization initiator B in an amount of 5% by mol to 200% by mol with respect to 1 mol of the monomer A at a temperature 20° C. higher than a 10-hour half-life temperature of the polymerization initiator B or higher. | 03-08-2012 |
| 20120046397 | METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES - There is provided to a method for efficiently producing phosphonic acid metal salt fine particles with an average particle diameter of 0.5 μm or less with high efficiency. A method for producing phosphonic acid metal salt fine particles, comprising: a) causing a reaction of a phosphonic acid compound of Formula (I): | 02-23-2012 |
| 20120045899 | PATTERN REVERSAL FILM FORMING COMPOSITION AND METHOD OF FORMING REVERSED PATTERN - There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR | 02-23-2012 |
| 20120040291 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY - There is provided a compositions of resist underlayer films for EUV lithography that is used in a production process of devices employing EUV lithography, that reduces adverse effects caused by EUV, and that has a beneficial effect on the formation of a favorable resist pattern; and a method for forming resist patterns using the composition of resist underlayer films for EUV lithography. A composition for forming a resist underlayer film for an EUV lithography process used in production of a semiconductor device, comprising a novolac resin containing a halogen atom. The novolac resin may include a cross-linkable group composed of an epoxy group, a hydroxy group, or a combination thereof. The halogen atom may be a bromine atom or an iodine atom. The novolac resin may be a reaction product of a novolac resin or an epoxidized novolac resin and a halogenated benzoic acid; or a reaction product of a glycidyloxy novolac resin and diiodosalicylic acid. | 02-16-2012 |
| 20120035108 | SPRAY BASE MATERIAL INCLUDING LOW-MOLECULAR GELATOR - There is provided a spray base material that can be safely used with a sense of security, that prevents leakage of liquid from a spray container, that is sprayable under any condition (when inverted, for example), that is sprayable to achieve uniform coating of the surface of an object (surface to be sprayed) without scattering, that causes no dripping from a sprayed surface, and that is safe when sprayed on a skin surface and the like; and a spray base material with an excellent sprayability that can include both hydrophilic and hydrophobic low-molecular compounds such as physiologically active compounds and perfume components to be used in pharmaceuticals, agrochemicals, and cosmetics, and that has a sustained release property. A spray base material comprising an aqueous medium that is gelled by a low-molecular gelator in the medium, wherein the low-molecular gelator includes one, two, or more compounds selected from a group consisting of low-molecular compounds capable of gelling the aqueous medium via self-assembly. | 02-09-2012 |
| 20120029187 | HALOALKYLSULFONANILIDE DERIVATIVE - Novel herbicides are provided. | 02-02-2012 |
| 20120027760 | ADIPONECTIN RECEPTOR AND GENE ENCODING THE SAME - The object is to isolate and identify human and mouse adiponectin receptors, to provide a novel protein having adiponectin binding ability, and to provide a screening method and screening kit for a ligand, agonist and antagonist to an adiponectin receptor using such protein. To achieve this object, a protein is used, as novel protein having adiponectin binding ability, that is (a) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8, or (b) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8 with one or more amino acids deleted, replaced or added, and having adiponectin binding ability. | 02-02-2012 |
| 20110319624 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 12-29-2011 |
| 20110319589 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND - It is an object to provide a liquid thermosetting composition that yields an epoxy resin having physical properties of the cured product such as high flexural strength along with adequate handleability as liquid, to be used in transparent sealants for optical semiconductors, such as transparent sealants for LEDs (light-emitting devices) and the like. There is provided a thermosetting composition containing an epoxy compound that a side chain between a triazinetrione ring and an epoxy group substituted on the triazinetrione ring is long (elongated). | 12-29-2011 |
| 20110319551 | MODIFIED TRIAROYLBENZENE-SKELETON POLYMER - It is an object to provide a film having both high transparency and high heat resistance, and particularly a coating solution for forming a coating film from which an optical film can be produced. A triaroylbenzene-skeleton polymer in which a terminal of a polymer produced by polymerizing a compound of Formula [1] below is modified by a compound of Formula [2] below. A coating solution for forming a coating film, comprising the polymer. A film obtained from the coating solution for forming a coating film. In the formulae below, X | 12-29-2011 |
| 20110318907 | COMPOSITION FOR FORMING GATE INSULATING FILM FOR THIN-FILM TRANSISTOR - There is provided a novel composition for forming a gate insulating film taking into consideration also electrical characteristics after other processes such as wiring by irradiation with an ultraviolet ray and the like during the production of an organic transistor using a gate insulating film. A composition for forming a gate insulating film for a thin-film transistor comprising: a component (i): an oligomer compound or a polymer compound containing a repeating unit having a structure in which a nitrogen atom of a triazine-trione ring is bonded to a nitrogen atom of another triazine-trione ring through a hydroxyalkylene group; and a component (ii): a compound having two or more blocked isocyanate groups in one molecule thereof. | 12-29-2011 |
| 20110318554 | HYPERBRANCHED POLYMER CONTAINING THIOESTER GROUPS - There is provided a polymer having a high refractive index without forming a complex with inorganic fine particles, being excellent in the solubility in an organic solvent and the coating properties during film formation, and having a high transparency, and further being capable of dispersing optically homogeneously a functional dye such as a nonlinear dye in a high concentration. A hyperbranched polymer containing a thioester group of Formula (1) below [where R | 12-29-2011 |
| 20110313173 | Process for producing acrylonitrile compound - There is provided a process for stereoselectively producing E-form of 3-acyloxyacrylonitrile compound (3) or Z-form which comprises reacting 3-oxopropionitrile compound (1) with an acid chloride (2), characterized in that the reaction is conducted with removal of hydrogen chloride, or by using an organic base or an inorganic base, to thereby regulate the stereostructure of the product; a process for producing the compound (1) characterized by reacting acetonitrile compound (5) with an aromatic ester compound (6) by use of an alkali metal alkoxide in a hydrocarbon solvent while removing alcohol formed as a by-product by azeotropic distillation in a separating tank; and a process for isomerizing E-form of 3-acyloxyacrylonitrile compound to Z-form thereof by use of an organic base. | 12-22-2011 |
| 20110311915 | PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION - A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C | 12-22-2011 |
| 20110287369 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R | 11-24-2011 |
| 20110281974 | PROCESS FOR PRODUCING COMPOSITION OF POLYMERIZABLE ORGANIC COMPOUND CONTAINING SILICA PARTICLES - A process for producing a composition of a polymerizable organic compound containing silica particles characterized by comprising: (a) a process of preparing an amine-added organic solvent-dispersed silica sol, in which an amine compound is added to an organic solvent-dispersed silica sol that contains colloidal silica particles having an average primary particle size of 5 to 100 nm and that has a pH of 2.5 to 4.0 at 20° C. as measured in a diluted solution obtained by a method in which the same mass of the organic solvent-dispersed silica sol, methanol, and pure water are mixed together, so that the diluted solution obtained by the mixing method has a pH of 4.5 to 11.0 at 20° C.; and (b) a process of mixing the amine-added organic solvent-dispersed silica sol obtained in the process (a) with a polymerizable organic compound. | 11-17-2011 |
| 20110281958 | PRODUCTION METHOD YTTRIUM OXIDE-STABILIZED ZIRCONIUM OXIDE SOL - There is provided a production method of an yttrium oxide-stabilized zirconium oxide aqueous sol and organic solvent sol capable of producing a sol having extremely advantageous transparency with which the heating condition is eased compared to that of a conventional method and secondary aggregation of the obtained colloidal particle is hardly caused. A production method of an yttrium oxide-stabilized zirconium oxide aqueous sol, characterized by comprising: a process of subjecting a mixed aqueous solution produced by dissolving an yttrium carboxylate and zirconium oxyacetate in water in an Y/(Y+Zr) atomic ratio in a range of 0.10 to 0.60 to hydrothermal treatment at 160 to 280° C. for 2 hours or more. | 11-17-2011 |
| 20110281090 | GERMANIUM-CONTAINING HIGH-REFRACTIVE-INDEX THIN FILM AND PRODUCTION METHOD THEREOF - There is provided a high refractive-index coating film and a production method of the high refractive-index coating film. The production method comprises producing a coating film containing a germanium compound containing a Ge—Ge bond as a backbone thereof, and baking the coating film under vacuum or in an inert gas atmosphere. The high refractive-index coating film produced by the method is soluble in a solvent and has a high moldability and film-formation property, and has a high refractive index of 1.8 or more and further 2.3 or more, and is chemically stable. | 11-17-2011 |
| 20110274767 | PRODUCTION METHOD OF TITANIUM OXIDE SOL - There is provided a method for efficiently producing an anatase-type titanium oxide sol in an extremely advantageous dispersion state. The method comprises mixing a titanium alkoxide, an organic acid, and a quaternary ammonium hydroxide with water in a molar ratio of the organic acid of 0.4 to 4.0 relative to 1 mol of a titanium atom of the titanium alkoxide and in a molar ratio of the quaternary ammonium hydroxide of 0.8 to 1.9 relative to 1 mol of the organic acid to prepare an aqueous mixed solution having a concentration in terms of TiO | 11-10-2011 |
| 20110257394 | CRYSTALS OF HYDROCHLORIDE OF PYRIDAZIN-3(2H)-ONE COMPOUND AND PROCESS FOR PRODUCTION OF SAME - Provided are novel crystals of 4-bromo-6-(3-(4-chloro-phenyl)propoxy)-5-(pyridin-3-ylmethylamino)pyridazin-3(2H)-one monohydrochloride, and a process for production of same. A-form crystals of 4-bromo-6-(3-(4-chlorophenyl)propoxy)-5-(pyridin-3-ylmethylamino)pyridazin-3(2H)-one monohydro-chloride represented by formula (1), which exhibit a powder X-ray diffraction pattern with characteristic peaks at diffraction angles (2θ) of 8.24, 11.24, 11.76, 16.48, 17.16, 17.80, 18.24, 19.80, 21.64, 22.56, 22.96, 23.68, 24.52, 25.92, 26.32, 27.12, 27.40, 28.00, 28.64, 29.28, 31.84 and 34.80°. | 10-20-2011 |
