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National Institute of Advanced Indust Sci & Tech

Tokyo, JP

National Institute of Advanced Indust Sci & Tech Patent applications
Patent application numberTitlePublished
20110039112OPTICAL COMPONENT USING COMPOSITE SUBSTRATE AND PROCESS FOR PRODUCING SAME - A resin composition (02-17-2011
20090095146PRESSURE-RESISTANT VESSEL AND BLASTING FACILITY HAVING THE SAME - An object of the present invention is to improve durability of a pressure vessel for blasting an article to be treated such as hazardous substance or explosive therein. The pressure vessel 04-16-2009
20080203400SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME - A semiconductor device and a method of manufacturing the device using a (000-1)-faced silicon carbide substrate are provided. A SiC semiconductor device having a high blocking voltage and high channel mobility is manufactured by optimizing the heat-treatment method used following the gate oxidation. The method of manufacturing a semiconductor device includes the steps of forming a gate insulation layer on a semiconductor region formed of silicon carbide having a (000-1) face orientation, forming a gate electrode on the gate insulation layer, forming an electrode on the semiconductor region, cleaning the semiconductor region surface. The gate insulation layer is formed in an atmosphere containing 1% or more H08-28-2008

Patent applications by National Institute of Advanced Indust Sci & Tech