| 20090104720 | Photoresist Coating Apparatus Having Nozzle Monitoring Unit and Method for Supplying Photoresist Using the Same - Provided are a photoresist coating apparatus and a method of coating photoresist using the same. The apparatus includes a photoresist supply line through which photoresist is supplied. A fluid control valve is connected to the photoresist supply line to control the flow of the photoresist. A nozzle assembly is connected to the photoresist supply line at a rear end of the fluid control valve. The nozzle assembly includes a nozzle located above the center of a semiconductor wafer loaded in a photoresist coating unit to spray the photoresist. A camera is located outside the photoresist coating unit to monitor the shape or spraying amount of the nozzle located at the tip of the nozzle assembly. A controller converts data monitored by the camera into an electric signal and processes the electric signal. | 04-23-2009 |