| 20110251398 | ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE - A 3,5-Bis (substituted aryl) substituted isoxazoline compound of formula (2) or a salt thereof: | 10-13-2011 |
| 20110237791 | 2-PYRIDONE COMPOUNDS - A 2-pyridone compound represented by the formula [1]: | 09-29-2011 |
| 20110230058 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING - There is provided underlayer films of high-energy radiation resists that are applied onto semiconductor substrates in a lithography process for producing semiconductor devices and that are used to prevent reflection, static electrification, and development defects and to suppress outgassing during the exposure of resist layers with high-energy radiation. A composition for forming an underlayer film of a high-energy radiation resist, the composition comprising a film component having an aromatic ring structure or a hetero ring structure. The film component having an aromatic ring structure or a hetero ring structure is contained preferably in a film at a proportion of 5 to 85% by mass. The film component may be a compound having an aromatic ring structure or a hetero ring structure, and the compound may be a polymer or a polymer precursor including a specific repeating unit. The aromatic ring may be a benzene ring or fused benzene ring, and the hetero ring structure may be triazinetrione ring. | 09-22-2011 |
| 20110227056 | FORMING AGENT FOR GATE INSULATING FILM OF THIN FILM TRANSISTOR - It is an object to provide a novel forming agent for a gate insulating film that not only provides high insulating properties for the gate insulating film but also takes account of the electric characteristics of a thin film transistor element. A forming agent for a gate insulating film of a thin film transistor characterized by comprising an oligomer compound or a polymer compound including a structural unit containing a pyrimidinetrione ring having a hydroxyalkyl-containing group as a substituent on a nitrogen atom; a gate insulating film formed by the forming agent; and a thin film transistor. | 09-22-2011 |
| 20110207331 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin - There is provided a resist underlayer film forming composition for lithography, which in order to prevent a resist pattern from collapsing after development in accordance with the miniaturization of the resist pattern, is applied to multilayer film process by a thin film resist, has a lower dry etching rate than resists and semiconductor substrates, and has a satisfactory etching resistance relative to a substrate to be processed in the processing of the substrate. A resist underlayer film forming composition used in lithography process by a multiplayer film, comprises a polymer containing a unit structure having an aromatic fused ring, a unit structure having a protected carboxyl group or a unit structure having an oxy ring. A method of forming a pattern by use of the resist underlayer film forming composition. A method of manufacturing a semiconductor device by utilizing the method of forming a pattern. | 08-25-2011 |
| 20110204292 | COMPOSITIONS FOR FORMING WAVELENGTH CONVERSION FILMS FOR PHOTOVOLTAIC DEVICES, WAVELENGTH CONVERSION FILMS FOR PHOTOVOLTAIC DEVICES, AND PHOTOVOLTAIC DEVICES - It is an object to improve photoelectric conversion efficiency by use of a wavelength conversion film that is formed without dispersion of wavelength conversion substance and by using no rare earth compound. There is provided a composition for easily forming such a wavelength conversion film by spin-coating or the like. The present invention relates to a composition for forming a wavelength conversion film for a photovoltaic device, comprising a polymer or an oligomer in which a fluorescent moiety is incorporated, and a solvent. The fluorescent moiety may be incorporated in a main chain or a side chain of the polymer or the oligomer. The present invention also relates to a wavelength conversion film for a photovoltaic device that is formed from the composition for forming a wavelength conversion film. | 08-25-2011 |
| 20110198534 | UREA COMPOUND, SELF-ASSEMBLY OF UREA COMPOUNDS, ORGANOGEL CONTAINING SELF-ASSEMBLY, AND METHOD FOR PRODUCING ORGANOGEL - A urea compound of the present invention is represented by general formula (1) shown below. | 08-18-2011 |
| 20110196077 | PRODUCTION PROCESS OF PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT - A method for producing a phenylphosphonic acid metal salt, including reacting a phenylphosphonic acid compound (a) with a metal salt, metal oxide or metal hydroxide (b) that is present in an amount beyond the equivalent; a phenylphosphonic acid metal salt composition comprising a phenylphosphonic acid metal salt and surplus metal salt, surplus metal oxide or surplus metal hydroxide produced by the method; and a thermoplastic resin composition comprising the phenylphosphonic acid metal salt composition. | 08-11-2011 |
| 20110183913 | NOVEL LIPID DIPEPTIDE AND GEL - There is provided a gelator that is capable of forming a gel by an extremely small amount of addition in a wide pH range from acidic to alkaline regions, and a gel having high environmental compatibility, biocompatibility, and biodegradability. A gelator comprising: a lipid peptide of Formula (1) wherein R | 07-28-2011 |
| 20110183837 | METAL FINE PARTICLE DISPERSANT CONTAINING BRANCHED POLYMER COMPOUND HAVING AMMONIUM GROUP - There is provided a metal fine particle dispersant containing a branched polymer compound having an ammonium group. The metal fine particle dispersant of the present invention comprises a branched polymer compound having an ammonium group and having a weight average molecular weight of 500 to 5,000,000. The metal fine particle dispersant has the structure of Formula (1): | 07-28-2011 |
| 20110177259 | METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE - A method for readily manufacturing an optical waveguide having a high Δn value at low cost, and in specific, a self-organizing optical waveguide that optical waveguides having a high Δn value can be connected to each other; and a method for manufacturing the self-organizing optical waveguide. A method for manufacturing an optical waveguide, including step (A): forming a coating film on a lower clad portion using a coating solution including an oxide precursor containing a titanium atom and a silicon atom; and step (B): irradiating the coating film with a radiation beam under heating to form a core/clad layer including an irradiated core region having a higher refractive index and an unirradiated clad region having a refractive index lower than that of the core region. | 07-21-2011 |
| 20110172414 | ISOXAZOLINE COMPOUND AND PESTICIDE - A pesticide, particularly an insecticide or an acaricide, including a substituted isoxazoline compound of formula (1) or a salt thereof: | 07-14-2011 |
| 20110172355 | WATER REPELLENT COATING FILM HAVING LOW REFRACTIVE INDEX - To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. | 07-14-2011 |
| 20110172331 | Reactive monomer-dispersed silica sol and production method thereof, and curable composition and cured article thereof - A reactive monomer-dispersed silica sol having high stability by reducing the solid acidity of the surfaces of the colloidal silica particles contained in the reactive monomer-dispersed silica sol, and a production method thereof, and a curable composition using the reactive monomer-dispersed silica sol, and a cured article in which the deterioration, the degradation, or the like of the polymer is suppressed. A reactive monomer-dispersed silica sol containing a colloidal silica particle in which an alkaline earth metal ion is bonded to a surface of the colloidal silica particle. | 07-14-2011 |
| 20110149367 | ELECTROCHROMIC MATERIAL - The present invention relates to an electrochromic polymer compound composed of a hyperbranched polymer having electrochromic characteristics derived from a quaternary pyridinium salt, a terephthalic acid diester or a biphenyl-4,4′-diester structure, and a varnish, a thin film structure and an electrochromic device that are obtained by the polymer compound. The electrochromic material has high response speed, high coloring efficiency, and excellent repetition stability and can be used for a long time, and has excellent solubility in various solvents. | 06-23-2011 |
| 20110144349 | PRODUCTION METHOD OF ISOXAZOLINE-SUBSTITUTED BENZOIC ACID AMIDE COMPOUND - A production method of an isoxazoline-substituted benzoic acid amide compound of Formula (1) where X is a halogen atom, C | 06-16-2011 |
| 20110144334 | ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE - An isoxazoline-substituted benzamide compound of formula (1) or a salt thereof: | 06-16-2011 |
| 20110143149 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R | 06-16-2011 |
| 20110124884 | PROCESS FOR PRODUCING THIOPHENE COMPOUND AND INTERMEDIATE THEREOF - To provide a novel process for producing a 2-aryl-3-hydroxy-4-substituted carbonyl thiophene compound or an intermediate thereof useful as an intermediate for production of medicines and agricultural chemicals. | 05-26-2011 |
| 20110118408 | POLYMER COMPOUND HAVING AROYLBIPHENYLENE SKELETON AND THERMOCURABLE FILM FORMING POLYMER COMPOSITION - There is provided a polymer compound having excellent transparency and excellent heat resistance, a high refractive index, an excellent solubility in various solvents, and a low viscosity and excellent handling properties when the polymer compound is dissolved in a solvent; and a production method of the polymer compound; and a polymer composition containing the polymer compound. And there is also included an aroylbiphenyl compound of Formula (1): | 05-19-2011 |
| 20110117746 | COATING COMPOSITION AND PATTERN FORMING METHOD - It is an object to provide a coating composition applicable to “reversal patterning” and suitable for forming a film covering a resist pattern. The object is accomplished by a coating composition for lithography comprising an organopolysiloxane, a solvent containing the prescribed organic solvent as a main component, and a quaternary ammonium salt or a quaternary phosphonium salt; or a coating composition for lithography comprising a polysilane, a solvent containing the prescribed organic solvent as a main component, and at least one additive selected from a group consisting of a crosslinking agent, a quaternary ammonium salt, a quaternary phosphonium salt, and a sulfonic acid compound, wherein the polysilane has, at a terminal thereof, a silanol group or a silanol group together with a hydrogen atom. | 05-19-2011 |
| 20110114871 | HYDROPHOBIC ORGANIC SOLVENT-DISPERSED SOL OF ANHYDROUS ZINC ANTIMONATE COLLOIDAL PARTICLES AND METHOD FOR PRODUCING THE SAME - There is provided a hydrophobic organic solvent-dispersed sol of anhydrous zinc antimonate colloidal particles and a method for producing the same. A hydrophobic organic solvent-dispersed sol of anhydrous zinc antimonate colloidal particles, wherein surface-modified anhydrous zinc antimonate colloidal particles are dispersed in a hydrophobic organic solvent having a water solubility of 0.002 to 12% by mass, the surface-modified anhydrous zinc antimonate colloidal particles being formed by coating outer surfaces of anhydrous zinc antimonate colloidal particles (A) serving as cores with at least one substance (B) of colloidal particles of a composite oxide containing silica and stannic oxide or silica and antimony pentoxide at a silica/stannic oxide or silica/antimony pentoxide mass ratio of 0.1 to 10, an oligomer of the colloidal particles, and a mixture of the colloidal particles and the oligomer to form modified anhydrous zinc antimonate colloidal particles (C), and by bonding an organosilicon compound and an amine compound to surfaces of the colloidal particles (C). A method for producing the hydrophobic organic solvent-dispersed sol. | 05-19-2011 |
