| 20090051915 | Arrangement for Monitoring Thermal Spray Processes - An arrangement for measuring characteristic properties of a plasma beam in a thermal spray process, including a device for introducing spray materials into the plasma, a one-dimensional or two-dimensional array including first optical waveguides for receiving the light radiation emitted by the plasma, and other optical waveguides for distributing the light radiation emitted by the plasma. A device is provided for splitting the light guided in the first optical waveguides into the other optical wave guides, one optical waveguide being connected to the opening diaphragm of a particle flow arrangement, and the other optical waveguide being connected to the opening diaphragm of a spectrometer. A device is also provided for determining the current state of the spray process. | 02-26-2009 |
