| NIKON PRECISION INC. Patent applications |
| Patent application number | Title | Published |
|---|
| 20100125823 | SYSTEMS AND METHODS FOR ADJUSTING A LITHOGRAPHIC SCANNER - A system and methods are provide for modeling the behavior of a lithographic scanner and, more particularly, a system and methods are provide using thresholds of an image profile to characterize through-pitch printing behavior of a lithographic scanner. The method includes running a lithographic model for a target tool and running a lithographic model on the matching tool for a plurality of different settings using lens numerical aperture, numerical aperture of the illuminator and annular ratio of a pattern which is produced by an illuminator. The method then selects the setting that most closely matches the output of the target tool. | 05-20-2010 |
| 20100058263 | Scanner Based Optical Proximity Correction System and Method of Use - A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ | 03-04-2010 |