| 20110092496 | THIOPHENE COMPOUNDS AND THROMBOPOIETIN RECEPTOR ACTIVATORS - A compound represented by the formula (I) (wherein R | 04-21-2011 |
| 20110086310 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS - There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): | 04-14-2011 |
| 20110082298 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula ( | 04-07-2011 |
| 20110073977 | AMINO ACID GENERATOR AND POLYSILOXANE COMPOSITION CONTAINING THE SAME - There is provided an amino acid generator comprising a protecting group for an amino group that is eliminated to generate an amino acid, and a coating film forming composition using the amino acid generator and a polysiloxane composition containing the amino acid generator. A coating film forming composition comprising: a component (A): an amino acid generator comprising a protecting group that is eliminated to generate an amino acid, which is a compound of Formula (1): D-A (1) where D is a protecting group for an amino group, and A is an organic group remaining after subtracting hydrogen atoms from an amino group of an amino acid; a component (B): a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a mixture thereof; and a component (C): a solvent. | 03-31-2011 |
| 20110059404 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND FORMING METHOD OF RESIST PATTERN USING THE SAME - It is an object to provide a resist underlayer film forming composition having a large selection ratio of a dry etching rate, and having a k value and an n value at a short wavelength such as an ArF excimer laser, both of which exhibit desired values. There is provided a resist underlayer film forming composition containing a polymer obtained by reacting at least a tetracarboxylic dianhydride having an alicyclic structure or an aliphatic structure and a diepoxy compound having two epoxy groups with an organic solvent containing an alcohol-based compound having an OH group, and a solvent. | 03-10-2011 |
| 20110053091 | SULFUR ATOM-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond. | 03-03-2011 |
| 20110045404 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE - There is provided a composition for forming a resist underlayer film that can be homogeneously applied and a sublimate is suppressed during the thermal curing. There is also provided a composition for forming a resist underlayer film having a high selection ratio of dry etching relative to a resist applied thereon. A composition for forming a resist underlayer film for lithography comprising: a polysilane compound having a unit structure of Formula (1): | 02-24-2011 |
| 20110034552 | LONG-CHAIN OXYAMINOPOLYOL BASED GELATOR AND GEL - [Problems to be Solved] It is an object of the present invention to provide a gelator containing a long chain oxyaminopolyol capable of forming a gel with a small amount thereof over a liquid property range from acidic to alkaline, and a gel having high environmental suitability, biocompatibility and biodegradability. | 02-10-2011 |
| 20110009438 | SUBSTITUTED ISOXAZOLINE COMPOUND AND PEST CONTROL AGENT - There is provided a novel pest control agent, particularly an insecticide or miticide. A substituted isoxazoline compound of General Formula (1): | 01-13-2011 |
| 20100330505 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof as a silane, wherein a silane having a cyclic amino group is contained in an amount of less than 1% by mole, preferably 0.01 to 0.95% by mole. A film forming composition comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. A resist underlayer film forming composition for lithography comprising a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The cyclic amino group may be a secondary amino group or a tertiary amino group. The hydrolyzable organosilane is a compound of Formula (1): | 12-30-2010 |
| 20100311977 | METHOD FOR PRODUCING 2-AZAADAMANTANE - To provide a method whereby a 2-azaadamantane can easily be obtained in good yield. | 12-09-2010 |
| 20100311871 | COLLOIDAL SILICA PARTICLES, PROCESS FOR PRODUCING THE SAME, AND ORGANIC SOLVENT-DISPERSED SILICA SOL, POLYMERIZABLE COMPOUND-DISPERSED SILICA SOL, AND DICARBOXYLIC ANHYDRIDE-DISPERSED SILICA SOL EACH OBTAINED FROM THE SAME - There is provided colloidal silica particles comprising at least one polyvalent metal element M selected from a group consisting of iron, aluminum, zinc, zirconium, titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molar ratio, and having an average primary particle diameter of 5 to 40 nm, wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal particles is 0 to 0.003 atom per square nanometer (nm | 12-09-2010 |
| 20100310535 | METHOD FOR EXPANDING HEMATOPOIETIC STEM CELLS USING HETEROCYCLIC COMPOUND - An object of the present invention is to expand CD34 | 12-09-2010 |
| 20100305338 | PROCESS FOR PRODUCING OPTICALLY ACTIVE CIS-SILYL OLEFIN OXIDE COMPOUND - The present invention provides an efficient production method of an optically active cis-silylolefin oxide compound useful as an intermediate for various compounds. A production method of an optically active cis-silylolefin oxide compound by subjecting an optically active cis-silylolefin compound to an asymmetric oxidation with a high enantioselectivity and a high chemical yield by utilizing as a catalyst, an optically active titanium complex of Formula (1), Formula (2): | 12-02-2010 |
| 20100305237 | SILICA-CONTAINING EPOXY CURING AGENT AND CURED EPOXY RESIN PRODUCT - The present invention provides an epoxy curing agent comprising colloidal silica particles, which is a liquid having low viscosity and excellent transparency and is suitable as a curing agent for a resin composition for sealing optical semiconductor elements. | 12-02-2010 |
| 20100304305 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP - There is provided a resist underlayer film for lithography causing no intermixing with a photoresist and having a dry etching rate higher than that of the photoresist, and a resist underlayer film forming composition for forming the underlayer film. A resist underlayer film forming composition for lithography comprising: a polymer containing a partial structure of Formula (1): | 12-02-2010 |
| 20100298559 | OPTICALLY ACTIVE DINICKEL COMPLEX AND METHOD FOR PRODUCING OPTICALLY ACTIVE AMINE USING THE OPTICALLY ACTIVE DINICKEL COMPLEX AS CATALYST - There is provided a novel optically active dinickel complex and/or a production method of an optically active amine by an asymmetric Mannich reaction using the dinickel complex as a catalyst. An optically active dinickel complex of Formula (I) or Formula (I′): | 11-25-2010 |
| 20100298558 | SUBSTITUTED DIHYDROAZOLE COMPOUND AND PEST CONTROL AGENT - There is provided a novel pest control agent, particularly an insecticide or miticide. A substituted dihydroazole compound of General Formula (1) or a salt thereof: | 11-25-2010 |
| 20100291487 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP - There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising: a hydrolyzable organosilane having a urea group; a hydrolysis product thereof; or a hydrolysis-condensation product thereof. The hydrolyzable organosilane is for example a compound of Formula (1): | 11-18-2010 |
| 20100291483 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE - There is provided a resist underlayer film which does not intermix with a photoresist coated and formed as the overlying layer and which dissolves in an alkaline developer and can be developed and removed at the same time as the photoresist; and a resist underlayer film-forming composition for forming such a resist underlayer film. A resist underlayer film-forming composition for use in a lithographic process for manufacturing a semiconductor device, containing: (A) a branched polyhydroxystyrene in which an ethylene repeating unit on a polyhydroxystyrene moiety is bonded to a benzene ring on a different polyhydroxystyrene moiety; (B) a compound having at least two vinyl ether groups; and (C) a photoacid generator. | 11-18-2010 |
| 20100291210 | NOVEL LIPID PEPTIDE AND HYDROGEL - There is provided a lipid peptide that is capable of forming a hydrogel with an extremely small amount thereof over a liquid property range from acidic to alkaline, and a hydrogel having high environmental suitability, biocompatibility and biodegradability. A lipid peptide represented by Formula (1): | 11-18-2010 |
| 20100289012 | ORGANIC SWITCHING ELEMENT AND METHOD FOR PRODUCING THE SAME - There is provided a switching element including two electrodes and an organic bistable material sandwiched between the electrodes, which is expected to be applied to an organic memory element or the like. A switching element which includes: two electrodes; and an organic thin film containing a metal fine particle and interposed between the electrodes, and which exhibits such a current bistability that the switching element has two stable resistance values in response to a voltage applied, the switching element characterized in that the metal fine particle is dispersed in the organic thin film with a metal fine particle-dispersing agent containing a polymer having a dithiocarbamate group and having a weight average molecular weight of 500 to 5,000,000. | 11-18-2010 |
| 20100286323 | METAL FINE PARTICLE-DISPERSING AGENT COMPOSED OF POLYMER COMPOUND HAVING DITHIOCARBAMATE GROUP - There is provided a metal fine particle-dispersing agent for forming a dispersion system of metal fine particles. A metal fine particle-dispersing agent comprises a branched and/or linear polymer compound having a dithiocarbamate group and having a weight average molecular weight of 500 to 5,000,000. The branched and/or linear polymer may be a branched polymer of the formula (1) or a linear polymer represented by the formula (4). | 11-11-2010 |
| 20100286300 | THREE-DIMENSIONAL PATTERN FORMING MATERIAL - There is provided a photo-curable composition that shows the suppression of a residual film formation and a high adhesion thereof to a substrate in a process for forming a three-dimensional pattern by a photo-imprinting method. A photo-curable composition for forming a three-dimensional pattern by a photo-imprinting method, comprises a monomer having a photopolymerizable group; an inorganic fine particle to which a dispersant is added; and a photopolymerization initiator. It is preferred that the inorganic fine particle (e.g., silica) has an average particle diameter of 1 to 1,000 nm, and the dispersant is a silane coupling agent, particularly a silane coupling agent containing an organic group having a carbon-carbon unsaturated bond or an organic group having an epoxy group. | 11-11-2010 |
