National Institute of Advanced Ind. Sci. and Tech.
|National Institute of Advanced Ind. Sci. and Tech. Patent applications|
|Patent application number||Title||Published|
|20120024133||BLAST TREATMENT METHOD AND BLAST TREATMENT DEVICE - A blast treatment method capable of performing blast treatment of a treatment subject with a simple structure, with high efficiency, and at low cost, while inhibiting scattering of harmful substances or the like to the outside. The method includes: inside disposing an inside explosive for blasting a treatment subject around the treatment subject; disposing an outside explosive having a detonation velocity greater than that of the inside explosive at a position outside the inside explosive; and detonating the outside explosive using an initiation device, and initiating the inside explosive by detonation of the outside explosive, thereby performing blast treatment of the treatment subject by initiation of the inside explosive. The outside explosive disposing includes arranging a cord-like explosive member containing the outside explosive and having a shape extending in one direction so that a detonation propagation velocity in a specific direction of the inside explosive initiated by the outside explosive is greater than a detonation propagation velocity in the specific direction of the inside explosive.||02-02-2012|
|20100167015||ETCHING RESIST - An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.||07-01-2010|