NEOCERA, LLC Patent applications |
Patent application number | Title | Published |
20140249033 | DC SQUID BASED RF MAGNETOMETER OPERATING AT A BANDWIDTH OF 200 MHZ AND HIGHER - An RF DC SQUID based magnetometer capable of sensing coherent magnetic fields up to 200 MHz and higher is developed which overcomes frequency limitations associated with noise signals due to transmission line delays between the SQUID circuit and readout electronics. The bandwidth limitations are overcome by superimposing the RF flux on the modulation flux to produce at the SQUID output a binary phase modulated RF voltage, which is processed to lock the static flux, and to control modulation regime by producing an AC bias for the RF flux. RF readout electronics based on a double lock-in technique (sequential demodulation of the RF SQUID voltage at the modulation flux frequency ω | 09-04-2014 |
20110027928 | PULSED LASER DEPOSITION OF HIGH QUALITY PHOTOLUMINESCENT GaN FILMS - High quality GaN films exhibiting strong room temperature blue photoluminescence with negligible impurity emissions are grown by a Pulsed Laser Deposition process in which process parameters are controlled to attain plasma particle energy of a target material plume directed from the target on the substrate structure below 5 eV at the deposition surface. Among the process parameters, a distance between the deposition surface and the target, a pressure level of the reaction gas in the processing chamber, and an energy density of the pulsed laser beam directed to the target are controlled, in combination, to attain the required low plasma particle energy of the plume below 5 eV in vicinity of the deposition surface. | 02-03-2011 |
20090078202 | SUBSTRATE HEATER FOR MATERIAL DEPOSITION - A radiative heater for substrates in a physical vapor deposition process for fabricating films of materials in a wide dynamic range of process temperatures and gas pressures includes a heat radiating member made from a high-temperature and oxidation resistant material tolerant to vacuum conditions which separates a heater volume containing heating filaments from a process volume which contains a deposition substrate heated by radiation of the walls of the heat radiating member. The heating elements extend through the body of the heat radiating member as well as in proximity to its surface to provide delivery of the heat to the substrate. The heat radiating member is shaped to form a cavity containing the substrate. The walls of the cavity envelope the substrate and radiate heat towards the substrate. Alternatively, the substrate is adhered to the flat surface of the heat radiating member. | 03-26-2009 |