| 20100279955 | NOVEL LIPID TRIPEPTIDE-BASED HYDROGELATOR AND HYDROGEL - There is provided a hydrogelator that is capable of forming a hydrogel with an extremely small amount thereof over a liquid property range from acidic to alkaline, and a hydrogel having high environmental suitability, biocompatibility and biodegradability. A hydrogelator comprising a lipid peptide represented by Formula (1): | 11-04-2010 |
| 20100279227 | Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound - There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an strong acid catalyst, and an underlayer coating forming composition containing a component having an epoxy group (a polymer, a compound) and a component having a phenolic hydroxyl group, a carboxyl group, a protected carboxyl group or an acid anhydride structure (a polymer, a compound). | 11-04-2010 |
| 20100273708 | ADIPONECTIN EXPRESSION-INDUCING AGENTS AND USES THEREOF - The present invention provides adiponectin expression-inducing agents, and therapeutic agents using the same for obesity and obesity-related diseases such as cardiovascular diseases or metabolic diseases, as well as methods of searching for adiponectin expression-inducing agents. KLF9, which can bind to the 32-bp fragment of position −188 to position −157 from the adiponectin expression start site, was demonstrated to enhance adiponectin promoter activity. Therefore, the present invention uses KLF9 as an adiponectin expression-inducing agent, and suggests that KLF9 replenishment therapy is useful for preventing and/or treating obesity or obesity-related diseases including metabolic diseases such as insulin resistance and type II diabetes, and cardiovascular diseases. | 10-28-2010 |
| 20100266951 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN - There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded. | 10-21-2010 |
| 20100266556 | METHOD FOR EXPANDING HEMATOPOIETIC STEM CELLS USING HETEROCYCLIC COMPOUND - An expansion agent for hematopoietic stem cells and/or hematopoietic progenitor cells useful for improvement in the efficiency of gene transfer into hematopoietic stem cells for gene therapy useful for treatment of various hematopoietic disorders is provided. | 10-21-2010 |
| 20100249350 | HYPERBRANCHED POLYMER HAVING NITROXYL GROUP - There is provided a hyperbranched polymer having a nitroxyl group. A hyperbranched polymer comprising at least one organic radical structure (nitroxyl group) of Formula (1), Formula (2) or Formula (3): | 09-30-2010 |
| 20100240792 | Hyperbranched Polymer and Method for Producing the Same - Disclosed is a novel hyperbranched polymer having a functional group in a molecular chain of a repeating unit. Also disclosed is a method for producing such a hyperbranched polymer. Specifically disclosed is a hyperbranched polymer having a repeating unit derived from a (meth)acrylate compound as a linear structure, while having a repeating unit derived from a dithiocarbamate compound having a vinyl group structure as a branched structure. This hyperbranched polymer can be obtained by holding a dithiocarbamate compound having a vinyl group structure and a (meth)acrylate compound together and subjecting them to a living radical polymerization. | 09-23-2010 |
| 20100239872 | METAL OXIDE COMPOSITE SOL, COATING COMPOSITION, AND OPTICAL MEMBER - There is provided a sol of modified metal oxide composite colloidal particles including titanium oxide having a high refractive index and excellent light resistance and weather resistance that discoloration of the colloidal particles by photoexcitation is almost completely inhibited. A titanium oxide-tin oxide-zirconium oxide-tungsten oxide composite colloidal particle having a primary particle diameter of 2 to 50 nm, and a SnO | 09-23-2010 |
| 20100230639 | OLIGOANILINE COMPOUND - Any of the oligoaniline compounds with a triphenylamine structure represented by the formula (1) exhibits satisfactory light emitting efficiency and brightness performance when used in either an OLED device or a PLED device and is further satisfactory in the solubility in organic solvents so as to be applicable to various coating methods. | 09-16-2010 |
| 20100221766 | NUCLEAR TRANSFER PROMOTER FOR Cdc42 PROTEIN AND METHOD OF SCREENING THE SAME - A nuclear transfer promoter for Cdc42 protein comprising an isoprenoid synthesis inhibitor and/or a geranylgeranyl transferase inhibitor such as an HMG-CoA synthase inhibitor, an HMG-CoA reductase inhibitor, an AMPK activator or a farnesyl pyrophosphoric acid synthase preparation; utilization thereof; a method therefor; a blood vessel remedy comprising the nuclear transfer promoter for Cdc42 protein as the active ingredient; and a method of screening a blood vessel remedy which comprises assaying the ability of Cdc42 protein to transfer into nucleus. | 09-02-2010 |
| 20100221657 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING THE SAME - There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond. | 09-02-2010 |
| 20100221556 | MODIFIED METAL-OXIDE COMPOSITE SOL, COATING COMPOSITION, AND OPTICAL MEMBER - There is provided a sol of modified metal oxide composite colloidal particles including titanium oxide having a high refractive index and excellent light resistance and weather resistance that discoloration of the colloidal particles by photoexcitation is almost completely inhibited. A modified metal oxide composite colloidal particle comprises; a titanium oxide-tin oxide-zirconium oxide-tungsten oxide composite colloidal particle (A) having a primary particle diameter of 2 to 50 nm and having a SnO | 09-02-2010 |
| 20100210765 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION - There is provided a composition for forming a resist underlayer film that the adhesion with a resist applied on the resist underlayer film is enhanced and the collapse of a resist pattern is suppressed. A resist underlayer film-forming composition for lithography comprising: a polymer having silicon atoms in the backbone; a compound of a polycyclic structure; and an organic solvent, wherein the compound of a polycyclic structure has at least two carboxyl groups as substituents; the two carboxyl groups are individually bonded to two carbon atoms adjacent to each other forming the polycyclic structure; and the two carboxyl groups both have an endo configuration or an exo configuration, or have a cis configuration. | 08-19-2010 |
| 20100207076 | Conductive tin oxide sol and process for producing same - There is provided a conductive tin oxide sol having a high transparency, and a process for producing the sol, a coating composition by use of the sol and a material coated with the coating composition. The conductive tin oxide sol containing phosphorus-doped conductive tin oxide colloidal particles (A), wherein a sol prepared so as to have the colloidal particles (A) in a concentration of 10 mass % in the sol has a transmittance of 30% or more at a wavelength of 600 nm in an optical path length of 10 mm. The particle diameter of the conductive tin oxide sol by observation with transmission electron microscope is 2 to 25 nm. The molar ratio of the doped phosphorus (P) to the tin oxide (SnO | 08-19-2010 |
| 20100197938 | Process for producing indole compoud - There is provided a novel process for producing an indole derivative which comprises cyclizing 2-nitrobenzylcarbony compound in the presence of a catalyst comprising a Group VIII metal of the Periodic Table, characterized by conducting the cyclization in a gas atmosphere containing carbon monoxide. The process enables an indole compound to be selectively produced in a high yield from 2-nitrobenzylcarbonyl compound, and hardly yields an indoline compound as a reduction by-product that has been a problem in the catalytic hydrogenation method employing a noble metal catalyst. The indole derivative produced by the present process is useful for various fine chemical intermediates including compounds and physiologically active substances such as pharmaceuticals and agrochemicals. | 08-05-2010 |
| 20100190980 | PYRAZINAMIDE COMPOUND - Disclosed is a pyrazinamide compound represented by the formula (1), a tautomer, stereoisomer or pharmaceutically acceptable salt thereof, or a solvate of the compound or the tautomer, stereoisomer or pharmaceutically acceptable salt thereof, which has an excellent GK-activating activity and is therefore useful as a medicinal agent. (1) wherein R | 07-29-2010 |
| 20100160683 | Process for Production of 2-(Substituted Phenyl)-3,3,3-Trifluoropropene Compound - There is provided a novel process for production of a 2-(substituted phenyl)-3,3,3-trifluoropropene. | 06-24-2010 |
| 20100159201 | ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME - Disclosed is an electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, which uses a highly reliable polyimide resin as an electronic material. An electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, electrode patterning layer being formed by irradiating a layer comprising a polyamic acid having the repeated unit represented by the general formula (1) or polyimide produced by dehydration and cyclization of the polyamic acid with ultraviolet lay to form a pattern: (1) wherein A represents a tetravalent organic group and B represents a divalent organic group in which one or more A's and B's may be used, and n is a positive integer, provided that at least one of A's is a tetravalent organic group having a alicyclic structure. | 06-24-2010 |
| 20100144957 | CURABLE MATERIAL CONTAINING PHOTOPOLYMERIZABLE POLYMER AND CURED OBJECT - There is provided a curable material capable of manufacturing a cured object by ultraviolet irradiation without using a photopolymerization initiator or additive and a cured object obtained therefrom, and, in particular, provided a film-forming material capable of manufacturing a cured film and the cured film obtained therefrom. The curable material comprises a branched and/or linear photopolymerizable polymer having an N,N-dialkyldithiocarbamate group as a functional group at a molecular end. The film-forming material is composed of the curable material, and the cured object is obtained by photopolymerization of the curable material to effect inter-bonding and the cured film is obtained by photopolymerization of the film-forming material to effect inter-bonding and form a film. | 06-10-2010 |
| 20100144808 | SUBSTITUTED ISOXAZOLINE OR ENONE OXIME COMPOUND, AND PEST CONTROL AGENT - Disclosed is a novel pest control agent, in particular a pesticide or a miticide. Specifically disclosed are a substituted isoxazoline compound or a substituted enone oxime compound represented by the general formula (1) below or the general formula (2) below, and a pest control agent containing any of them. (In the formulae, the symbols are as defined in the description.) | 06-10-2010 |
| 20100137612 | METHOD FOR PRODUCTION OF 3-HYDROXYPROPAN-1-ONE COMPOUND FOR PRODUCTION OF 2- PROPEN-1-ONE COMPOUND AND METHOD FOR PRODUCTION OF ISOXAZLINE COMPOUND - There is provided a novel intermediate for producing pesticides. A method for producing 1,3-bis(substituted phenyl)-3-substituted-3-hydroxypropan-1-one compound of Formula (3) comprises reacting an aromatic ketone compound of Formula (4) and a substituted acetophenone compound of Formula (5) as starting raw materials in an organic solvent or water in the presence or absence of an additive in the presence of a base in a suspended state. A method for producing 1,3-bis(substituted phenyl)-3-substituted-2-propen-2-one compound of Formula (2) comprises dehydrating the compound of Formula (3). A method for producing compound (2) in one step comprises reacting compound (4) and compound (5) to obtain compound (3). Further, a method for producing an isoxazoline compound of Formula (1) comprises reacting compound (2) and a hydroxylamine in an aliphatic or an aromatic hydrocarbon solvent which is optionally substituted by a halogen atom by adding an additive selected from a phase-transfer catalyst, a C | 06-03-2010 |
