NEXGEN SEMI HOLDING, INC. Patent applications |
Patent application number | Title | Published |
20130040458 | APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING - A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam. | 02-14-2013 |
20120112323 | APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING - A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece. | 05-10-2012 |
20120028464 | APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING - A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam. | 02-02-2012 |
20110167913 | IMAGING DEVICES FOR MEASURING THE STRUCTURE OF A SURFACE - Imaging devices for measuring a structure of a surface and methods of use are provided. In certain embodiments, an imaging device includes at least one nano-mechanical resonator pair. The pair includes a reference resonator having a reference resonant frequency, and a sense resonator having a first sense resonant frequency. The device is configured to expose the sense resonator to the surface such that the sense resonator has a second sense resonant frequency. The device is also configured to measure the structure of the surface based on a difference between the second sense resonant frequency and the reference resonant frequency. In certain embodiments, an imaging device for measuring the structure of a surface includes an array of sense nano-electromechanical resonators. In certain embodiments, the array of single nano-electromechanical resonators is advantageously arranged in a staggered configuration. | 07-14-2011 |
20110065237 | APPARATUS AND METHOD FOR MANUFACTURING MULTI-COMPONENT OXIDE HETEROSTRUCTURES - Certain embodiments disclosed herein relate to the formation of multi-component oxide heterostructures (MCOH) using surface nucleation to pattern the atomic layer deposition (ALD) of perovskite material followed by patterned etch and metallization to produce ultra-high density MCOH nano-electronic devices. Applications include ultra-high density MCOH memory and logic, as well as electronic functionality based on single electrons, for example a novel flash memory cell Floating-Gate (FG) transistor with LaAlO | 03-17-2011 |
20100098922 | APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING - A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece. | 04-22-2010 |