| 20100137475 | EPOXY RESIN-FORMING LIQUID PREPARATION CONTAINING INORGANIC PARTICLE - There is provided a liquid preparation for forming an epoxy resin having curing properties combining high transparency and high bending strength while maintaining advantageous handling properties as in a liquid state. A liquid preparation for forming an epoxy resin comprising: an A agent; and a B agent; wherein the A agent contains a modified epoxy resin (I) formed from at least one type of compound (i) having in a molecule thereof, at least one functional group of Formula (1): | 06-03-2010 |
| 20100133518 | GATE INSULATING FILM FORMING AGENT FOR THIN-FILM TRANSISTOR - There is provided a novel gate insulating film forming material in consideration of not only initial electric properties immediately after the production of a gate insulating film, but also electric properties after other steps are performed while producing a thin-film transistor using the gate insulating film, and even reliability in the electric properties of the produced element. A gate insulating film forming agent for a thin-film transistor comprising an oligomer compound or a polymer compound, both of which contain a repeating unit having a triazinetrione ring containing a hydroxyalkyl-containing group as a substituent on a nitrogen atom, and a solvent; a gate insulating film produced from the gate insulating film forming agent; a thin-film transistor having the gate insulating film; and a method for producing the gate insulating film or thin-film transistor. | 06-03-2010 |
| 20100130755 | PROCESS FOR PRODUCTION OF COUMARIN DIMER COMPOUND - There is provided a one-step process for producing a dihydroxy-substituted coumarin dimer compound by a photodimerization reaction of a hydroxy-substituted coumarin compound. The process comprises subjecting a hydroxy-substituted coumarin compound to a photodimerization reaction in a solvent selected from aliphatic ketones having 3 to 10 carbon atoms, aliphatic carboxylic acid esters having 2 to 10 carbon atoms, aliphatic alcohols having 1 to 10 carbon atoms, aliphatic nitriles having 2 to 10 carbon atoms, ethers having 4 to 10 carbon atoms, amides having 3 to 10 carbon atoms, and a mixture thereof to obtain a dihydroxy-substituted coumarin dimer compound. | 05-27-2010 |
| 20100120984 | PROCESS FOR PRODUCTION OF SURFACE-MODIFIED POLYMER STRUCTURES - The present invention relates to a process for producing a polymer structure comprising: mixing and unifying a matrix polymer made of a linear polymer and a highly-branched polymer having hydrophilic functional groups at molecular ends and to form a structure containing the matrix polymer and the highly-branched polymer; and subjecting the obtained structure to either immersion in water and/or a hydrophilic solvent or exposure to an atmosphere of vapor of water and/or a hydrophilic solvent at a temperature ranging from a temperature lower than Tg of the matrix polymer by 30° C. to decomposition temperature of the matrix polymer; wherein the hydrophilic functional groups at the molecular ends of the highly-branched polymer are distributed in outermost surface of the polymer structure at an enhanced density. The present invention also relates to a process for producing a polymer structure in which vinyl polymer chains are grafted to at least a part of the hydrophilic functional groups. | 05-13-2010 |
| 20100120925 | ACIDIC ZIRCONIA SOL AND PRODUCTION METHOD OF THE SAME - There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. The acidic zirconia sol includes zirconia particles (a) having a particle diameter ranging from 20 to 300 nm in a content of 90 to 50% by mass, based on the mass of all zirconia particles, and zirconia particles (b) having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles. | 05-13-2010 |
| 20100119969 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DPOLYHYDROXYAMIDE RESIN - There is provided a positive photosensitive resin composition that is excellent in electric insulating properties, heat resistance, mechanical strength and electrical characteristics, and capable of forming a high-resolution circuit pattern. The positive photosensitive resin composition comprises at least one type of a polyhydroxyamide resin containing a repeating unit represented by Formula (1) and having a weight average molecular weight of 3,000 to 100,000, and a compound generating an acid by light irradiation. | 05-13-2010 |
| 20100105636 | T-TYPE CALCIUM CHANNEL BLOCKER - There is provided a T-type calcium channel blocker that is a compound of formula (1), a pharmaceutically acceptable salt thereof or a solvate thereof: | 04-29-2010 |
| 20100096663 | PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS - A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition. | 04-22-2010 |
| 20100094037 | PROCESS FOR PRODUCTION OF OPTICALLY ACTIVE SULFOXIDE COMPOUND USING IRON-SALAN COMPLEX CATALYST - An optically active sulfoxide compound that is useful as an intermediate for synthesis or an active ingredient of a physiologically active substance such as a pharmaceutical agent is produced at a high optical purity. A process for producing an optically active sulfoxide compound of formula (4) comprises oxidizing a sulfide compound of formula (3) in the presence of an optically active metal complex of formula (1), (1′), (2) or (2′) by using an oxidizing agent. The present invention is also directed to the optically active metal complex. | 04-15-2010 |
| 20100093010 | Inhibitor for the Formation of Gamma-Secretase Complex - It is intended to provide an inhibitor for the formation of a γ-secretase complex which comprises a cholesterol synthesis inhibitor or a protein geranylgeranylation regulator as the active ingredient; and use of a cholesterol synthesis inhibitor or a protein geranylgeranylation regulator for producing the same. It is also intended to provide a method of screening a substance having an effect of inhibiting the formation of an active complex of γ-secretase which comprises assaying the activity of inhibiting cholesterol synthesis or quantifying cholesterol accumulated in lipid rafts in cells. It is also intended to provide a method of screening a cholesterol synthesis inhibitor, a protein geranylgeranylation regulator or an HMG-CoA reductase inhibitor which comprises assaying the effect of inhibiting the formation of an active complex of γ-secretase. Moreover, it is intended to provide a method of screening an effect of a test substance on γ-secretase which comprises measuring the distribution of constituents (niscastrin, APH-1, Pen-2 and so on) required by γ-secretase for the formation of its active complex in cells. | 04-15-2010 |
| 20100081081 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY - There is provided a resist underlayer film forming composition for an electron beam lithography that is used in a device production process using electron beam lithography and is effective for reducing adverse effects caused by an electron beam to obtain a favorable resist pattern, and a method of forming a resist pattern using the resist underlayer film forming composition for electron beam lithography. The resist underlayer film forming composition for an electron beam lithography comprises a polymer compound having a repeating unit structure that contains a halogen atom, and a solvent, and the composition is applied in a form of film between a film to be processed for forming a transferring pattern on a substrate and a resist film for an electron beam lithography, and used for manufacturing a semiconductor device. The polymer compound preferably contains at least 10% by mass of a halogen atom. | 04-01-2010 |
| 20100075253 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR - There is provided a resist underlayer film forming composition that is used in a lithography process for the production of semiconductor devices and that can be developed with an alkaline developer for photoresists, and a method of forming a photoresist pattern by using the resist underlayer film forming composition. The resist underlayer film forming composition used in a lithography process for a production of a semiconductor device comprising: an alkali-soluble resin (a); a polynuclear phenol (b); a compound (c) having at least two vinylether groups; and a photoacid generator (d). The alkali-soluble resin (a) may be a polymer containing a unit structure having a carboxyl group, and the polynuclear phenol (b) may be a compound having 2 to 30 phenolic hydroxyl groups in the molecule. | 03-25-2010 |
| 20100069569 | POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION - There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): | 03-18-2010 |
| 20100069374 | Tricyclic benzopyrane compound - This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof | 03-18-2010 |
| 20100063243 | POLYAMIC ACIDS, POLYIMIDES, AND PROCESSES FOR THE PRODUCTION THEREOF - To provide polyamic acids and polyimides, which have high light transmittance and heat resistance such that their thermal decomposition temperatures are at least 300° C. and which are excellent in their solubility in solvents and have their processability improved. | 03-11-2010 |
| 20100062541 | Adiponectin receptor and gene encoding the same - The object is to isolate and identify human and mouse adiponectin receptors, to provide a novel protein having adiponectin binding ability, and to provide a screening method and screening kit for a ligand, agonist and antagonist to an adiponectin receptor using such protein. To achieve this object, a protein is used, as novel protein having adiponectin binding ability, that is (a) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8, or (b) a protein comprising an amino acid sequence according to Seq. No. 2, 4, 6 or 8 with one or more amino acids deleted, replaced or added, and having adiponectin binding ability. | 03-11-2010 |
| 20100048845 | Hyperbranched polymer and method for producing the same - Disclosed is a novel optically stable hyperbranched polymer whose molecular terminal can be derivatized with various compounds; and a method for producing such a polymer. Specifically disclosed is a hyperbranched polymer having a structure represented by Formula (1) | 02-25-2010 |
| 20100038596 | PROCESS FOR PRODUCING DISPERSION LIQUID OF INTRINSIC ELECTROCONDUCTIVE POLYMER IN ORGANIC SOLVENT - This invention provides a process for producing a dispersion liquid of an intrinsic electroconductive polymer in an organic solvent, comprising a deionization step of deionizing an aqueous colloid dispersion liquid of an intrinsic electroconductive polymer by a liquid feeding method to remove cations adsorbed on the intrinsic electroconductive polymer, a solvent displacement step of subjecting water in the aqueous colloid dispersion liquid after the deionization step to solvent displacement with an organic solvent (excluding N-methylpyrrolidone and dimethyl sulfoxide), and an additive treatment step of, after the solvent displacement step, adding N-methylpyrrolidone or dimethyl sulfoxide. This process can easily produce a dispersion liquid of an intrinsic electroconductive polymer in an organic solvent that can be used in various applications such as electrode materials, antistatic agents, ultraviolet absorbers, heat absorbers, electromagnetic wave absorbers, sensors, electrolytes for electrolytic capacitors, and electrodes for rechargeable batteries. | 02-18-2010 |
| 20100037801 | Process for Producing Elongated-Shaped Silica Sol - There is provided a method for producing an elongated-shaped silica sol comprising the following steps:
| 02-18-2010 |
| 20100035181 | RESIST UNDERLAYER FILM FORMING COMPOSITION - It is a problem to provide a resist underlayer film forming composition containing a fullerene derivative, which is easily applied on a substrate and from which a resist underlayer film excellent in dry etching properties can be obtained. The problem is solved by for example a resist underlayer film forming composition comprising: a fullerene derivative represented by Formula (3): | 02-11-2010 |
| 20100029951 | Process for producing acrylonitrile compound - There is provided a process for stereoselectively producing E-form of 3-acyloxyacrylonitrile compound (3) or Z-form which comprises reacting 3-oxopropionitrile compound (1) with an acid chloride (2), characterized in that the reaction is conducted with removal of hydrogen chloride, or by using an organic base or an inorganic base, to thereby regulate the stereostructure of the product; a process for producing the compound (1) characterized by reacting acetonitrile compound (5) with an aromatic ester compound (6) by use of an alkali metal alkoxide in a hydrocarbon solvent while removing alcohol formed as a by-product by azeotropic distillation in a separating tank; and a process for isomerizing E-form of 3-acyloxyacrylonitrile compound to Z-form thereof by use of an organic base. | 02-04-2010 |
| 20100029845 | REACTIVE MONOMER-DISPERSED SILICA SOL AND PRODUCTION METHOD THEREOF, AND CURABLE COMPOSITION AND CURED ARTICLE THEREOF - Colloidal silica particles dispersed in a reactive monomer may cause the polymerization, degradation, or the like of the reactive monomer by an action of the solid acidity of the surfaces of the particles and a monomer may be polymerized during a process for producing a monomer-dispersed silica sol, or a stable silica sol may not be obtained. In addition, a polymer of a resin formed article etc. obtained by curing a monomer-dispersed silica sol may be deteriorated, degraded, or the like with time. Therefore, there are provided a reactive monomer-dispersed silica sol having high stability by reducing the solid acidity of the surfaces of the colloidal silica particles contained in the reactive monomer-dispersed silica sol, and a production method thereof, and a curable composition using the reactive monomer-dispersed silica sol, and a cured article in which the deterioration, the degradation, or the like of the polymer is suppressed. The present invention provides a reactive monomer-dispersed silica sol containing a colloidal silica particle in which an alkaline earth metal ion is bonded to a surface of the colloidal silica particle. | 02-04-2010 |
| 20100028805 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION - It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition. | 02-04-2010 |
| 20100022092 | Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing - There is provided a resist underlayer film forming composition used in a lithography process for producing semiconductor devices. A method of producing a semiconductor device comprising: forming a coating film by applying a resist underlayer film forming composition containing a polymer, a crosslinker and a photoacid generator on a semiconductor substrate; forming an underlayer film by irradiating light to the coating film; and forming a photoresist by applying a photoresist composition on the underlayer film and heating the resultant layer. The polymer polymer is a polymer having a benzene ring or a hetero ring in a main chain or a side chain bonded to the main chain, and the content rate of a benzene ring in the polymer is 30 to 70% by mass. The polymer may be a polymer containing a lactone structure. | 01-28-2010 |
| 20100022090 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN - There is provided a resist underlayer film forming composition for lithography, which in order to prevent a resist pattern from collapsing after development in accordance with the miniaturization of the resist pattern, is applied to multilayer film process by a thin film resist, has a lower dry etching rate than resists and semiconductor substrates, and has a satisfactory etching resistance relative to a substrate to be processed in the processing of the substrate. A resist underlayer film forming composition used in lithography process by a multiplayer film, comprises a polymer containing a unit structure having an aromatic fused ring, a unit structure having a protected carboxyl group or a unit structure having an oxy ring. A method of forming a pattern by use of the resist underlayer film forming composition. A method of manufacturing a semiconductor device by utilizing the method of forming a pattern. | 01-28-2010 |
| 20100019229 | Thiophene compound having phosphoric ester and process for producing the same - A thiophene compound having a phosphate group, for example, one represented by the formula [1]. The compound has high resistance to heat and oxidation and can be improved in solubility or dispersibility in various solvents. | 01-28-2010 |
| 20100016584 | Pyrazole sulfonylurea compound and herbicide - A pyrazole compound of the formula: | 01-21-2010 |
| 20100004464 | Method for producing succinimide compound - There is provided a method for producing a succinimide compound. The method for producing a succinimide compound of formula (3) comprises reacting an aminomalonic ester compound of formula (1) with a compound of formula (2) in a solvent in the presence of a base, wherein an alcohol is used as the solvent and an alkali metal alkoxide is used as the base. | 01-07-2010 |
| 20100003791 | METHOD FOR MANUFACTURING ELECTRONIC CIRCUIT COMPONENT - An object of the present invention is to provide a method for manufacturing an electronic circuit component such as an organic TFT | 01-07-2010 |
| 20100003729 | Method for producing optically active succinimide compound - There is provided a novel method for producing an optically active succinimide compound which is a useful compound utilized as an intermediate raw material for pharmaceutical products or the like. The method for producing an optically active succinimide compound of formula (2) comprises processing a racemic compound of a succinimide compound of formula (1) in the presence of a hydrolase to selectively hydrolyze one of the enantiomers, and subjecting to a post-treatment. | 01-07-2010 |
| 20090317740 | Composition containing hydroxylated condensation resin for forming resist underlayer film - Disclosed is a lithographic composition for forming a resist underlayer film, which can be used as a lower layer antireflection film by which an exposure light striking on a photoresist formed on a semiconductor substrate is inhibited from being reflected from the substrate in a lithographic process of manufacturing semiconductor equipment, a planarization film for flattening a semiconductor substrate having a rugged surface used in order to fill in a hole formed on the semiconductor substrate, a film which prevents a photoresist from being contaminated by a substance generated from a semiconductor substrate during heating/burning, or the like. The lithographic composition for forming a resist underlayer comprises a polymer having a structure of formula (1): | 12-24-2009 |
| 20090312330 | ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND PESTICIDE - An isoxazoline-substituted benzamide compound of formula (1) or a salt thereof: | 12-17-2009 |
| 20090311624 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE - To provide a resist underlayer film forming composition for lithography that is used in a lithography process for production of a semiconductor device. There is provided a resist underlayer film forming composition used in a lithography process for production of a semiconductor device, comprising a resin (A), a liquid additive (B) and a solvent (C). The liquid additive (B) may be an aliphatic polyether compound. The liquid additive (B) may be a polyether polyol, polyglycidyl ether or a combination thereof. Further, there is provided a method of manufacturing a semiconductor device, including the steps of forming a resist underlayer film by applying the resist underlayer film forming composition on a semiconductor substrate and by calcining the composition; forming a photoresist layer on the underlayer film; exposing the semiconductor substrate coated with the resist underlayer film and the photoresist layer to light; and developing the photoresist layer after the exposure to light. | 12-17-2009 |
| 20090308282 | Method for Producing Modified Zirconium Oxide-Tin Oxide Composite SOL - It is intended to provide a stable sol containing zirconium oxide-tin oxide composite colloids to be used for improving the performance such as abrasion resistance, transparency, adhesiveness, water resistance or weather resistance of a dried film obtained by applying a hard coating agent containing colloidal particles to the surface of plastic lens. A production method includes the steps of obtaining a sol containing colloidal particles (A1) in which the surface of particles in a sol containing hydrothermally-processed zirconium oxide-tin oxide composite colloids (A) is coated with amine-containing Sb | 12-17-2009 |
| 20090291980 | TRIGLYCERIDE-LOWERING AGENT AND HYPERINSULINISM-AMELIORATING AGENT - The present invention is directed to a triglyceride-lowering agent, exhibiting excellent triglyceride-lowering effect and a hyperinsulinemia-ameliorating agent. | 11-26-2009 |
| 20090291940 | AMINOPYRROLIDINE COMPOUND - Disclosed is an aminopyrrolidine compound represented by the formula [I] or a pharmaceutically acceptable salt thereof. The compound or the salt is useful as a prophylactic/therapeutic agent for mode disorder such as depression, anxiety disorder, anorexia, cachexia, pain and drug dependence, whose action relies on the MC | 11-26-2009 |
| 20090286928 | CARBON NANOTUBE GRAFTED WITH LOW-MOLECULAR WEIGHT POLYANILINE AND DISPERSION THEREOF - Chemically modified carbon nanotubes composed of carbon nanotubes (such as multiwall carbon nanotubes) having carboxyl groups on the surface thereof and polymeric aniline (such as 3- to 300-meric aniline) bonding thereto through the amide linkage. The chemically modified carbon nanotubes exhibit good affinity with organic solvents and readily disperse into organic solvents. | 11-19-2009 |
| 20090281317 | 3-ETHYLIDENEHYDRAZINO SUBSTITUTED HETEROCYCLIC COMPOUNDS AS THROMBOPOIETIN RECEPTOR ACTIVATORS - A compound represented by the formula (1): wherein A, B, R | 11-12-2009 |
| 20090270300 | Composition for removing protective layer in fabrication of mems and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
| 20090270299 | Composition for removing protective layer in fabrication of MEMS and method for removing same - There is provided a composition that can effectively remove a protective coating and a primer coating that have a resistance to etching solutions and are rendered unnecessary after wet-etching treatment in MEMS fabrication processes, and a method for removing the protective layer. The composition contains (A) at least one organic solvent selected from the group consisting of amides, lactones, pyrrolidones and ketones, (B) water, and (C) a fluoride, in an amount of 80.00 to 99.90 mass %, 0.05 to 12.00 mass %, and 0.05 to 8.00 mass %, respectively. The composition may further contain (D) phosphoric acid, phosphonic acid or phosphinic acid in an amount over 0 mass part to 5.5 mass parts, or (E) an organic amine in an amount over 0 mass part to 45 mass parts, based on 100 mass parts of the composition. | 10-29-2009 |
| 20090253751 | HYDRAZIDE COMPOUND AND THROMBOPOIETIN RECEPTOR ACTIVATOR - Compounds effective for preventing, treatment or improving diseases against which activation of the thrombopoietin receptor is effective are provided. | 10-08-2009 |
| 20090253076 | Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative - [Object] To provide a coating-type underlayer coating forming composition that is applied for multi-ply coating process by thin film resist in order to prevent collapse of resist pattern after development with miniaturization of resist pattern, and that shows a sufficient etching resistance against a semiconductor substrate to be processed on processing of the substrate by having a low dry etching rate compared with the photoresist and substrate. | 10-08-2009 |
| 20090246643 | PHOTOSENSITIVE COMPOSITION CONTAINING ORGANIC-ZIRCONIA COMPOSITE FINE PARTICLES - [Problems] The present invention provides a photosensitive composition capable of permanently forming a hologram having a low light scattering loss and high diffraction efficiency, and a forming method of a pattern. | 10-01-2009 |
| 20090217759 | Method of Determining Sublimate in Thermoset Film with Qcm Sensor - A method for measuring an amount of a sublimate in real time with respect to a lapse of heating time, comprising: adhering the sublimate from a thermoset film during heating to a surface of a crystal oscillator using a nozzle inserted into a detection part; and measuring the amount of the sublimate from a change in a resonance frequency corresponding to the amount of the sublimate adhered to the crystal oscillator. In the method, the thermoset film may be formed on a silicon wafer and the measurement is performed while the thermoset film is heated by a heat source disposed under the silicon wafer; or the sublimate may be set so as to flow together with an airstream ascending toward an upper part of an enclosure covering the thermoset film, and the airstream directly contacts the crystal oscillator through the nozzle inserted into the detection part disposed in the path of the airstream. | 09-03-2009 |
| 20090198060 | NITROGEN-CONTAINING HETEROCYCLIC COMPOUND AND THROMBOPOIETIN RECEPTOR ACTIVATOR - Compounds effective for preventing, treatment or improving diseases against which activation of the thrombopoietin receptor is effective are provided. | 08-06-2009 |
| 20090184347 | COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR - To provide a coating fluid for a gate insulating film, which can be baked at a low temperature of at most 180° C.; a gate insulating film having excellent solvent resistance and further having good characteristics in e.g. specific resistance or semiconductor mobility; and an organic transistor employing the gate insulating film. | 07-23-2009 |
| 20090176987 | CRYSTAL FORM OF QUINOLINE COMPOUND AND PROCESS FOR ITS PRODUCTION - A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): | 07-09-2009 |
| 20090163657 | Polymer Structure Whose Surface and/or Interface Is Modified, and Method for Producing the Same - There is provided a novel, simple, general-purpose technique capable of being applied to the modification of the polymer surface and/or interface. | 06-25-2009 |
| 20090162782 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating - There is provided an underlayer coating that is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to the photoresists depending on the type of etching gas, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition for forming the underlayer coating. | 06-25-2009 |
| 20090162665 | COATING FLUID FOR FORMING FILM, AND FILM THEREOF AND FILM-FORMING PROCESS - To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. | 06-25-2009 |
| 20090156643 | Substituted isoxazoline compound and pesticide - There is provided a novel pesticide, particularly an insecticide or an acaricide. A substituted isoxazoline compound of formula (1) or a salt thereof: | 06-18-2009 |
| 20090156636 | THERAPEUTIC AGENT FOR GLOMERULAR DISEASE - The present invention relates to a preventive and/or therapeutic agent for a glomerular disease containing, as active ingredients pitavastatin or a salt thereof and candesartan cilexetil or a salt thereof. The agent of the present invention exhibits an excellent effect in the prevention and/or therapy of a glomerular disease. | 06-18-2009 |
| 20090155187 | DRUG FOR INHIBITING VASCULAR INTIMAL HYPERPLASIA - To provide an intimal hyperplasia inhibitor useful for prevention of restenosis after percutaneous transluminal coronary angioplasty (PTCA) or vascular stent placement or treatment of its progress. | 06-18-2009 |
| 20090154059 | COMPOSITION COMPRISING A CONDUCTIVE POLYMER IN COLLOIDAL FORM AND CARBON - The present invention relates to compositions capable of forming a coating and comprising a mixture of a conductive polymer in colloidal form and carbon, methods for their manufacture and use for high-capacity electrical double layer capacitors to be utilized in various electronic apparatuses, power supplies and the like. | 06-18-2009 |
| 20090131676 | PYRAZOLE COMPOUNDS AND THROMBOPOIETIN RECEPTOR ACTIVATORS - A compound represented by the formula (I) (wherein R | 05-21-2009 |
| 20090131659 | AMIDE COMPOUND AND THROMBOPOIETIN RECEPTOR ACTIVATOR - The present invention provides compounds useful for prevention, treatment or alleviation of diseases against which activation of the thrombopoietin receptor is effective. | 05-21-2009 |
| 20090130594 | Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating - There is provided an underlayer coating that is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to the photoresists, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition for forming the underlayer coating. | 05-21-2009 |
| 20090130384 | Chip Provided with film Having Hole Pattern with the Use of Thermoresponsive Polymer and Method of Producing the Same - [Problems] To provide a novel chip useful for treating cells and the like which has a mechanism and a structure wherein the size of a hole pattern is arbitrarily changed so that cells can easily move in and get out from the hole in scattering or collecting cells but can hardly get out from the hole during washing or antigen-stimulation. | 05-21-2009 |
| 20090127501 | Polishing Composition for Silicon Wafer - The present invention relates to a polishing composition for silicon wafer comprising silica, a basic compound, a polyaminopolycarboxylic acid compound having hydroxy group, and water. The polishing composition can prevent metal contamination by nickel, chromium, iron, copper or the like, particularly copper contamination in polishing of silicon wafer. | 05-21-2009 |
| 20090127491 | THIOPHENE COMPOUND HAVING SULFONYL GROUP AND PROCESS FOR PRODUCING THE SAME - A thiophene compound having sulfonyl groups which is represented by the formula [1]. It has high heat resistance and high unsusceptibility to oxidation and can improve solubility and dispersibility in various solvents. | 05-21-2009 |
| 20090124806 | PROCESS FOR PRODUCING CARBOXYLIC ACID FROM PRIMARY ALCOHOL - To provide an industrially-useful and environmentally-friendly novel oxidation reaction. | 05-14-2009 |
| 20090118500 | THIOPHENE COMPOUNDS AND THROMBOPOIETIN RECEPTOR ACTIVATORS - A compound represented by the formula (I) (wherein R | 05-07-2009 |
| 20090118125 | Water Dispersible Agricultural Chemical Granules and Method of Producing the Same - A water dispersible agricultural chemical granule having good productivity and dispersion stability in water and a method of producing the same are provided. A water dispersible agricultural chemical granule produced by spray drying after wet pulverization of a suspension containing an agricultural chemical active component having a melting point ranging from 55 to 100° C., a surfactant and water, with a drying loss of the water dispersible agricultural chemical granule ranging from 0.1 to 5.0% by mass. A method of producing a water dispersible agricultural chemical granule including spray drying after wet pulverization of a suspension containing an agricultural chemical active component having a melting point ranging from 55 to 100° C., a surfactant and water so as to obtain the water dispersible agricultural chemical granule having drying loss ranging from 0.1 to 5.0% by mass. | 05-07-2009 |
| 20090117493 | Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound - There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc. | 05-07-2009 |
| 20090117190 | SUSTAINED-RELEASE PREPARATION - It is intended to provide a sustained-release pharmaceutical preparation with absorbability not dependent on pH. The sustained-release preparation is characterized by containing 4-bromo-6-[3-(4-chlorophenyl)propoxy]-5-(3-pyridylmethylamino)-3(2H)-pyridazinone or a salt thereof, as a pharmaceutically active ingredient, and containing a hydrogel base and an organic acid. | 05-07-2009 |
| 20090088313 | Production Method of Alkaline Zirconia Sol - [Problems to be Solved] To provide a production method of an alkaline zirconia having compatibility of particle properties and binding properties. | 04-02-2009 |
| 20090082583 | Heterogeneous catalyst and process for producing oxirane compound with the catalyst - Process for producing an oxirane compound includes treating with hydrogen peroxide in the presence of either an olefin oxidation catalyst prepared from an organic compound or a polymer compound of formula (1) | 03-26-2009 |
| 20090078307 | Three-Pole Two-Layer Photo-Rechargeable Battery - A three-pole two-layer photo-rechargeable battery has a laminated two-layered structure that includes a solar battery cell, a storage cell, and a common electrode therebetween. The solar battery cell has a structure wherein a photo-electrode, which has a photo-sensitized dye and a semiconductor layer on a conductive substrate with optical transparency, counters via a first electrolytic solution a common electrode that has a catalyst layer on a conductive substrate. The storage cell has a structure wherein the common electrode, which has a first conductive polymer layer on a conductive substrate on a side opposite the catalyst layer, counters via a second electrolytic solution a storage cell counter electrode that has a second conductive polymer layer on a conductive substrate. | 03-26-2009 |
| 20090053647 | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative - [Object] To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative.
| 02-26-2009 |
| 20090043100 | Process for Producing Optically Active Chromene Oxide Compound - [Problems] To provide an efficient process for producing an optically active chromene oxide compound which is an important intermediate for a benzopyran compound effective in the treatment of arrhythmia.
| 02-12-2009 |
| 20090042393 | Production method of polishing composition - A production method of a semiconductor device including: producing a polishing composition containing zirconium oxide sol; and planarizing a substrate having an uneven surface with said polishing composition, wherein the polishing composition containing zirconium oxide is produced by the steps comprising: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry. | 02-12-2009 |
| 20090041843 | PHARMACEUTICAL PREPARATION HAVING EXCELLENT PHOTOSTABILITY - The present invention relates to a pharmaceutical preparation of high photostability which contains pitavastatin, which is an HMG-CoA reductase inhibitor, a salt of pitavastatin, or an ester of pitavastatin. The pharmaceutical preparation contains a pitavastatin compound, titanium oxide, and a colorant having a maximum absorption wavelength of 400 nm to 500 nm. | 02-12-2009 |
| 20090036556 | Acidic Zirconia Sol and Production Method of the Same - There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. | 02-05-2009 |
| 20090035793 | Microchip for cell response evaluation - In a microchip which enables cell cultivation and accurate cell count measurement, fine particles affixed with cells are trapped within a passage by making the minimum width of a solution and fine particle inlet into a cell culture portion larger than the maximum diameter of the fine particles, and making the width of an outlet smaller than the maximum diameter of the fine particles. | 02-05-2009 |
| 20090032994 | Method for Manufacturing Slurry and Mold for Precision Casting - A manufacturing method for a slurry for the production of a precision casting mold that includes a zirconia sol and a refractory powder, and a manufacturing method for a precision casting mold that uses the slurry is provided. The present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an alkaline zirconia sol (A1) and a refractory powder (D) are mixed, the alkaline zirconia sol (A1) being obtained by a manufacturing method that includes a step (i), in which a zirconium salt (B1) is heated at 60 to 110° C. in an aqueous medium that includes a carbonate of quaternary ammonium, and a step (ii), in which a hydrothermal treatment is carried out at 100 to 250° C. In addition, the present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an acidic zirconia sol (C3) and a refractory powder (D) are mixed, the acidic zirconia sol (C3) being obtained by a manufacturing method that includes a step (I), in which an alkaline zirconia sol (A3) and a zirconium salt (B3) are mixed, and a step II, in which the obtained liquid mixture is caused to react at 80 to 250° C. | 02-05-2009 |
| 20090023939 | ALPHA-SUBSTITUTED VINYLTIN COMPOUND - To provide α-substituted vinyltin useful for the search for function-developing substances such as pharmaceuticals/agrichemicals and functional materials and for the construction of a compound library. | 01-22-2009 |
| 20090023923 | 1,3-Bis(Substituted Phenyl)-3-Hydroxypropan-1-One or 2-Propen-1-One Compound, and Salt Thereof - There is provided a novel process intermediate represented by the general formula (1) or (2): | 01-22-2009 |
| 20080318158 | Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound - There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer coating. | 12-25-2008 |
| 20080306080 | NEUTROPHILIA INHIBITOR - To provide an antineutrophilia agent effective for treatment of development and progress of acute infections, collagen diseases (chronic rheumatoid arthritis, Wegener's granulomatosis and Behcet's disease), chronic obstructive pulmonary disease (COPD), chronic bronchitis, pulmonary emphysema, small airway disease, gout, Cushing's syndrome, myelofibrosis, neoplastic neutrophilia, polycythemia vera and diseases caused by administration of steroid drugs. | 12-11-2008 |
| 20080293831 | Method for producing zirconia sol - A production method of a zirconia sol includes; (A) mixing a dicarboxylic acid compound with a zirconium compound in an aqueous medium, in which a molar ratio of the dicarboxylic acid compound is more than 1 and less than or equal to 10 per mol of zirconium atom in the zirconium compound, and (B) adding 0.7-2.5 mol of a water-soluble organic base per mol of the dicarboxylic acid compound contained in a mixture obtained by the process (A) to the mixture and then treating hydrothermally the resultant mixture. | 11-27-2008 |
| 20080276835 | Zirconium Oxide-Tin Oxide Composite Sol, Coating Composition and Optical Member - There is provided a stable sol of zirconium oxide-tin oxide composite colloidal particles and a method of producing the same, a hard coat material applied for a surface of a plastic lens, and an optical member. | 11-13-2008 |
| 20080275081 | Novel thrombomodulin expression promoters - It is intended to provide a novel pharmaceutical effect of HMG-COA reductase inhibitors, in particular, (+)-(3R, 5S, 6E)-7-[2-cyclopropyl-4-(4-fluorophenyl)-3-quinolyl]-3,5-di hydroxy-6-heptenoic acid or its salt. Namely, TM expression promoters, more specifically speaking, antithrombotic drugs, preventive/remedies for sepsis, antiplatelet drugs and anticoagulants comprising as the active ingredient an HMG-COA reductase inhibitor, in particular, (+)-(3R, 5S, 6E)-7-[2-cyclopropyl-4-(4-fluorophenyl)-3-quinolyl]-3,5-dihydroxy-6-heptenoic acid or its salt. | 11-06-2008 |
| 20080268379 | Anti-Reflective Coating Forming Composition For Lithography Containing Polymer Having Ethylenedicarbonyl Structure - There is provided an anti-reflective coating forming composition for lithography comprising a polymer having an ethylenedicarbonyl structure and a solvent; an anti-reflective coating formed from the composition; and a method for forming photoresist pattern by use of the composition. The anti-reflective coating obtained from the composition can be used in lithography process for manufacturing a semiconductor device, has a high preventive effect for reflected light, causes no intermixing with photoresists, and has a higher etching rate than photoresists. | 10-30-2008 |
| 20080268152 | Composite sol, process for producing the same, and ink-jet recording medium - A composite sol containing colloidal composite particles having a particle diameter measured by dynamic light scattering method of 20 to 500 nm, composed of colloidal silica particles having a specific surface area diameter of 3 to 100 nm and aluminum phosphate bonding the colloidal silica particles or coating and bonding the colloidal silica particles; a process for producing the composite sol; a coating composition for ink receiving layer containing the composite sol; and an ink jet recording medium having an ink receiving layer containing the composite sol. | 10-30-2008 |
| 20080254344 | Lithium Secondary Battery Having Internal Protection Circuit - The present invention relates to a lithium secondary battery with a built-in protective circuit, which includes battery case ( | 10-16-2008 |
| 20080234502 | Production method of optically active epoxy compound, complex used for the method and production method of the complex - [Problem] To provide a production method of optically active epoxy compound, and a complex used for the production method and a production method of the complex.
| 09-25-2008 |
| 20080221331 | ALCOHOL OXIDATION CATALYST AND ITS PREPARATION PROCESS - An alcohol oxidation catalyst which is an organic oxidation catalyst to oxidize an alcohol, which contains azabicyclo [3.3.1]nonane N-oxyl represented by the following formula (1) having an N-oxyl group incorporated in a bicycle[3.3.1]nonane skeleton: | 09-11-2008 |
| 20080220975 | Aqueous suspended agricultural chemical composition - The present invention relates to an aqueous suspended agricultural chemical composition wherein component (a) is ethyl(R)-2-[4-(6-chloroquinoxalin-2-yloxy)phenoxy]propionate of which the ratio of β-type crystal is 80% by weight or more, component (b) is surfactant and component (c) is water. An aqueous suspended agricultural chemical composition of the invention has good flowability and the growth of quizalofop-p-ethyl particle is small, resulting in high preservation stability under severe preservation condition. | 09-11-2008 |
| 20080206680 | Composition for forming anti-reflective coating for use in lithography - There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom. | 08-28-2008 |
